JPS5711344A - Dry developing method - Google Patents

Dry developing method

Info

Publication number
JPS5711344A
JPS5711344A JP8684780A JP8684780A JPS5711344A JP S5711344 A JPS5711344 A JP S5711344A JP 8684780 A JP8684780 A JP 8684780A JP 8684780 A JP8684780 A JP 8684780A JP S5711344 A JPS5711344 A JP S5711344A
Authority
JP
Japan
Prior art keywords
film
resist
pattern
contg
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8684780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313583B2 (en, 2012
Inventor
Teruhiko Yamazaki
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP8684780A priority Critical patent/JPS5711344A/ja
Publication of JPS5711344A publication Critical patent/JPS5711344A/ja
Publication of JPH0313583B2 publication Critical patent/JPH0313583B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8684780A 1980-06-25 1980-06-25 Dry developing method Granted JPS5711344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8684780A JPS5711344A (en) 1980-06-25 1980-06-25 Dry developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8684780A JPS5711344A (en) 1980-06-25 1980-06-25 Dry developing method

Publications (2)

Publication Number Publication Date
JPS5711344A true JPS5711344A (en) 1982-01-21
JPH0313583B2 JPH0313583B2 (en, 2012) 1991-02-22

Family

ID=13898198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8684780A Granted JPS5711344A (en) 1980-06-25 1980-06-25 Dry developing method

Country Status (1)

Country Link
JP (1) JPS5711344A (en, 2012)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211939A (ja) * 1984-04-06 1985-10-24 Nippon Telegr & Teleph Corp <Ntt> 微細パタン形成法
JPS63204253A (ja) * 1987-02-20 1988-08-23 Hitachi Ltd パタン形成法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509549A (en, 2012) * 1973-05-30 1975-01-31
JPS5272175A (en) * 1975-12-12 1977-06-16 Mitsubishi Electric Corp Mask patterning of resist meterial
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5449072A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Developing method for resist film
JPS5460571A (en) * 1977-10-24 1979-05-16 Cho Lsi Gijutsu Kenkyu Kumiai Dry developing and etching method
JPS5569265A (en) * 1978-11-15 1980-05-24 Hitachi Ltd Pattern-forming method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509549A (en, 2012) * 1973-05-30 1975-01-31
JPS5272175A (en) * 1975-12-12 1977-06-16 Mitsubishi Electric Corp Mask patterning of resist meterial
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5449072A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Developing method for resist film
JPS5460571A (en) * 1977-10-24 1979-05-16 Cho Lsi Gijutsu Kenkyu Kumiai Dry developing and etching method
JPS5569265A (en) * 1978-11-15 1980-05-24 Hitachi Ltd Pattern-forming method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60211939A (ja) * 1984-04-06 1985-10-24 Nippon Telegr & Teleph Corp <Ntt> 微細パタン形成法
JPS63204253A (ja) * 1987-02-20 1988-08-23 Hitachi Ltd パタン形成法

Also Published As

Publication number Publication date
JPH0313583B2 (en, 2012) 1991-02-22

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