JPS5693330A - Ion beam etching - Google Patents

Ion beam etching

Info

Publication number
JPS5693330A
JPS5693330A JP16971279A JP16971279A JPS5693330A JP S5693330 A JPS5693330 A JP S5693330A JP 16971279 A JP16971279 A JP 16971279A JP 16971279 A JP16971279 A JP 16971279A JP S5693330 A JPS5693330 A JP S5693330A
Authority
JP
Japan
Prior art keywords
ion beam
iris
passing
irises
deflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16971279A
Other languages
English (en)
Inventor
Masaki Ito
Sotaro Edokoro
Hiroshi Gokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP16971279A priority Critical patent/JPS5693330A/ja
Publication of JPS5693330A publication Critical patent/JPS5693330A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP16971279A 1979-12-26 1979-12-26 Ion beam etching Pending JPS5693330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16971279A JPS5693330A (en) 1979-12-26 1979-12-26 Ion beam etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16971279A JPS5693330A (en) 1979-12-26 1979-12-26 Ion beam etching

Publications (1)

Publication Number Publication Date
JPS5693330A true JPS5693330A (en) 1981-07-28

Family

ID=15891461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16971279A Pending JPS5693330A (en) 1979-12-26 1979-12-26 Ion beam etching

Country Status (1)

Country Link
JP (1) JPS5693330A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6049629A (ja) * 1983-08-29 1985-03-18 Mitsubishi Electric Corp 反応性イオンビ−ムエツチング装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6049629A (ja) * 1983-08-29 1985-03-18 Mitsubishi Electric Corp 反応性イオンビ−ムエツチング装置

Similar Documents

Publication Publication Date Title
JPS57200042A (en) Exposure method for chemically machinable photosensitive glass
JPS5425675A (en) Electron beam exposure unit
JPS5332759A (en) Precision coordinate position detection and position control unit by composite diffration grating method
JPS5694630A (en) Etching method using ion-beam
JPS5693330A (en) Ion beam etching
JPS57132113A (en) Method and device for pattern formation using laser
JPS53143175A (en) Electron beam drawing apparatus
JPS52117578A (en) Electron beam exposing method
JPS57172734A (en) Exposing process for electronic beam
SU579712A1 (ru) Способ контрол положени патологического очага
JPS56144536A (en) Pattern formation and p-n junction formation
JPS56107245A (en) Manufacture of photomask
JPS6490529A (en) Mask for exposure and exposure method
JPS545393A (en) Semiconductor laser with light beam shaping lens
JPS5572074A (en) Production of semiconductor device
JPS53117463A (en) Position detection method
JPS56158334A (en) Manufacture of hard mask
JPS5596681A (en) Method of fabricating semiconductor device
JPS6424422A (en) Formation of fine pattern
EP0308902A3 (en) Method for forming pattern by using langmuir-blodgett film
JPS56115537A (en) Forming method of infinitesimal pattern
JPS55124230A (en) Forming method of pattern
JPS56107554A (en) Formation of pattern
JPS5380922A (en) Pattern recognition device
JPS52119179A (en) Electron beam exposing method