JPS5536926A - Manufacturing of semiconductor device - Google Patents
Manufacturing of semiconductor deviceInfo
- Publication number
- JPS5536926A JPS5536926A JP10844478A JP10844478A JPS5536926A JP S5536926 A JPS5536926 A JP S5536926A JP 10844478 A JP10844478 A JP 10844478A JP 10844478 A JP10844478 A JP 10844478A JP S5536926 A JPS5536926 A JP S5536926A
- Authority
- JP
- Japan
- Prior art keywords
- film
- etching
- window
- silicon dioxide
- metamorphic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To facilitate formating of fine pattern inter-wiring contact hole and also to prevent inter-wiring capacity from increasing by forming a metamorphic film from applying high-frequency spatter etching to silicon dioxide film formed on a semiconductor substrate.
CONSTITUTION: An electrode wiring 3 of the first layer is formed on an insulating film 2 on a semiconductor substrate 1 in which various areas are formed, and then a silicon dioxide film 4 is grown to a given thickness according to chemical vapor phase growth process. Next, a metamorphic film is formed by etching the film 4 to a given thickness according to high-frequency spatter etching process for which argon ion is used, and then a contact window 4a is formed by means of etching liquid of fluoric acid group. Further a silicon dioxide film 5 is grown to a given thickness according to chemical vapor phase growth process, a photoresist film 6 having an etching window 6a is formed on the said film 5, and the window 4a is exposed again by etching the film 5 with the film 6 working as a mask. In this case, the window 4a can easily be formed by the metamorphic film without etching the film 4.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10844478A JPS5536926A (en) | 1978-09-04 | 1978-09-04 | Manufacturing of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10844478A JPS5536926A (en) | 1978-09-04 | 1978-09-04 | Manufacturing of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5536926A true JPS5536926A (en) | 1980-03-14 |
Family
ID=14484924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10844478A Pending JPS5536926A (en) | 1978-09-04 | 1978-09-04 | Manufacturing of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5536926A (en) |
-
1978
- 1978-09-04 JP JP10844478A patent/JPS5536926A/en active Pending
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