JPS5472978A - Heat treatment unit - Google Patents

Heat treatment unit

Info

Publication number
JPS5472978A
JPS5472978A JP13998777A JP13998777A JPS5472978A JP S5472978 A JPS5472978 A JP S5472978A JP 13998777 A JP13998777 A JP 13998777A JP 13998777 A JP13998777 A JP 13998777A JP S5472978 A JPS5472978 A JP S5472978A
Authority
JP
Japan
Prior art keywords
reaction
open terminal
sticking
terminal
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13998777A
Other languages
Japanese (ja)
Inventor
Takeo Yoshimi
Hideo Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13998777A priority Critical patent/JPS5472978A/en
Publication of JPS5472978A publication Critical patent/JPS5472978A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the number of times of washing a reaction pipe, and to improve the yield by preventing impurities produced here from sticking to a sample in process of lead-out operation, by making the open terminal of the long pipe, constituting a CVD device, thinner than its reaction region.
CONSTITUTION: As for the shape of the long reaction pipe with one terminal open constituting the CVD device, the diameter of reaction region 7b surrounded with heat heating part 1 is made shorter than that of open terminal 7a protruding from heating part 1. As a result, sample 4 on jig 6 in process of lead-in operation is not contaminated by impurity 5 such as NH4Cl sticking inside open terminal 7a lower in temperature than reaction region 7b at the time of attaining reaction by heating the device to an reaction temperature. In addition, jig receptacle 8 is arranged inside open terminal 7a so as to evade contamination more effectively. Further, the sticking amount of impurity 5 can be controlled by adjusting the temperature by providing another heating device 10 to the circumference of open terminal 7a.
COPYRIGHT: (C)1979,JPO&Japio
JP13998777A 1977-11-24 1977-11-24 Heat treatment unit Pending JPS5472978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13998777A JPS5472978A (en) 1977-11-24 1977-11-24 Heat treatment unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13998777A JPS5472978A (en) 1977-11-24 1977-11-24 Heat treatment unit

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP24197283A Division JPS59145521A (en) 1983-12-23 1983-12-23 Thermal treatment equipment

Publications (1)

Publication Number Publication Date
JPS5472978A true JPS5472978A (en) 1979-06-11

Family

ID=15258294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13998777A Pending JPS5472978A (en) 1977-11-24 1977-11-24 Heat treatment unit

Country Status (1)

Country Link
JP (1) JPS5472978A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5840824A (en) * 1981-09-03 1983-03-09 Nec Corp Heat treatment device for semiconductor wafer
JPS61237432A (en) * 1985-04-15 1986-10-22 Mitsubishi Electric Corp Sintering furnace

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5840824A (en) * 1981-09-03 1983-03-09 Nec Corp Heat treatment device for semiconductor wafer
JPH0534821B2 (en) * 1981-09-03 1993-05-25 Nippon Electric Co
JPS61237432A (en) * 1985-04-15 1986-10-22 Mitsubishi Electric Corp Sintering furnace

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