JPS56100443A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS56100443A JPS56100443A JP386480A JP386480A JPS56100443A JP S56100443 A JPS56100443 A JP S56100443A JP 386480 A JP386480 A JP 386480A JP 386480 A JP386480 A JP 386480A JP S56100443 A JPS56100443 A JP S56100443A
- Authority
- JP
- Japan
- Prior art keywords
- openings
- poly
- si3n4
- layer
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP386480A JPS56100443A (en) | 1980-01-16 | 1980-01-16 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP386480A JPS56100443A (en) | 1980-01-16 | 1980-01-16 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56100443A true JPS56100443A (en) | 1981-08-12 |
JPS6231492B2 JPS6231492B2 (enrdf_load_stackoverflow) | 1987-07-08 |
Family
ID=11569056
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP386480A Granted JPS56100443A (en) | 1980-01-16 | 1980-01-16 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56100443A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60128636A (ja) * | 1983-12-16 | 1985-07-09 | Toshiba Corp | 半導体装置の製造方法 |
US4667244A (en) * | 1983-11-29 | 1987-05-19 | Kabushiki Kaisha Toshiba | Paper feeding apparatus |
JPS63202530A (ja) * | 1987-02-17 | 1988-08-22 | Canon Inc | 給紙装置 |
JPS63277139A (ja) * | 1987-02-17 | 1988-11-15 | Canon Inc | 給紙装置 |
-
1980
- 1980-01-16 JP JP386480A patent/JPS56100443A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4667244A (en) * | 1983-11-29 | 1987-05-19 | Kabushiki Kaisha Toshiba | Paper feeding apparatus |
JPS60128636A (ja) * | 1983-12-16 | 1985-07-09 | Toshiba Corp | 半導体装置の製造方法 |
JPS63202530A (ja) * | 1987-02-17 | 1988-08-22 | Canon Inc | 給紙装置 |
JPS63277139A (ja) * | 1987-02-17 | 1988-11-15 | Canon Inc | 給紙装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6231492B2 (enrdf_load_stackoverflow) | 1987-07-08 |
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