JPS5472978A - Heat treatment unit - Google Patents
Heat treatment unitInfo
- Publication number
- JPS5472978A JPS5472978A JP13998777A JP13998777A JPS5472978A JP S5472978 A JPS5472978 A JP S5472978A JP 13998777 A JP13998777 A JP 13998777A JP 13998777 A JP13998777 A JP 13998777A JP S5472978 A JPS5472978 A JP S5472978A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- open terminal
- sticking
- terminal
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce the number of times of washing a reaction pipe, and to improve the yield by preventing impurities produced here from sticking to a sample in process of lead-out operation, by making the open terminal of the long pipe, constituting a CVD device, thinner than its reaction region.
CONSTITUTION: As for the shape of the long reaction pipe with one terminal open constituting the CVD device, the diameter of reaction region 7b surrounded with heat heating part 1 is made shorter than that of open terminal 7a protruding from heating part 1. As a result, sample 4 on jig 6 in process of lead-in operation is not contaminated by impurity 5 such as NH4Cl sticking inside open terminal 7a lower in temperature than reaction region 7b at the time of attaining reaction by heating the device to an reaction temperature. In addition, jig receptacle 8 is arranged inside open terminal 7a so as to evade contamination more effectively. Further, the sticking amount of impurity 5 can be controlled by adjusting the temperature by providing another heating device 10 to the circumference of open terminal 7a.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13998777A JPS5472978A (en) | 1977-11-24 | 1977-11-24 | Heat treatment unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13998777A JPS5472978A (en) | 1977-11-24 | 1977-11-24 | Heat treatment unit |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24197283A Division JPS59145521A (en) | 1983-12-23 | 1983-12-23 | Thermal treatment equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5472978A true JPS5472978A (en) | 1979-06-11 |
Family
ID=15258294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13998777A Pending JPS5472978A (en) | 1977-11-24 | 1977-11-24 | Heat treatment unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5472978A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840824A (en) * | 1981-09-03 | 1983-03-09 | Nec Corp | Heat treatment device for semiconductor wafer |
JPS61237432A (en) * | 1985-04-15 | 1986-10-22 | Mitsubishi Electric Corp | Sintering furnace |
-
1977
- 1977-11-24 JP JP13998777A patent/JPS5472978A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5840824A (en) * | 1981-09-03 | 1983-03-09 | Nec Corp | Heat treatment device for semiconductor wafer |
JPH0534821B2 (en) * | 1981-09-03 | 1993-05-25 | Nippon Electric Co | |
JPS61237432A (en) * | 1985-04-15 | 1986-10-22 | Mitsubishi Electric Corp | Sintering furnace |
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