JPS5660431A - Photosensitive composition and pattern forming method - Google Patents

Photosensitive composition and pattern forming method

Info

Publication number
JPS5660431A
JPS5660431A JP13641379A JP13641379A JPS5660431A JP S5660431 A JPS5660431 A JP S5660431A JP 13641379 A JP13641379 A JP 13641379A JP 13641379 A JP13641379 A JP 13641379A JP S5660431 A JPS5660431 A JP S5660431A
Authority
JP
Japan
Prior art keywords
photosensitive composition
water soluble
contg
1w50pts
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13641379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5743891B2 (enExample
Inventor
Nobuaki Hayashi
Motoo Akagi
Seiji Miura
Yoshiyuki Odaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13641379A priority Critical patent/JPS5660431A/ja
Priority to DE8080303760T priority patent/DE3067020D1/de
Priority to EP80303760A priority patent/EP0028486B1/en
Priority to US06/200,265 priority patent/US4332874A/en
Publication of JPS5660431A publication Critical patent/JPS5660431A/ja
Publication of JPS5743891B2 publication Critical patent/JPS5743891B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP13641379A 1979-10-24 1979-10-24 Photosensitive composition and pattern forming method Granted JPS5660431A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13641379A JPS5660431A (en) 1979-10-24 1979-10-24 Photosensitive composition and pattern forming method
DE8080303760T DE3067020D1 (en) 1979-10-24 1980-10-23 Photosensitive composition and pattern-forming method
EP80303760A EP0028486B1 (en) 1979-10-24 1980-10-23 Photosensitive composition and pattern-forming method
US06/200,265 US4332874A (en) 1979-10-24 1980-10-24 Photosensitive bis-azide composition with acrylic terpolymer and pattern-forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13641379A JPS5660431A (en) 1979-10-24 1979-10-24 Photosensitive composition and pattern forming method

Publications (2)

Publication Number Publication Date
JPS5660431A true JPS5660431A (en) 1981-05-25
JPS5743891B2 JPS5743891B2 (enExample) 1982-09-17

Family

ID=15174573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13641379A Granted JPS5660431A (en) 1979-10-24 1979-10-24 Photosensitive composition and pattern forming method

Country Status (4)

Country Link
US (1) US4332874A (enExample)
EP (1) EP0028486B1 (enExample)
JP (1) JPS5660431A (enExample)
DE (1) DE3067020D1 (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332542A (ja) * 1986-07-25 1988-02-12 Mitsubishi Chem Ind Ltd 染色可能な感光性組成物
JPS63139342A (ja) * 1986-12-02 1988-06-11 Osaka Yuki Kagaku Kogyo Kk 感光性樹脂組成物
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
KR100366075B1 (ko) * 1995-11-17 2004-05-20 삼성에스디아이 주식회사 감광성조성물에사용되는고분자및그제조방법
KR100450215B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강형광막용슬러리및형광막패턴형성방법
KR100450214B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강포토레지스트조성물
KR100458566B1 (ko) * 1997-07-29 2005-04-20 삼성에스디아이 주식회사 블랙매트릭스또는형광막형성용수용성고분자및그제조방법

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211145A (en) * 1981-06-23 1982-12-24 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS59101651A (ja) * 1982-12-02 1984-06-12 Fuji Photo Film Co Ltd 感光性平版印刷版
DE3534414A1 (de) * 1985-09-27 1987-04-02 Standard Elektrik Lorenz Ag Verfahren und vorrichtung zur erzeugung einer schwarzmatrixschicht
JP2628692B2 (ja) * 1988-05-31 1997-07-09 株式会社日立製作所 パターン形成方法及びカラーブラウン管の製造方法
KR100315241B1 (ko) * 1994-12-26 2002-04-24 김순택 브라운관의형광막제조방법
KR980010618A (ko) * 1996-07-16 1998-04-30 손욱 포토레지스트 조성물
WO2000058275A1 (fr) * 1999-03-31 2000-10-05 Sanyo Chemical Industries, Ltd. Compose photosensible et composition photosensible
KR20020077948A (ko) 2001-04-03 2002-10-18 삼성에스디아이 주식회사 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물
FR2831534B1 (fr) * 2001-10-29 2004-01-30 Oreal Composition photoactivable et utilisations
CN103760750B (zh) * 2013-12-13 2017-01-25 浙江荣生科技有限公司 一种光固化丝网印刷感光胶的制备方法和使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3694383A (en) * 1970-12-14 1972-09-26 Dainippon Ink & Chemicals Process for the production of light-sensitive polymer
JPS5137138B2 (enExample) * 1972-01-26 1976-10-14
US3748132A (en) * 1972-03-24 1973-07-24 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
US3892570A (en) * 1972-04-18 1975-07-01 Xerox Corp Light activating imaging process
JPS5032923A (enExample) * 1973-07-23 1975-03-29
US4086090A (en) * 1973-07-25 1978-04-25 Hitachi, Ltd. Formation of pattern using acrylamide-diacetoneacrylamide copolymer
US4191571A (en) * 1974-04-26 1980-03-04 Hitachi, Ltd. Method of pattern forming in a photosensitive composition having a reciprocity law failing property
JPS5239289B2 (enExample) * 1974-07-01 1977-10-04

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6332542A (ja) * 1986-07-25 1988-02-12 Mitsubishi Chem Ind Ltd 染色可能な感光性組成物
JPS63139342A (ja) * 1986-12-02 1988-06-11 Osaka Yuki Kagaku Kogyo Kk 感光性樹脂組成物
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
KR100366075B1 (ko) * 1995-11-17 2004-05-20 삼성에스디아이 주식회사 감광성조성물에사용되는고분자및그제조방법
KR100450215B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강형광막용슬러리및형광막패턴형성방법
KR100450214B1 (ko) * 1997-07-29 2004-12-03 삼성에스디아이 주식회사 접착력보강포토레지스트조성물
KR100458566B1 (ko) * 1997-07-29 2005-04-20 삼성에스디아이 주식회사 블랙매트릭스또는형광막형성용수용성고분자및그제조방법

Also Published As

Publication number Publication date
JPS5743891B2 (enExample) 1982-09-17
EP0028486A1 (en) 1981-05-13
US4332874A (en) 1982-06-01
DE3067020D1 (en) 1984-04-19
EP0028486B1 (en) 1984-03-14

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