JPS5617019A - Method and apparatus for exposing semiconductor wafer - Google Patents

Method and apparatus for exposing semiconductor wafer

Info

Publication number
JPS5617019A
JPS5617019A JP5406980A JP5406980A JPS5617019A JP S5617019 A JPS5617019 A JP S5617019A JP 5406980 A JP5406980 A JP 5406980A JP 5406980 A JP5406980 A JP 5406980A JP S5617019 A JPS5617019 A JP S5617019A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
exposing semiconductor
exposing
wafer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5406980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0125220B2 (nl
Inventor
Ban Pesuki Kurisuchian
Eru Meisenheimaa Uiriamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELECTROMASK Inc
Original Assignee
ELECTROMASK Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ELECTROMASK Inc filed Critical ELECTROMASK Inc
Publication of JPS5617019A publication Critical patent/JPS5617019A/ja
Publication of JPH0125220B2 publication Critical patent/JPH0125220B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP5406980A 1979-05-11 1980-04-23 Method and apparatus for exposing semiconductor wafer Granted JPS5617019A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (2)

Publication Number Publication Date
JPS5617019A true JPS5617019A (en) 1981-02-18
JPH0125220B2 JPH0125220B2 (nl) 1989-05-16

Family

ID=21899427

Family Applications (3)

Application Number Title Priority Date Filing Date
JP5406980A Granted JPS5617019A (en) 1979-05-11 1980-04-23 Method and apparatus for exposing semiconductor wafer
JP57103658A Granted JPS5816532A (ja) 1979-05-11 1982-06-16 位置決め装置
JP57103657A Granted JPS5816531A (ja) 1979-05-11 1982-06-16 半導体ウエハ露光装置の位置決め装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP57103658A Granted JPS5816532A (ja) 1979-05-11 1982-06-16 位置決め装置
JP57103657A Granted JPS5816531A (ja) 1979-05-11 1982-06-16 半導体ウエハ露光装置の位置決め装置

Country Status (8)

Country Link
JP (3) JPS5617019A (nl)
DE (1) DE3017582C2 (nl)
FR (1) FR2456338B1 (nl)
GB (2) GB2052767B (nl)
IL (1) IL59629A (nl)
IT (1) IT1212414B (nl)
NL (1) NL8002009A (nl)
SE (3) SE457034B (nl)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
JPH0774094A (ja) * 1994-06-20 1995-03-17 Nikon Corp 投影露光装置及び方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (ja) * 1988-02-22 1997-11-26 日本精工株式会社 露光装置の位置合わせ方法及び装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JP2006213107A (ja) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd 鞍乗り型車両

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (de) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Doppelobjektiv-Einrichtung zum Indeckungbringen einer Photomaske mit einer Unterlage wie einem Halbleiter-Plättchen
JPS4921467A (nl) * 1972-06-20 1974-02-25
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (ja) * 1975-07-25 1984-08-10 株式会社日立製作所 自動焦点合わせ装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5356975A (en) * 1976-11-01 1978-05-23 Hitachi Ltd Exposure apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
JPH0774094A (ja) * 1994-06-20 1995-03-17 Nikon Corp 投影露光装置及び方法

Also Published As

Publication number Publication date
IL59629A0 (en) 1980-06-30
SE457034B (sv) 1988-11-21
GB2052767A (en) 1981-01-28
IT1212414B (it) 1989-11-22
SE8800837L (sv) 1988-03-09
JPS638609B2 (nl) 1988-02-23
GB2111695A (en) 1983-07-06
JPH0310221B2 (nl) 1991-02-13
DE3017582C2 (de) 1986-07-31
NL8002009A (nl) 1980-11-13
GB2111695B (en) 1984-01-11
SE8800836L (sv) 1988-03-09
GB2052767B (en) 1983-06-08
SE8800836D0 (sv) 1988-03-09
SE456873B (sv) 1988-11-07
IL59629A (en) 1983-03-31
FR2456338B1 (fr) 1986-05-09
SE8003424L (sv) 1980-11-12
FR2456338A1 (fr) 1980-12-05
SE8800837D0 (sv) 1988-03-09
JPH0125220B2 (nl) 1989-05-16
JPS5816532A (ja) 1983-01-31
SE456872B (sv) 1988-11-07
DE3017582A1 (de) 1980-11-13
JPS5816531A (ja) 1983-01-31
IT8021931A0 (it) 1980-05-09

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