JPS5561027A - Gas plasma etching - Google Patents

Gas plasma etching

Info

Publication number
JPS5561027A
JPS5561027A JP13393578A JP13393578A JPS5561027A JP S5561027 A JPS5561027 A JP S5561027A JP 13393578 A JP13393578 A JP 13393578A JP 13393578 A JP13393578 A JP 13393578A JP S5561027 A JPS5561027 A JP S5561027A
Authority
JP
Japan
Prior art keywords
gas
sio
substrate
film layer
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13393578A
Other languages
English (en)
Other versions
JPS6262048B2 (ja
Inventor
Hiroyasu Toyoda
Hiroyoshi Komiya
Hideaki Itakura
Mineto Tobinaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP13393578A priority Critical patent/JPS5561027A/ja
Publication of JPS5561027A publication Critical patent/JPS5561027A/ja
Publication of JPS6262048B2 publication Critical patent/JPS6262048B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP13393578A 1978-10-30 1978-10-30 Gas plasma etching Granted JPS5561027A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13393578A JPS5561027A (en) 1978-10-30 1978-10-30 Gas plasma etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13393578A JPS5561027A (en) 1978-10-30 1978-10-30 Gas plasma etching

Publications (2)

Publication Number Publication Date
JPS5561027A true JPS5561027A (en) 1980-05-08
JPS6262048B2 JPS6262048B2 (ja) 1987-12-24

Family

ID=15116502

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13393578A Granted JPS5561027A (en) 1978-10-30 1978-10-30 Gas plasma etching

Country Status (1)

Country Link
JP (1) JPS5561027A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5950104A (en) * 1997-04-09 1999-09-07 Vanguard International Semiconductor Corporation Contact process using Y-contact etching
EP0926721A3 (en) * 1997-12-23 2001-12-19 Siemens Aktiengesellschaft Dual damascene with bond pads

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID-STATE ELECTRONICS=1976 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5950104A (en) * 1997-04-09 1999-09-07 Vanguard International Semiconductor Corporation Contact process using Y-contact etching
EP0926721A3 (en) * 1997-12-23 2001-12-19 Siemens Aktiengesellschaft Dual damascene with bond pads

Also Published As

Publication number Publication date
JPS6262048B2 (ja) 1987-12-24

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