JPS5530826A - Method of manufacturing semiconductor device - Google Patents

Method of manufacturing semiconductor device

Info

Publication number
JPS5530826A
JPS5530826A JP10354178A JP10354178A JPS5530826A JP S5530826 A JPS5530826 A JP S5530826A JP 10354178 A JP10354178 A JP 10354178A JP 10354178 A JP10354178 A JP 10354178A JP S5530826 A JPS5530826 A JP S5530826A
Authority
JP
Japan
Prior art keywords
aluminium
etching
film
alumina
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10354178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349371B2 (enrdf_load_stackoverflow
Inventor
Masato Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP10354178A priority Critical patent/JPS5530826A/ja
Publication of JPS5530826A publication Critical patent/JPS5530826A/ja
Publication of JPS6349371B2 publication Critical patent/JPS6349371B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP10354178A 1978-08-24 1978-08-24 Method of manufacturing semiconductor device Granted JPS5530826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10354178A JPS5530826A (en) 1978-08-24 1978-08-24 Method of manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10354178A JPS5530826A (en) 1978-08-24 1978-08-24 Method of manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
JPS5530826A true JPS5530826A (en) 1980-03-04
JPS6349371B2 JPS6349371B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=14356694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10354178A Granted JPS5530826A (en) 1978-08-24 1978-08-24 Method of manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5530826A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0484871A (ja) * 1990-07-25 1992-03-18 Fujitsuko Kk 納豆の製法
EP0580368A3 (en) * 1992-07-21 1996-03-20 Seagate Technology Studless thin film magnetic head and process for making the same
US5650897A (en) * 1992-07-21 1997-07-22 Seagate Technology, Inc. Thin film magnetic head including lightning arrester and process for making the same
WO2001009935A1 (de) 1999-07-28 2001-02-08 Merck Patent Gmbh Ätzlösung, flusssäure enthaltend
JPWO2004025718A1 (ja) * 2002-09-13 2006-01-12 ダイキン工業株式会社 エッチング液及びエッチング方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03114784U (enrdf_load_stackoverflow) * 1990-03-08 1991-11-26
JPH07112754A (ja) * 1993-10-07 1995-05-02 Aroinsu Keshohin:Kk 流動物抽出容器

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0484871A (ja) * 1990-07-25 1992-03-18 Fujitsuko Kk 納豆の製法
US6059984A (en) * 1992-07-21 2000-05-09 Seagate Technology, Inc. Process for fabricating thin film magnetic head including crater for recessed structure
US6635184B1 (en) 1992-07-21 2003-10-21 Uri Cohen Method for pattern-etching alumina layers and products
US5657192A (en) * 1992-07-21 1997-08-12 Seagate Technology, Inc. Thin film magnetic head including crater for recessed structure and process for making the same
US5659451A (en) * 1992-07-21 1997-08-19 Seagate Technology, Inc. Studless thin film magnetic head and process for making the same
US5820770A (en) * 1992-07-21 1998-10-13 Seagate Technology, Inc. Thin film magnetic head including vias formed in alumina layer and process for making the same
US5835315A (en) * 1992-07-21 1998-11-10 Seagate Technology, Inc. Wafer including scribe line grooves for separating thin film heads and process for making the same
US5650897A (en) * 1992-07-21 1997-07-22 Seagate Technology, Inc. Thin film magnetic head including lightning arrester and process for making the same
EP0580368A3 (en) * 1992-07-21 1996-03-20 Seagate Technology Studless thin film magnetic head and process for making the same
EP0938079A3 (en) * 1992-07-21 1999-09-15 Seagate Technology International Studless thin film magnetic head and process for making the same
JP2003514373A (ja) * 1999-07-28 2003-04-15 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング フッ化水素酸を含むエッチング溶液
WO2001009935A1 (de) 1999-07-28 2001-02-08 Merck Patent Gmbh Ätzlösung, flusssäure enthaltend
US7501072B2 (en) 1999-07-28 2009-03-10 Basf Aktiengesellschaft Etching solution comprising hydrofluoric acid
JP4837211B2 (ja) * 1999-07-28 2011-12-14 ベーアーエスエフ アクチエンゲゼルシャフト フッ化水素酸を含むエッチング溶液
JPWO2004025718A1 (ja) * 2002-09-13 2006-01-12 ダイキン工業株式会社 エッチング液及びエッチング方法
EP1538664A4 (en) * 2002-09-13 2007-04-04 Daikin Ind Ltd MEDICAMENTS AND METHODS OF PROCESSING

Also Published As

Publication number Publication date
JPS6349371B2 (enrdf_load_stackoverflow) 1988-10-04

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