JPS5673617A - Manufacture of trichlorosilane - Google Patents

Manufacture of trichlorosilane

Info

Publication number
JPS5673617A
JPS5673617A JP14923879A JP14923879A JPS5673617A JP S5673617 A JPS5673617 A JP S5673617A JP 14923879 A JP14923879 A JP 14923879A JP 14923879 A JP14923879 A JP 14923879A JP S5673617 A JPS5673617 A JP S5673617A
Authority
JP
Japan
Prior art keywords
trichlorosilane
furnace
hydrogen
fed
hydrogen chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14923879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6259051B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Toshio Noda
Eiichi Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Titanium Co Ltd
Original Assignee
Osaka Titanium Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Titanium Co Ltd filed Critical Osaka Titanium Co Ltd
Priority to JP14923879A priority Critical patent/JPS5673617A/ja
Publication of JPS5673617A publication Critical patent/JPS5673617A/ja
Publication of JPS6259051B2 publication Critical patent/JPS6259051B2/ja
Granted legal-status Critical Current

Links

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  • Silicon Compounds (AREA)
JP14923879A 1979-11-17 1979-11-17 Manufacture of trichlorosilane Granted JPS5673617A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Publications (2)

Publication Number Publication Date
JPS5673617A true JPS5673617A (en) 1981-06-18
JPS6259051B2 JPS6259051B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-09

Family

ID=15470895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14923879A Granted JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Country Status (1)

Country Link
JP (1) JPS5673617A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2002048034A1 (de) * 2000-12-11 2002-06-20 Solarworld Aktiengesellschaft Verfahren zur herstellung von reinstsilicium
WO2002048024A3 (de) * 2000-12-14 2003-03-27 Solarworld Ag Verfahren zur herstellung von trichlorsilan
JP2008303142A (ja) * 2001-06-08 2008-12-18 Hemlock Semiconductor Corp 多結晶シリコンの製造方法
WO2010116500A1 (ja) * 2009-04-08 2010-10-14 電気化学工業株式会社 トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法
WO2011102265A1 (ja) 2010-02-18 2011-08-25 株式会社トクヤマ トリクロロシランの製造方法
WO2011111335A1 (ja) 2010-03-10 2011-09-15 信越化学工業株式会社 トリクロロシランの製造方法
JP2012144427A (ja) * 2011-01-07 2012-08-02 Mitsubishi Materials Corp 不活性ガスを用いたベンディングシステムによるホウ素化合物量を低減した多結晶シリコンの製造装置および製造方法
JP2013535399A (ja) * 2010-08-13 2013-09-12 エルケム アクシエセルスカプ トリクロロシランの製造法及びトリクロロシランの製造用のケイ素
JP2013193941A (ja) * 2012-03-22 2013-09-30 Osaka Titanium Technologies Co Ltd クロロシラン類の製造方法及び製造装置
WO2013187070A1 (ja) 2012-06-14 2013-12-19 信越化学工業株式会社 高純度多結晶シリコンの製造方法
WO2014125762A1 (ja) 2013-02-13 2014-08-21 信越化学工業株式会社 トリクロロシランの製造方法
WO2015047043A1 (ko) 2013-09-30 2015-04-02 주식회사 엘지화학 트리클로로실란 제조방법
KR20150037681A (ko) 2013-09-30 2015-04-08 주식회사 엘지화학 트리클로로실란 제조방법
WO2015111885A1 (ko) 2014-01-23 2015-07-30 한국화학연구원 금속 실리사이드의 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치
KR20160069380A (ko) 2014-12-08 2016-06-16 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160069371A (ko) 2014-12-08 2016-06-16 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160102807A (ko) 2015-02-23 2016-08-31 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160144609A (ko) 2015-06-09 2016-12-19 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20170001411A (ko) 2015-06-26 2017-01-04 주식회사 엘지화학 트리클로로실란 제조방법 및 제조장치
KR20170001465A (ko) 2015-06-26 2017-01-04 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
CN106470943A (zh) * 2014-05-13 2017-03-01 株式会社Lg化学 利用连续管状反应器制备氯硅烷气体的方法
KR20170027824A (ko) 2014-07-10 2017-03-10 신에쓰 가가꾸 고교 가부시끼가이샤 클로로실레인의 정제 방법
KR20170031878A (ko) 2015-09-14 2017-03-22 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
KR20170032553A (ko) 2015-09-15 2017-03-23 주식회사 엘지화학 트리클로로실란 제조방법
US10065864B2 (en) 2014-07-22 2018-09-04 Hanwha Chemical Corporation Method of preparing trichlorosilan
DE112022004239T5 (de) 2021-11-01 2024-06-27 Tokuyama Corporation Verfahren zur Herstellung von Trichlorsilan und Verfahren zur Herstellung von Polykristallinem Siliciumstab
WO2025015627A1 (zh) * 2023-07-20 2025-01-23 江苏中能硅业科技发展有限公司 一种改良西门子法、流化床法联合生产工艺及装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101143723B (zh) * 2007-08-08 2010-09-01 徐州东南多晶硅材料研发有限公司 制备三氯氢硅和多晶硅的改进方法和装置
CN103723734B (zh) * 2012-10-10 2015-09-09 浙江昱辉阳光能源有限公司 一种制备三氯氢硅的工艺
CN110655086A (zh) * 2019-11-12 2020-01-07 唐山三孚硅业股份有限公司 三氯氢硅生产工艺中提高四氯化硅转化率的方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148035A (en) * 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
JPS52133022A (en) * 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of high purity silicon
JPS5433896A (en) * 1977-06-13 1979-03-12 Texas Instruments Inc Conversion of silicon tetrahalide into triholosilane

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148035A (en) * 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
JPS52133022A (en) * 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of high purity silicon
JPS5433896A (en) * 1977-06-13 1979-03-12 Texas Instruments Inc Conversion of silicon tetrahalide into triholosilane

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2002048034A1 (de) * 2000-12-11 2002-06-20 Solarworld Aktiengesellschaft Verfahren zur herstellung von reinstsilicium
DE10061682A1 (de) * 2000-12-11 2002-07-04 Solarworld Ag Verfahren zur Herstellung von Reinstsilicium
US6887448B2 (en) 2000-12-11 2005-05-03 Solarworld Ag Method for production of high purity silicon
WO2002048024A3 (de) * 2000-12-14 2003-03-27 Solarworld Ag Verfahren zur herstellung von trichlorsilan
JP2008303142A (ja) * 2001-06-08 2008-12-18 Hemlock Semiconductor Corp 多結晶シリコンの製造方法
WO2010116500A1 (ja) * 2009-04-08 2010-10-14 電気化学工業株式会社 トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法
JPWO2010116500A1 (ja) * 2009-04-08 2012-10-11 電気化学工業株式会社 トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法
EP2537803A4 (en) * 2010-02-18 2016-10-19 Tokuyama Corp PROCESS FOR THE PREPARATION OF TRICHLORSILANE
US9321653B2 (en) 2010-02-18 2016-04-26 Tokuyama Corporation Process for producing trichlorosilane
WO2011102265A1 (ja) 2010-02-18 2011-08-25 株式会社トクヤマ トリクロロシランの製造方法
KR20130008529A (ko) 2010-02-18 2013-01-22 가부시끼가이샤 도꾸야마 트리클로로실란의 제조 방법
US9266742B2 (en) 2010-03-10 2016-02-23 Shin-Etsu Chemical Co., Ltd. Method for producing trichlorosilane
WO2011111335A1 (ja) 2010-03-10 2011-09-15 信越化学工業株式会社 トリクロロシランの製造方法
JP2013535399A (ja) * 2010-08-13 2013-09-12 エルケム アクシエセルスカプ トリクロロシランの製造法及びトリクロロシランの製造用のケイ素
JP2012144427A (ja) * 2011-01-07 2012-08-02 Mitsubishi Materials Corp 不活性ガスを用いたベンディングシステムによるホウ素化合物量を低減した多結晶シリコンの製造装置および製造方法
JP2013193941A (ja) * 2012-03-22 2013-09-30 Osaka Titanium Technologies Co Ltd クロロシラン類の製造方法及び製造装置
WO2013187070A1 (ja) 2012-06-14 2013-12-19 信越化学工業株式会社 高純度多結晶シリコンの製造方法
US9355918B2 (en) 2012-06-14 2016-05-31 Shin-Etsu Chemical Co., Ltd. Method for producing high-purity polycrystalline silicon
EP3170791A1 (en) 2012-06-14 2017-05-24 Shin-Etsu Chemical Co., Ltd. Method for producing high-purity polycrystalline silicon
WO2014125762A1 (ja) 2013-02-13 2014-08-21 信越化学工業株式会社 トリクロロシランの製造方法
WO2015047043A1 (ko) 2013-09-30 2015-04-02 주식회사 엘지화학 트리클로로실란 제조방법
KR20150037681A (ko) 2013-09-30 2015-04-08 주식회사 엘지화학 트리클로로실란 제조방법
US9643851B2 (en) 2013-09-30 2017-05-09 Lg Chem, Ltd. Method for producing trichlorosilane
WO2015111885A1 (ko) 2014-01-23 2015-07-30 한국화학연구원 금속 실리사이드의 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치
US10301182B2 (en) 2014-05-13 2019-05-28 Lg Chem, Ltd. Method for producing chlorosilane gas using continuous tubular reactor
CN106470943A (zh) * 2014-05-13 2017-03-01 株式会社Lg化学 利用连续管状反应器制备氯硅烷气体的方法
KR20170027824A (ko) 2014-07-10 2017-03-10 신에쓰 가가꾸 고교 가부시끼가이샤 클로로실레인의 정제 방법
US10065864B2 (en) 2014-07-22 2018-09-04 Hanwha Chemical Corporation Method of preparing trichlorosilan
KR20160069371A (ko) 2014-12-08 2016-06-16 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160069380A (ko) 2014-12-08 2016-06-16 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160102807A (ko) 2015-02-23 2016-08-31 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20160144609A (ko) 2015-06-09 2016-12-19 주식회사 엘지화학 금속 실리콘 입자 분산액 및 이를 이용한 클로로실란의 제조방법
KR20170001465A (ko) 2015-06-26 2017-01-04 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
KR20170001411A (ko) 2015-06-26 2017-01-04 주식회사 엘지화학 트리클로로실란 제조방법 및 제조장치
KR20170031878A (ko) 2015-09-14 2017-03-22 주식회사 엘지화학 트리클로로실란 제조장치 및 제조방법
KR20170032553A (ko) 2015-09-15 2017-03-23 주식회사 엘지화학 트리클로로실란 제조방법
DE112022004239T5 (de) 2021-11-01 2024-06-27 Tokuyama Corporation Verfahren zur Herstellung von Trichlorsilan und Verfahren zur Herstellung von Polykristallinem Siliciumstab
WO2025015627A1 (zh) * 2023-07-20 2025-01-23 江苏中能硅业科技发展有限公司 一种改良西门子法、流化床法联合生产工艺及装置

Also Published As

Publication number Publication date
JPS6259051B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-09

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