JPS5530826A - Method of manufacturing semiconductor device - Google Patents
Method of manufacturing semiconductor deviceInfo
- Publication number
- JPS5530826A JPS5530826A JP10354178A JP10354178A JPS5530826A JP S5530826 A JPS5530826 A JP S5530826A JP 10354178 A JP10354178 A JP 10354178A JP 10354178 A JP10354178 A JP 10354178A JP S5530826 A JPS5530826 A JP S5530826A
- Authority
- JP
- Japan
- Prior art keywords
- aluminium
- etching
- film
- alumina
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 6
- 229910052782 aluminium Inorganic materials 0.000 abstract 6
- 239000004411 aluminium Substances 0.000 abstract 6
- 238000005530 etching Methods 0.000 abstract 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 4
- 239000000203 mixture Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- 239000007788 liquid Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
Landscapes
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10354178A JPS5530826A (en) | 1978-08-24 | 1978-08-24 | Method of manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10354178A JPS5530826A (en) | 1978-08-24 | 1978-08-24 | Method of manufacturing semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5530826A true JPS5530826A (en) | 1980-03-04 |
JPS6349371B2 JPS6349371B2 (enrdf_load_stackoverflow) | 1988-10-04 |
Family
ID=14356694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10354178A Granted JPS5530826A (en) | 1978-08-24 | 1978-08-24 | Method of manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5530826A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0484871A (ja) * | 1990-07-25 | 1992-03-18 | Fujitsuko Kk | 納豆の製法 |
EP0580368A3 (en) * | 1992-07-21 | 1996-03-20 | Seagate Technology | Studless thin film magnetic head and process for making the same |
US5650897A (en) * | 1992-07-21 | 1997-07-22 | Seagate Technology, Inc. | Thin film magnetic head including lightning arrester and process for making the same |
WO2001009935A1 (de) | 1999-07-28 | 2001-02-08 | Merck Patent Gmbh | Ätzlösung, flusssäure enthaltend |
JPWO2004025718A1 (ja) * | 2002-09-13 | 2006-01-12 | ダイキン工業株式会社 | エッチング液及びエッチング方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03114784U (enrdf_load_stackoverflow) * | 1990-03-08 | 1991-11-26 | ||
JPH07112754A (ja) * | 1993-10-07 | 1995-05-02 | Aroinsu Keshohin:Kk | 流動物抽出容器 |
-
1978
- 1978-08-24 JP JP10354178A patent/JPS5530826A/ja active Granted
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0484871A (ja) * | 1990-07-25 | 1992-03-18 | Fujitsuko Kk | 納豆の製法 |
US6059984A (en) * | 1992-07-21 | 2000-05-09 | Seagate Technology, Inc. | Process for fabricating thin film magnetic head including crater for recessed structure |
US6635184B1 (en) | 1992-07-21 | 2003-10-21 | Uri Cohen | Method for pattern-etching alumina layers and products |
US5657192A (en) * | 1992-07-21 | 1997-08-12 | Seagate Technology, Inc. | Thin film magnetic head including crater for recessed structure and process for making the same |
US5659451A (en) * | 1992-07-21 | 1997-08-19 | Seagate Technology, Inc. | Studless thin film magnetic head and process for making the same |
US5820770A (en) * | 1992-07-21 | 1998-10-13 | Seagate Technology, Inc. | Thin film magnetic head including vias formed in alumina layer and process for making the same |
US5835315A (en) * | 1992-07-21 | 1998-11-10 | Seagate Technology, Inc. | Wafer including scribe line grooves for separating thin film heads and process for making the same |
US5650897A (en) * | 1992-07-21 | 1997-07-22 | Seagate Technology, Inc. | Thin film magnetic head including lightning arrester and process for making the same |
EP0580368A3 (en) * | 1992-07-21 | 1996-03-20 | Seagate Technology | Studless thin film magnetic head and process for making the same |
EP0938079A3 (en) * | 1992-07-21 | 1999-09-15 | Seagate Technology International | Studless thin film magnetic head and process for making the same |
JP2003514373A (ja) * | 1999-07-28 | 2003-04-15 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | フッ化水素酸を含むエッチング溶液 |
WO2001009935A1 (de) | 1999-07-28 | 2001-02-08 | Merck Patent Gmbh | Ätzlösung, flusssäure enthaltend |
US7501072B2 (en) | 1999-07-28 | 2009-03-10 | Basf Aktiengesellschaft | Etching solution comprising hydrofluoric acid |
JP4837211B2 (ja) * | 1999-07-28 | 2011-12-14 | ベーアーエスエフ アクチエンゲゼルシャフト | フッ化水素酸を含むエッチング溶液 |
JPWO2004025718A1 (ja) * | 2002-09-13 | 2006-01-12 | ダイキン工業株式会社 | エッチング液及びエッチング方法 |
EP1538664A4 (en) * | 2002-09-13 | 2007-04-04 | Daikin Ind Ltd | MEDICAMENTS AND METHODS OF PROCESSING |
Also Published As
Publication number | Publication date |
---|---|
JPS6349371B2 (enrdf_load_stackoverflow) | 1988-10-04 |
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