JPH0147011B2 - - Google Patents

Info

Publication number
JPH0147011B2
JPH0147011B2 JP54161964A JP16196479A JPH0147011B2 JP H0147011 B2 JPH0147011 B2 JP H0147011B2 JP 54161964 A JP54161964 A JP 54161964A JP 16196479 A JP16196479 A JP 16196479A JP H0147011 B2 JPH0147011 B2 JP H0147011B2
Authority
JP
Japan
Prior art keywords
wiring
polycrystalline silicon
silicon thin
metal silicide
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54161964A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5683955A (en
Inventor
Kenji Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16196479A priority Critical patent/JPS5683955A/ja
Publication of JPS5683955A publication Critical patent/JPS5683955A/ja
Publication of JPH0147011B2 publication Critical patent/JPH0147011B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP16196479A 1979-12-13 1979-12-13 Manufacturing of semiconductor Granted JPS5683955A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16196479A JPS5683955A (en) 1979-12-13 1979-12-13 Manufacturing of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16196479A JPS5683955A (en) 1979-12-13 1979-12-13 Manufacturing of semiconductor

Publications (2)

Publication Number Publication Date
JPS5683955A JPS5683955A (en) 1981-07-08
JPH0147011B2 true JPH0147011B2 (enrdf_load_stackoverflow) 1989-10-12

Family

ID=15745410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16196479A Granted JPS5683955A (en) 1979-12-13 1979-12-13 Manufacturing of semiconductor

Country Status (1)

Country Link
JP (1) JPS5683955A (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034077A (ja) * 1983-08-04 1985-02-21 Matsushita Electric Ind Co Ltd 太陽電池素子およびその製造方法
JPS60177640A (ja) * 1984-02-24 1985-09-11 Hitachi Ltd 半導体集積回路装置
JPH0680669B2 (ja) * 1985-03-25 1994-10-12 日本電気株式会社 半導体装置
JPS6319833A (ja) * 1986-07-14 1988-01-27 Agency Of Ind Science & Technol 半導体集積回路の試験方法
JPH01125875A (ja) * 1988-10-19 1989-05-18 Matsushita Electric Ind Co Ltd 太陽電池素子
JPH0851135A (ja) * 1995-06-26 1996-02-20 Seiko Epson Corp ウェハ及びその検定方法
JPH1197645A (ja) * 1997-09-19 1999-04-09 Nec Corp 半導体記憶装置
JP4810741B2 (ja) * 2001-03-23 2011-11-09 富士ゼロックス株式会社 自己走査型発光デバイス
US7253436B2 (en) 2003-07-25 2007-08-07 Matsushita Electric Industrial Co., Ltd. Resistance defect assessment device, resistance defect assessment method, and method for manufacturing resistance defect assessment device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52139383A (en) * 1976-05-17 1977-11-21 Hitachi Ltd Testing method for semiconductor device
JPS5917847B2 (ja) * 1976-06-18 1984-04-24 三菱電機株式会社 半導体装置の金属薄膜線のスクリ−ニング方法
JPS6029222B2 (ja) * 1977-04-05 1985-07-09 日本電気株式会社 固体電子装置の製造方法

Also Published As

Publication number Publication date
JPS5683955A (en) 1981-07-08

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