JPS57172734A - Exposing process for electronic beam - Google Patents

Exposing process for electronic beam

Info

Publication number
JPS57172734A
JPS57172734A JP5812681A JP5812681A JPS57172734A JP S57172734 A JPS57172734 A JP S57172734A JP 5812681 A JP5812681 A JP 5812681A JP 5812681 A JP5812681 A JP 5812681A JP S57172734 A JPS57172734 A JP S57172734A
Authority
JP
Japan
Prior art keywords
pattern
region
electronic beam
rectangular
illuminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5812681A
Other languages
Japanese (ja)
Inventor
Hisashi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP5812681A priority Critical patent/JPS57172734A/en
Publication of JPS57172734A publication Critical patent/JPS57172734A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To produce the pattern with high fidelity to the original drawing by a method wherein the extended region of the satellite line of a region is illuminated in addition to the electronic beam illumination to a rectangular region. CONSTITUTION:When the extended region 5 of the satellite line of a rectangular region 4 is illuminated by means of the electronic beams, said beams can reach every angle of the pattern to minimize the curvature diameter of the developed pattern angle producing the pattern with high fidelity to the rectangular original drawing.
JP5812681A 1981-04-16 1981-04-16 Exposing process for electronic beam Pending JPS57172734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5812681A JPS57172734A (en) 1981-04-16 1981-04-16 Exposing process for electronic beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5812681A JPS57172734A (en) 1981-04-16 1981-04-16 Exposing process for electronic beam

Publications (1)

Publication Number Publication Date
JPS57172734A true JPS57172734A (en) 1982-10-23

Family

ID=13075281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5812681A Pending JPS57172734A (en) 1981-04-16 1981-04-16 Exposing process for electronic beam

Country Status (1)

Country Link
JP (1) JPS57172734A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6182423A (en) * 1984-09-29 1986-04-26 Toshiba Corp Charged beam lithography method
JPS6189630A (en) * 1984-10-09 1986-05-07 Toshiba Corp Exposing method by electron beam
JPS6230321A (en) * 1985-07-31 1987-02-09 Toshiba Corp Method and apparatus for exposure by electron beam
JPS62133456A (en) * 1985-12-06 1987-06-16 Toshiba Corp Resist pattern forming method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6182423A (en) * 1984-09-29 1986-04-26 Toshiba Corp Charged beam lithography method
JPS6189630A (en) * 1984-10-09 1986-05-07 Toshiba Corp Exposing method by electron beam
JPS6230321A (en) * 1985-07-31 1987-02-09 Toshiba Corp Method and apparatus for exposure by electron beam
JPS62133456A (en) * 1985-12-06 1987-06-16 Toshiba Corp Resist pattern forming method

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