JPS551117A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS551117A JPS551117A JP7342078A JP7342078A JPS551117A JP S551117 A JPS551117 A JP S551117A JP 7342078 A JP7342078 A JP 7342078A JP 7342078 A JP7342078 A JP 7342078A JP S551117 A JPS551117 A JP S551117A
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist
- sio
- pattern
- carbonized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7342078A JPS551117A (en) | 1978-06-16 | 1978-06-16 | Manufacture of semiconductor device |
US06/047,241 US4253888A (en) | 1978-06-16 | 1979-06-11 | Pretreatment of photoresist masking layers resulting in higher temperature device processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7342078A JPS551117A (en) | 1978-06-16 | 1978-06-16 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS551117A true JPS551117A (en) | 1980-01-07 |
Family
ID=13517697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7342078A Pending JPS551117A (en) | 1978-06-16 | 1978-06-16 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS551117A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014513416A (ja) * | 2011-03-31 | 2014-05-29 | 東京エレクトロン株式会社 | 固相拡散により極浅ドーピング領域を形成する方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320775A (en) * | 1976-08-10 | 1978-02-25 | Toshiba Corp | Production of semiconductor device |
-
1978
- 1978-06-16 JP JP7342078A patent/JPS551117A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5320775A (en) * | 1976-08-10 | 1978-02-25 | Toshiba Corp | Production of semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014513416A (ja) * | 2011-03-31 | 2014-05-29 | 東京エレクトロン株式会社 | 固相拡散により極浅ドーピング領域を形成する方法 |
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