JPS5630736A - Semiconductor ic circuit - Google Patents
Semiconductor ic circuitInfo
- Publication number
- JPS5630736A JPS5630736A JP10642079A JP10642079A JPS5630736A JP S5630736 A JPS5630736 A JP S5630736A JP 10642079 A JP10642079 A JP 10642079A JP 10642079 A JP10642079 A JP 10642079A JP S5630736 A JPS5630736 A JP S5630736A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- substrate
- width
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
- H01L21/76232—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials of trenches having a shape other than rectangular or V-shape, e.g. rounded corners, oblique or rounded trench walls
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10642079A JPS5630736A (en) | 1979-08-21 | 1979-08-21 | Semiconductor ic circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10642079A JPS5630736A (en) | 1979-08-21 | 1979-08-21 | Semiconductor ic circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5630736A true JPS5630736A (en) | 1981-03-27 |
Family
ID=14433166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10642079A Pending JPS5630736A (en) | 1979-08-21 | 1979-08-21 | Semiconductor ic circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5630736A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840939A (ja) * | 1981-09-03 | 1983-03-10 | Sanyo Electric Co Ltd | コ−ドレス電話 |
JPS6294060A (ja) * | 1985-10-18 | 1987-04-30 | Aihon Kk | インタ−ホン電話機混成装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5218181A (en) * | 1975-08-01 | 1977-02-10 | Toshiba Corp | Semiconductor device process |
-
1979
- 1979-08-21 JP JP10642079A patent/JPS5630736A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5218181A (en) * | 1975-08-01 | 1977-02-10 | Toshiba Corp | Semiconductor device process |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840939A (ja) * | 1981-09-03 | 1983-03-10 | Sanyo Electric Co Ltd | コ−ドレス電話 |
JPS6294060A (ja) * | 1985-10-18 | 1987-04-30 | Aihon Kk | インタ−ホン電話機混成装置 |
JPH047870B2 (ja) * | 1985-10-18 | 1992-02-13 | Aiphone Co Ltd |
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