JPS57114143A - Photomask for photoetching - Google Patents

Photomask for photoetching

Info

Publication number
JPS57114143A
JPS57114143A JP58781A JP58781A JPS57114143A JP S57114143 A JPS57114143 A JP S57114143A JP 58781 A JP58781 A JP 58781A JP 58781 A JP58781 A JP 58781A JP S57114143 A JPS57114143 A JP S57114143A
Authority
JP
Japan
Prior art keywords
layer
photoresist
glass substrate
metallic layer
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58781A
Other languages
Japanese (ja)
Inventor
Takashi Aoyanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58781A priority Critical patent/JPS57114143A/en
Publication of JPS57114143A publication Critical patent/JPS57114143A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain an inexpensive photomask with high surface hardness by forming a pattern of a metallic layer on one principal plane surface of a chemically tempered glass substrate. CONSTITUTION:A glass substrate is ion-exchanged by contact with molten alkali salt contg. alkali ion having ionic radius larger than the alkali ion contained in the glass at a temp. below the transition temp. of the glass to obtain a chemically tempered glass substrate 3. On the substrate 3 Cr, Cr2O3 or the like is vapor-deposited in 1,000-5,000Angstrom thickness to form a metallic layer 4. A photoresist 5 is applied to the layer 4, selectively exposed, and developed to form a patterned photoresist 6. By etching the layer 4 using the photoresist 6 as a mask, a metallic layer 7 of the desired pattern is formed.
JP58781A 1981-01-06 1981-01-06 Photomask for photoetching Pending JPS57114143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58781A JPS57114143A (en) 1981-01-06 1981-01-06 Photomask for photoetching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58781A JPS57114143A (en) 1981-01-06 1981-01-06 Photomask for photoetching

Publications (1)

Publication Number Publication Date
JPS57114143A true JPS57114143A (en) 1982-07-15

Family

ID=11477852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58781A Pending JPS57114143A (en) 1981-01-06 1981-01-06 Photomask for photoetching

Country Status (1)

Country Link
JP (1) JPS57114143A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016194785A1 (en) * 2015-05-29 2016-12-08 旭硝子株式会社 Chemically strengthened glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016194785A1 (en) * 2015-05-29 2016-12-08 旭硝子株式会社 Chemically strengthened glass

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