JPS5696858A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5696858A
JPS5696858A JP17118179A JP17118179A JPS5696858A JP S5696858 A JPS5696858 A JP S5696858A JP 17118179 A JP17118179 A JP 17118179A JP 17118179 A JP17118179 A JP 17118179A JP S5696858 A JPS5696858 A JP S5696858A
Authority
JP
Japan
Prior art keywords
film
layer
etched
type
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17118179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6348188B2 (enExample
Inventor
Akira Sato
Yoshinobu Monma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17118179A priority Critical patent/JPS5696858A/ja
Publication of JPS5696858A publication Critical patent/JPS5696858A/ja
Publication of JPS6348188B2 publication Critical patent/JPS6348188B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/031—Manufacture or treatment of conductive parts of the interconnections
    • H10W20/069—Manufacture or treatment of conductive parts of the interconnections by forming self-aligned vias or self-aligned contact plugs

Landscapes

  • Weting (AREA)
  • Bipolar Transistors (AREA)
JP17118179A 1979-12-29 1979-12-29 Manufacture of semiconductor device Granted JPS5696858A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17118179A JPS5696858A (en) 1979-12-29 1979-12-29 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17118179A JPS5696858A (en) 1979-12-29 1979-12-29 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5696858A true JPS5696858A (en) 1981-08-05
JPS6348188B2 JPS6348188B2 (enExample) 1988-09-28

Family

ID=15918497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17118179A Granted JPS5696858A (en) 1979-12-29 1979-12-29 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5696858A (enExample)

Also Published As

Publication number Publication date
JPS6348188B2 (enExample) 1988-09-28

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