JPS5648165A - Preparation of semiconductor device - Google Patents
Preparation of semiconductor deviceInfo
- Publication number
- JPS5648165A JPS5648165A JP12409879A JP12409879A JPS5648165A JP S5648165 A JPS5648165 A JP S5648165A JP 12409879 A JP12409879 A JP 12409879A JP 12409879 A JP12409879 A JP 12409879A JP S5648165 A JPS5648165 A JP S5648165A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- polycrystalline silicon
- high resistance
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0688—Integrated circuits having a three-dimensional layout
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12409879A JPS5648165A (en) | 1979-09-28 | 1979-09-28 | Preparation of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12409879A JPS5648165A (en) | 1979-09-28 | 1979-09-28 | Preparation of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5648165A true JPS5648165A (en) | 1981-05-01 |
JPS6336140B2 JPS6336140B2 (ja) | 1988-07-19 |
Family
ID=14876865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12409879A Granted JPS5648165A (en) | 1979-09-28 | 1979-09-28 | Preparation of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5648165A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59225565A (ja) * | 1983-06-06 | 1984-12-18 | Mitsubishi Electric Corp | 半導体装置における金属バラスト抵抗の製造方法 |
JPS60116272A (ja) * | 1983-11-28 | 1985-06-22 | Fujitsu Ltd | フアクシミリの送信制御方式 |
JPS61230363A (ja) * | 1985-04-04 | 1986-10-14 | Fujitsu Ten Ltd | 半導体集積装置 |
JPS62154778A (ja) * | 1985-12-20 | 1987-07-09 | エス ジ− エス ミクロ エレトロニカ エス.ピ−.エ−. | モノリシック集積回路の製造方法 |
JPH01302748A (ja) * | 1988-05-30 | 1989-12-06 | Sharp Corp | 半導体装置の製造方法 |
-
1979
- 1979-09-28 JP JP12409879A patent/JPS5648165A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59225565A (ja) * | 1983-06-06 | 1984-12-18 | Mitsubishi Electric Corp | 半導体装置における金属バラスト抵抗の製造方法 |
JPH0312459B2 (ja) * | 1983-06-06 | 1991-02-20 | Mitsubishi Electric Corp | |
JPS60116272A (ja) * | 1983-11-28 | 1985-06-22 | Fujitsu Ltd | フアクシミリの送信制御方式 |
JPH0473341B2 (ja) * | 1983-11-28 | 1992-11-20 | Fujitsu Ltd | |
JPS61230363A (ja) * | 1985-04-04 | 1986-10-14 | Fujitsu Ten Ltd | 半導体集積装置 |
JPS62154778A (ja) * | 1985-12-20 | 1987-07-09 | エス ジ− エス ミクロ エレトロニカ エス.ピ−.エ−. | モノリシック集積回路の製造方法 |
JPH01302748A (ja) * | 1988-05-30 | 1989-12-06 | Sharp Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6336140B2 (ja) | 1988-07-19 |
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