JPS5597220A - Method of producing metal filter - Google Patents

Method of producing metal filter

Info

Publication number
JPS5597220A
JPS5597220A JP393379A JP393379A JPS5597220A JP S5597220 A JPS5597220 A JP S5597220A JP 393379 A JP393379 A JP 393379A JP 393379 A JP393379 A JP 393379A JP S5597220 A JPS5597220 A JP S5597220A
Authority
JP
Japan
Prior art keywords
layer
photomask
produce
metal
metal filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP393379A
Other languages
Japanese (ja)
Other versions
JPS6249094B2 (en
Inventor
Yasuyuki Abe
Tomihiro Nakada
Tatsumi Takahashi
Masao Kodera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP393379A priority Critical patent/JPS5597220A/en
Publication of JPS5597220A publication Critical patent/JPS5597220A/en
Publication of JPS6249094B2 publication Critical patent/JPS6249094B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Filtering Materials (AREA)
  • Combined Means For Separation Of Solids (AREA)

Abstract

PURPOSE: To produce a metal filter for sieving ultrafine particles having uniform holes and high aperture rate by an electroforming method on an electroconductive base plate using a photomask having a light-shielding material of interference fringe pattern obtained by the interference of laser light.
CONSTITUTION: In a transparent base plate 17 made of glass or the like there is provided a layer of a light-shielding material such as Cr or the like thereby to produce a mask original plate, and a phtotsensitive material layer 19 is applied on the layer 18. Then, an interference fringe pattern is baked on the layer 19, and developed to form a resist pattern 19A. Then, the exposed layer 18 is subjected to etching through the layer 19A. Thereafter, the resist 19A is exfoliated to obtain the object photomask P. Then, by use of the photomask P a fine diffraction grating pattern is baked on a photoresist layer 20 by ultraviolet rays 20, and developed to produce a resist pattern 22A. Then, a metal 23 is electroplated by using an ordinary electroforming method. Then, the metal 23 is exfoliated to obtain a metal filter having uniform ultrafine holes having a hole diameter of, for instance, 1μ or less, and a high aperture rate.
COPYRIGHT: (C)1980,JPO&Japio
JP393379A 1979-01-19 1979-01-19 Method of producing metal filter Granted JPS5597220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP393379A JPS5597220A (en) 1979-01-19 1979-01-19 Method of producing metal filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP393379A JPS5597220A (en) 1979-01-19 1979-01-19 Method of producing metal filter

Publications (2)

Publication Number Publication Date
JPS5597220A true JPS5597220A (en) 1980-07-24
JPS6249094B2 JPS6249094B2 (en) 1987-10-16

Family

ID=11570931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP393379A Granted JPS5597220A (en) 1979-01-19 1979-01-19 Method of producing metal filter

Country Status (1)

Country Link
JP (1) JPS5597220A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05181258A (en) * 1992-06-19 1993-07-23 Hitachi Ltd Original plate for photomask
WO2001021282A2 (en) * 1999-09-22 2001-03-29 Viostyle Limited Laminar structure
JP2004504634A (en) * 2000-07-19 2004-02-12 エーエスエムエル　ユーエス，インコーポレイテッド Method of characterizing an optical system using a holographic reticle
US7804601B2 (en) 1999-06-24 2010-09-28 Asml Holding N.V. Methods for making holographic reticles for characterizing optical systems

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110158025B (en) * 2018-05-31 2021-01-26 京东方科技集团股份有限公司 Mask plate manufacturing method and mask plate

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05181258A (en) * 1992-06-19 1993-07-23 Hitachi Ltd Original plate for photomask
JPH0715578B2 (en) * 1992-06-19 1995-02-22 株式会社日立製作所 Master plate for photomask
US7804601B2 (en) 1999-06-24 2010-09-28 Asml Holding N.V. Methods for making holographic reticles for characterizing optical systems
WO2001021282A2 (en) * 1999-09-22 2001-03-29 Viostyle Limited Laminar structure
WO2001021282A3 (en) * 1999-09-22 2001-10-18 Viostyle Ltd Laminar structure
US6794056B1 (en) 1999-09-22 2004-09-21 Nord Impianti S.R.L. Laminar structure
JP2004504634A (en) * 2000-07-19 2004-02-12 エーエスエムエル　ユーエス，インコーポレイテッド Method of characterizing an optical system using a holographic reticle

Also Published As

Publication number Publication date
JPS6249094B2 (en) 1987-10-16

Similar Documents

Publication Publication Date Title
CA2056307A1 (en) Method of manufacturing a stamper
JPS57211732A (en) X ray exposing mask and manufacture thereof
JPS5597220A (en) Method of producing metal filter
JPS5630129A (en) Manufacture of photomask
JPS60230650A (en) Formation of fine pattern
JPS57106128A (en) Forming method for pattern
JPS5443681A (en) Electron beam light-exposing method
JPS5596952A (en) Production of photomask
JPS55135837A (en) Manufacture of photomask
JPS55128832A (en) Method of making minute pattern
JPS5568626A (en) Pattern formation
JPS57106034A (en) Patterning method
JPS57212445A (en) Production of photomask
JPS5799371A (en) Formation of resin film
JPS5559722A (en) Producing method of electron beam drawing photomask
JPS5452473A (en) Forming method for coating for fine pattern
JPS53117383A (en) Production of photo mask
JPS5594491A (en) Forming method for thick minute metal pattern
JPS57132008A (en) Measuring method for pattern size
JPS57212446A (en) Photomask for far ultraviolet exposure
DOERNER et al. Photolithographic processes for small structures: Introduction and trial of electron beam lithography[Final Report, Nov. 1979]
JPS5475989A (en) Pattern production method
JPS5689741A (en) Dryplate for photomasking
JPS56167329A (en) Piling joint setting mark to be used in fine processing exposure technology
JPS576848A (en) Photomask and its preparation