JPS5588323A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5588323A
JPS5588323A JP15986778A JP15986778A JPS5588323A JP S5588323 A JPS5588323 A JP S5588323A JP 15986778 A JP15986778 A JP 15986778A JP 15986778 A JP15986778 A JP 15986778A JP S5588323 A JPS5588323 A JP S5588323A
Authority
JP
Japan
Prior art keywords
wafer
heater
diffusion
impurities
furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15986778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS633446B2 (enrdf_load_stackoverflow
Inventor
Norimasa Miyamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15986778A priority Critical patent/JPS5588323A/ja
Publication of JPS5588323A publication Critical patent/JPS5588323A/ja
Publication of JPS633446B2 publication Critical patent/JPS633446B2/ja
Granted legal-status Critical Current

Links

JP15986778A 1978-12-27 1978-12-27 Manufacture of semiconductor device Granted JPS5588323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15986778A JPS5588323A (en) 1978-12-27 1978-12-27 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15986778A JPS5588323A (en) 1978-12-27 1978-12-27 Manufacture of semiconductor device

Related Child Applications (4)

Application Number Title Priority Date Filing Date
JP29056485A Division JPS61172325A (ja) 1985-12-25 1985-12-25 縦型熱処理炉
JP16792686A Division JPS6211224A (ja) 1986-07-18 1986-07-18 半導体ウエハの熱処理方法
JP15110287A Division JPS6323313A (ja) 1987-06-19 1987-06-19 半導体ウエハの熱処理方法
JP191891A Division JPH03273620A (ja) 1991-01-11 1991-01-11 半導体ウエハの熱処理方法

Publications (2)

Publication Number Publication Date
JPS5588323A true JPS5588323A (en) 1980-07-04
JPS633446B2 JPS633446B2 (enrdf_load_stackoverflow) 1988-01-23

Family

ID=15702940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15986778A Granted JPS5588323A (en) 1978-12-27 1978-12-27 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5588323A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108735A (ja) * 1981-12-23 1983-06-28 Fujitsu Ltd 縦型反応管用バスケツト
JPS58110034A (ja) * 1981-12-24 1983-06-30 Fujitsu Ltd 縦型気相エピタキシヤル装置
JPS5974621A (ja) * 1982-10-21 1984-04-27 Stanley Electric Co Ltd 不純物拡散法及びこれに使用する治具
JPS59232434A (ja) * 1983-06-16 1984-12-27 Nippon Telegr & Teleph Corp <Ntt> 真空処理装置に於けるワ−ク回転装置
JPS6127625A (ja) * 1984-07-18 1986-02-07 Deisuko Saiyaa Japan:Kk 半導体物品の熱処理方法及びこれに使用する装置
JPS6211224A (ja) * 1986-07-18 1987-01-20 Hitachi Ltd 半導体ウエハの熱処理方法
JPS633136U (enrdf_load_stackoverflow) * 1986-06-24 1988-01-11
JPH0258825A (ja) * 1988-08-24 1990-02-28 Nec Kyushu Ltd 縦型減圧ｃｖｄ装置
JPH02152224A (ja) * 1988-12-02 1990-06-12 Toshiba Corp 気相成長装置
JPH0467619A (ja) * 1990-07-09 1992-03-03 Nec Kyushu Ltd 半導体製造装置
JPH05157006A (ja) * 1991-11-29 1993-06-22 Kubota Corp エンジンの排熱回収装置
JPH06349738A (ja) * 1993-06-08 1994-12-22 Nec Corp 縦型減圧ｃｖｄ装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0267137A (ja) * 1988-09-02 1990-03-07 Komori Printing Mach Co Ltd 印刷胴の自動ゴミ取り装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108735A (ja) * 1981-12-23 1983-06-28 Fujitsu Ltd 縦型反応管用バスケツト
JPS58110034A (ja) * 1981-12-24 1983-06-30 Fujitsu Ltd 縦型気相エピタキシヤル装置
JPS5974621A (ja) * 1982-10-21 1984-04-27 Stanley Electric Co Ltd 不純物拡散法及びこれに使用する治具
JPS59232434A (ja) * 1983-06-16 1984-12-27 Nippon Telegr & Teleph Corp <Ntt> 真空処理装置に於けるワ−ク回転装置
JPS6127625A (ja) * 1984-07-18 1986-02-07 Deisuko Saiyaa Japan:Kk 半導体物品の熱処理方法及びこれに使用する装置
JPS633136U (enrdf_load_stackoverflow) * 1986-06-24 1988-01-11
JPS6211224A (ja) * 1986-07-18 1987-01-20 Hitachi Ltd 半導体ウエハの熱処理方法
JPH0258825A (ja) * 1988-08-24 1990-02-28 Nec Kyushu Ltd 縦型減圧ｃｖｄ装置
JPH02152224A (ja) * 1988-12-02 1990-06-12 Toshiba Corp 気相成長装置
JPH0467619A (ja) * 1990-07-09 1992-03-03 Nec Kyushu Ltd 半導体製造装置
JPH05157006A (ja) * 1991-11-29 1993-06-22 Kubota Corp エンジンの排熱回収装置
JPH06349738A (ja) * 1993-06-08 1994-12-22 Nec Corp 縦型減圧ｃｖｄ装置

Also Published As

Publication number Publication date
JPS633446B2 (enrdf_load_stackoverflow) 1988-01-23

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