JPS5683955A - Manufacturing of semiconductor - Google Patents
Manufacturing of semiconductorInfo
- Publication number
- JPS5683955A JPS5683955A JP16196479A JP16196479A JPS5683955A JP S5683955 A JPS5683955 A JP S5683955A JP 16196479 A JP16196479 A JP 16196479A JP 16196479 A JP16196479 A JP 16196479A JP S5683955 A JPS5683955 A JP S5683955A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- base plate
- pattern
- thin film
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000463 material Substances 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000006185 dispersion Substances 0.000 abstract 2
- 239000012535 impurity Substances 0.000 abstract 2
- 229910021332 silicide Inorganic materials 0.000 abstract 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000700 radioactive tracer Substances 0.000 abstract 1
- 239000000523 sample Substances 0.000 abstract 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16196479A JPS5683955A (en) | 1979-12-13 | 1979-12-13 | Manufacturing of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16196479A JPS5683955A (en) | 1979-12-13 | 1979-12-13 | Manufacturing of semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5683955A true JPS5683955A (en) | 1981-07-08 |
JPH0147011B2 JPH0147011B2 (enrdf_load_stackoverflow) | 1989-10-12 |
Family
ID=15745410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16196479A Granted JPS5683955A (en) | 1979-12-13 | 1979-12-13 | Manufacturing of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5683955A (enrdf_load_stackoverflow) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6034077A (ja) * | 1983-08-04 | 1985-02-21 | Matsushita Electric Ind Co Ltd | 太陽電池素子およびその製造方法 |
JPS60177640A (ja) * | 1984-02-24 | 1985-09-11 | Hitachi Ltd | 半導体集積回路装置 |
JPS61219154A (ja) * | 1985-03-25 | 1986-09-29 | Nec Corp | 半導体装置 |
JPS6319833A (ja) * | 1986-07-14 | 1988-01-27 | Agency Of Ind Science & Technol | 半導体集積回路の試験方法 |
JPH01125875A (ja) * | 1988-10-19 | 1989-05-18 | Matsushita Electric Ind Co Ltd | 太陽電池素子 |
JPH0851135A (ja) * | 1995-06-26 | 1996-02-20 | Seiko Epson Corp | ウェハ及びその検定方法 |
US5903489A (en) * | 1997-09-19 | 1999-05-11 | Nec Corporation | Semiconductor memory device having a monitoring pattern |
JP2002286780A (ja) * | 2001-03-23 | 2002-10-03 | Nippon Sheet Glass Co Ltd | 金属配線の検査方法および検査に適した半導体デバイスの構造 |
US7253436B2 (en) | 2003-07-25 | 2007-08-07 | Matsushita Electric Industrial Co., Ltd. | Resistance defect assessment device, resistance defect assessment method, and method for manufacturing resistance defect assessment device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52139383A (en) * | 1976-05-17 | 1977-11-21 | Hitachi Ltd | Testing method for semiconductor device |
JPS52155066A (en) * | 1976-06-18 | 1977-12-23 | Mitsubishi Electric Corp | Screening method of thin metal film wirings of semiconductor device |
JPS53124091A (en) * | 1977-04-05 | 1978-10-30 | Nec Corp | Solid state electron device and its manufacture |
-
1979
- 1979-12-13 JP JP16196479A patent/JPS5683955A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52139383A (en) * | 1976-05-17 | 1977-11-21 | Hitachi Ltd | Testing method for semiconductor device |
JPS52155066A (en) * | 1976-06-18 | 1977-12-23 | Mitsubishi Electric Corp | Screening method of thin metal film wirings of semiconductor device |
JPS53124091A (en) * | 1977-04-05 | 1978-10-30 | Nec Corp | Solid state electron device and its manufacture |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6034077A (ja) * | 1983-08-04 | 1985-02-21 | Matsushita Electric Ind Co Ltd | 太陽電池素子およびその製造方法 |
JPS60177640A (ja) * | 1984-02-24 | 1985-09-11 | Hitachi Ltd | 半導体集積回路装置 |
JPS61219154A (ja) * | 1985-03-25 | 1986-09-29 | Nec Corp | 半導体装置 |
JPS6319833A (ja) * | 1986-07-14 | 1988-01-27 | Agency Of Ind Science & Technol | 半導体集積回路の試験方法 |
JPH01125875A (ja) * | 1988-10-19 | 1989-05-18 | Matsushita Electric Ind Co Ltd | 太陽電池素子 |
JPH0851135A (ja) * | 1995-06-26 | 1996-02-20 | Seiko Epson Corp | ウェハ及びその検定方法 |
US5903489A (en) * | 1997-09-19 | 1999-05-11 | Nec Corporation | Semiconductor memory device having a monitoring pattern |
JP2002286780A (ja) * | 2001-03-23 | 2002-10-03 | Nippon Sheet Glass Co Ltd | 金属配線の検査方法および検査に適した半導体デバイスの構造 |
US7253436B2 (en) | 2003-07-25 | 2007-08-07 | Matsushita Electric Industrial Co., Ltd. | Resistance defect assessment device, resistance defect assessment method, and method for manufacturing resistance defect assessment device |
Also Published As
Publication number | Publication date |
---|---|
JPH0147011B2 (enrdf_load_stackoverflow) | 1989-10-12 |
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