JPS57109952A - Production of photomask plate - Google Patents
Production of photomask plateInfo
- Publication number
- JPS57109952A JPS57109952A JP18690880A JP18690880A JPS57109952A JP S57109952 A JPS57109952 A JP S57109952A JP 18690880 A JP18690880 A JP 18690880A JP 18690880 A JP18690880 A JP 18690880A JP S57109952 A JPS57109952 A JP S57109952A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- pattern
- ultraviolet ray
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18690880A JPS57109952A (en) | 1980-12-26 | 1980-12-26 | Production of photomask plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18690880A JPS57109952A (en) | 1980-12-26 | 1980-12-26 | Production of photomask plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57109952A true JPS57109952A (en) | 1982-07-08 |
JPS6161665B2 JPS6161665B2 (ja) | 1986-12-26 |
Family
ID=16196781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18690880A Granted JPS57109952A (en) | 1980-12-26 | 1980-12-26 | Production of photomask plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57109952A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60196942A (ja) * | 1984-03-21 | 1985-10-05 | Hitachi Ltd | フオトマスク欠陥修正方法 |
JPS60245135A (ja) * | 1984-05-18 | 1985-12-04 | Matsushita Electric Ind Co Ltd | ホトマスク修正方法 |
JPS6283749A (ja) * | 1985-10-08 | 1987-04-17 | Mitsubishi Electric Corp | フオトマスクの欠陥修正方法 |
-
1980
- 1980-12-26 JP JP18690880A patent/JPS57109952A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60196942A (ja) * | 1984-03-21 | 1985-10-05 | Hitachi Ltd | フオトマスク欠陥修正方法 |
JPS60245135A (ja) * | 1984-05-18 | 1985-12-04 | Matsushita Electric Ind Co Ltd | ホトマスク修正方法 |
JPS6283749A (ja) * | 1985-10-08 | 1987-04-17 | Mitsubishi Electric Corp | フオトマスクの欠陥修正方法 |
JPH0458624B2 (ja) * | 1985-10-08 | 1992-09-18 | Mitsubishi Electric Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS6161665B2 (ja) | 1986-12-26 |
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