JPS5375767A - Oxidizing method for semiconductor device - Google Patents
Oxidizing method for semiconductor deviceInfo
- Publication number
- JPS5375767A JPS5375767A JP15153376A JP15153376A JPS5375767A JP S5375767 A JPS5375767 A JP S5375767A JP 15153376 A JP15153376 A JP 15153376A JP 15153376 A JP15153376 A JP 15153376A JP S5375767 A JPS5375767 A JP S5375767A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- oxidizing method
- oxidizing
- oxidization
- equilibrium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: To enable the oxidization at a low temperature and in a short time, based on the equation of equilibrium, by sealing the liquid oxygen and Si wafer with a given quantity to the pressure proof capsule.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15153376A JPS5931854B2 (en) | 1976-12-16 | 1976-12-16 | Oxidation method for semiconductor devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15153376A JPS5931854B2 (en) | 1976-12-16 | 1976-12-16 | Oxidation method for semiconductor devices |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5375767A true JPS5375767A (en) | 1978-07-05 |
JPS5931854B2 JPS5931854B2 (en) | 1984-08-04 |
Family
ID=15520585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15153376A Expired JPS5931854B2 (en) | 1976-12-16 | 1976-12-16 | Oxidation method for semiconductor devices |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5931854B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515258A (en) * | 1978-07-19 | 1980-02-02 | Nec Corp | Heat treatment apparatus for semiconductor substrate |
-
1976
- 1976-12-16 JP JP15153376A patent/JPS5931854B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5515258A (en) * | 1978-07-19 | 1980-02-02 | Nec Corp | Heat treatment apparatus for semiconductor substrate |
Also Published As
Publication number | Publication date |
---|---|
JPS5931854B2 (en) | 1984-08-04 |
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