JPS56126747A - Inspecting method for flaw, alien substance and the like on surface of sample and device therefor - Google Patents

Inspecting method for flaw, alien substance and the like on surface of sample and device therefor

Info

Publication number
JPS56126747A
JPS56126747A JP3039680A JP3039680A JPS56126747A JP S56126747 A JPS56126747 A JP S56126747A JP 3039680 A JP3039680 A JP 3039680A JP 3039680 A JP3039680 A JP 3039680A JP S56126747 A JPS56126747 A JP S56126747A
Authority
JP
Japan
Prior art keywords
light
diffused reflection
reflection light
flaw
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3039680A
Other languages
English (en)
Other versions
JPH0128336B2 (ja
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Yoshimasa Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3039680A priority Critical patent/JPS56126747A/ja
Priority to US06/242,483 priority patent/US4423331A/en
Publication of JPS56126747A publication Critical patent/JPS56126747A/ja
Publication of JPH0128336B2 publication Critical patent/JPH0128336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
JP3039680A 1980-03-12 1980-03-12 Inspecting method for flaw, alien substance and the like on surface of sample and device therefor Granted JPS56126747A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP3039680A JPS56126747A (en) 1980-03-12 1980-03-12 Inspecting method for flaw, alien substance and the like on surface of sample and device therefor
US06/242,483 US4423331A (en) 1980-03-12 1981-03-11 Method and apparatus for inspecting specimen surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3039680A JPS56126747A (en) 1980-03-12 1980-03-12 Inspecting method for flaw, alien substance and the like on surface of sample and device therefor

Publications (2)

Publication Number Publication Date
JPS56126747A true JPS56126747A (en) 1981-10-05
JPH0128336B2 JPH0128336B2 (ja) 1989-06-02

Family

ID=12302758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3039680A Granted JPS56126747A (en) 1980-03-12 1980-03-12 Inspecting method for flaw, alien substance and the like on surface of sample and device therefor

Country Status (2)

Country Link
US (1) US4423331A (ja)
JP (1) JPS56126747A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59180313A (ja) * 1983-03-30 1984-10-13 Toshiba Corp 表面検査装置
JPS6056208A (ja) * 1983-09-08 1985-04-01 Toshiba Corp 表面検査装置
JPS61269011A (ja) * 1985-05-23 1986-11-28 Hitachi Electronics Eng Co Ltd レ−ザ式の表面検査機
JPS6370152A (ja) * 1986-09-11 1988-03-30 Pioneer Electronic Corp 光ディスク用レジスト原盤の欠陥検査及び膜厚測定装置

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5879240A (ja) * 1981-11-06 1983-05-13 Nippon Kogaku Kk <Nikon> 異物検出装置
US4598997A (en) * 1982-02-15 1986-07-08 Rca Corporation Apparatus and method for detecting defects and dust on a patterned surface
JPS59100862A (ja) * 1982-12-01 1984-06-11 Hitachi Ltd 自動分析装置
US4674875A (en) * 1983-12-09 1987-06-23 Hitachi, Ltd. Method and apparatus for inspecting surface defects on the magnetic disk file memories
JPS60196605A (ja) * 1984-03-19 1985-10-05 Nippon Kogaku Kk <Nikon> 散乱光検出光学装置
US5110212A (en) * 1986-10-02 1992-05-05 Sentrol Systems, Ltd. Smoothness sensor
US4954722A (en) * 1989-07-21 1990-09-04 The United States Of America As Represented By The Secretary Of Commerce Scanning scattering microscope with hemispherical mirror and microfocused beam
US5329351A (en) * 1992-11-24 1994-07-12 Estek Corporation Particle detection system with coincident detection
US5448364A (en) * 1993-03-22 1995-09-05 Estek Corporation Particle detection system with reflective line-to-spot collector
US6271916B1 (en) 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
US5672885A (en) * 1995-07-10 1997-09-30 Qc Optics, Inc. Surface displacement detection and adjustment system
US6201601B1 (en) * 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
US6366690B1 (en) * 1998-07-07 2002-04-02 Applied Materials, Inc. Pixel based machine for patterned wafers
DE19904427B4 (de) * 1999-02-04 2004-12-16 Basler Ag Verfahren zum Prüfen von rotationssymmetrischen Gegenständen
US6356346B1 (en) * 2000-01-21 2002-03-12 International Business Machines Corporation Device and method for inspecting a disk for physical defects
US6515742B1 (en) * 2000-11-28 2003-02-04 Memc Electronic Materials, Inc. Defect classification using scattered light intensities
US6538730B2 (en) * 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US7116413B2 (en) * 2002-09-13 2006-10-03 Kla-Tencor Corporation Inspection system for integrated applications
US7002675B2 (en) * 2003-07-10 2006-02-21 Synetics Solutions, Inc. Method and apparatus for locating/sizing contaminants on a polished planar surface of a dielectric or semiconductor material
DE102004020704A1 (de) * 2004-04-28 2005-11-24 Precitec Kg Sensorvorrichtung zur Erfassung von Strahlung aus dem Bereich einer Wechselwirkungszone zwischen einem Laserstrahl und einem Werkstück sowie Vorrichtung zur Überwachung eines Laserbearbeitungsvorgangs und Laserbearbeitungskopf
JP4996856B2 (ja) * 2006-01-23 2012-08-08 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法
CN100437026C (zh) * 2006-07-20 2008-11-26 厦门大学 物体表面三维形貌信息测量装置
DE102007045383A1 (de) * 2007-09-22 2008-07-17 Bohle Ag Verfahren zur Herstellung von Schneidrädchen
JP5198189B2 (ja) * 2008-08-29 2013-05-15 富士フイルム株式会社 ハードディスク検査装置
FR2981161B1 (fr) * 2011-10-10 2014-06-13 Altatech Semiconductor Dispositif d'inspection de plaquettes semi-conductrices a champ noir.
JP7332149B2 (ja) * 2019-09-27 2023-08-23 株式会社トヨコー レーザ照射装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315104A (en) * 1976-07-23 1978-02-10 Thomson Brandt Method and device for optically reading information

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3659950A (en) * 1969-07-14 1972-05-02 Iris Corp Laser apparatus for detecting the size and form of filamentary material by measuring diffracted light
US3879131A (en) * 1974-02-06 1975-04-22 Bell Telephone Labor Inc Photomask inspection by real time diffraction pattern analysis
US4095905A (en) * 1975-08-20 1978-06-20 Hitachi, Ltd. Surface-defect detecting device
JPS53135654A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting device
US4197011A (en) * 1977-09-22 1980-04-08 Rca Corporation Defect detection and plotting system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315104A (en) * 1976-07-23 1978-02-10 Thomson Brandt Method and device for optically reading information

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59180313A (ja) * 1983-03-30 1984-10-13 Toshiba Corp 表面検査装置
JPH0358042B2 (ja) * 1983-03-30 1991-09-04 Tokyo Shibaura Electric Co
JPS6056208A (ja) * 1983-09-08 1985-04-01 Toshiba Corp 表面検査装置
JPH0517482B2 (ja) * 1983-09-08 1993-03-09 Tokyo Shibaura Electric Co
JPS61269011A (ja) * 1985-05-23 1986-11-28 Hitachi Electronics Eng Co Ltd レ−ザ式の表面検査機
JPS6370152A (ja) * 1986-09-11 1988-03-30 Pioneer Electronic Corp 光ディスク用レジスト原盤の欠陥検査及び膜厚測定装置
JPH0575263B2 (ja) * 1986-09-11 1993-10-20 Pioneer Electronic Corp

Also Published As

Publication number Publication date
US4423331A (en) 1983-12-27
JPH0128336B2 (ja) 1989-06-02

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