JPS5515258A - Heat treatment apparatus for semiconductor substrate - Google Patents
Heat treatment apparatus for semiconductor substrateInfo
- Publication number
- JPS5515258A JPS5515258A JP8875478A JP8875478A JPS5515258A JP S5515258 A JPS5515258 A JP S5515258A JP 8875478 A JP8875478 A JP 8875478A JP 8875478 A JP8875478 A JP 8875478A JP S5515258 A JPS5515258 A JP S5515258A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- casing
- supporter
- heat treatment
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8875478A JPS5515258A (en) | 1978-07-19 | 1978-07-19 | Heat treatment apparatus for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8875478A JPS5515258A (en) | 1978-07-19 | 1978-07-19 | Heat treatment apparatus for semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5515258A true JPS5515258A (en) | 1980-02-02 |
Family
ID=13951676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8875478A Pending JPS5515258A (en) | 1978-07-19 | 1978-07-19 | Heat treatment apparatus for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5515258A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170102802A (ko) | 2016-03-02 | 2017-09-12 | 오므론 가부시키가이샤 | 압력 센서 칩 및 압력 센서 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50114179A (ja) * | 1974-02-15 | 1975-09-06 | ||
JPS5362982A (en) * | 1976-11-17 | 1978-06-05 | Toshiba Corp | Plasma cvd apparatus |
JPS5375767A (en) * | 1976-12-16 | 1978-07-05 | Nec Corp | Oxidizing method for semiconductor device |
-
1978
- 1978-07-19 JP JP8875478A patent/JPS5515258A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50114179A (ja) * | 1974-02-15 | 1975-09-06 | ||
JPS5362982A (en) * | 1976-11-17 | 1978-06-05 | Toshiba Corp | Plasma cvd apparatus |
JPS5375767A (en) * | 1976-12-16 | 1978-07-05 | Nec Corp | Oxidizing method for semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170102802A (ko) | 2016-03-02 | 2017-09-12 | 오므론 가부시키가이샤 | 압력 센서 칩 및 압력 센서 |
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