JPS5375767A - Oxidizing method for semiconductor device - Google Patents

Oxidizing method for semiconductor device

Info

Publication number
JPS5375767A
JPS5375767A JP15153376A JP15153376A JPS5375767A JP S5375767 A JPS5375767 A JP S5375767A JP 15153376 A JP15153376 A JP 15153376A JP 15153376 A JP15153376 A JP 15153376A JP S5375767 A JPS5375767 A JP S5375767A
Authority
JP
Japan
Prior art keywords
semiconductor device
oxidizing method
oxidizing
oxidization
equilibrium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15153376A
Other languages
Japanese (ja)
Other versions
JPS5931854B2 (en
Inventor
Masahiko Nakamae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP15153376A priority Critical patent/JPS5931854B2/en
Publication of JPS5375767A publication Critical patent/JPS5375767A/en
Publication of JPS5931854B2 publication Critical patent/JPS5931854B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To enable the oxidization at a low temperature and in a short time, based on the equation of equilibrium, by sealing the liquid oxygen and Si wafer with a given quantity to the pressure proof capsule.
COPYRIGHT: (C)1978,JPO&Japio
JP15153376A 1976-12-16 1976-12-16 Oxidation method for semiconductor devices Expired JPS5931854B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15153376A JPS5931854B2 (en) 1976-12-16 1976-12-16 Oxidation method for semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15153376A JPS5931854B2 (en) 1976-12-16 1976-12-16 Oxidation method for semiconductor devices

Publications (2)

Publication Number Publication Date
JPS5375767A true JPS5375767A (en) 1978-07-05
JPS5931854B2 JPS5931854B2 (en) 1984-08-04

Family

ID=15520585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15153376A Expired JPS5931854B2 (en) 1976-12-16 1976-12-16 Oxidation method for semiconductor devices

Country Status (1)

Country Link
JP (1) JPS5931854B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515258A (en) * 1978-07-19 1980-02-02 Nec Corp Heat treatment apparatus for semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515258A (en) * 1978-07-19 1980-02-02 Nec Corp Heat treatment apparatus for semiconductor substrate

Also Published As

Publication number Publication date
JPS5931854B2 (en) 1984-08-04

Similar Documents

Publication Publication Date Title
JPS5298804A (en) Turbine operation
JPS5338278A (en) Semiconductor device
JPS52110333A (en) Fuel-air ratio control device
JPS5375767A (en) Oxidizing method for semiconductor device
JPS539911A (en) Nitrogen oxide exhaust quantity control method and device for gas turbine plant
JPS5227938A (en) Antifreezer sensor device
JPS5377168A (en) Production of semiconductor device
JPS51126037A (en) Semiconductor crystal growth method
JPS5367358A (en) Semiconductor device
JPS5210676A (en) Semiconductor device
JPS5333580A (en) Production of semiconductor device
JPS52156583A (en) Electrode formation method in semiconductor device
JPS5374368A (en) Package for semiconductor device
JPS52127375A (en) Apparatus for measuring relative presure
JPS5368070A (en) Etching method
JPS5329082A (en) Semiconductor device
JPS5228720A (en) Developer for electronics photograph
JPS5370666A (en) Production of semiconductor device
JPS5350670A (en) Production of semiconductor device
JPS51120688A (en) Manufacturing method for semiconductor apparatus
JPS51127794A (en) Gas detecting element
JPS51132894A (en) Gas sensitive body
JPS51144181A (en) Seal member for semiconductor unit
JPS53112668A (en) Preparing method for oxide film
JPS5338991A (en) Semiconductor device