JPS5453967A - Mask and wafer for semiconductor circuit manufacture and their alignment unit - Google Patents
Mask and wafer for semiconductor circuit manufacture and their alignment unitInfo
- Publication number
- JPS5453967A JPS5453967A JP12073577A JP12073577A JPS5453967A JP S5453967 A JPS5453967 A JP S5453967A JP 12073577 A JP12073577 A JP 12073577A JP 12073577 A JP12073577 A JP 12073577A JP S5453967 A JPS5453967 A JP S5453967A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- mask
- mark
- alignment mark
- scribing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To perform alignment of the mask and wafer, by providing the scribing line of fine band pattern which can be obtained for the signal different from the alignment mark and the actual elements photoelectrically, in the scribing line of mask or wafer.
CONSTITUTION: In the scribing lien about 100μm wide, the mask is formed by simultaneously forming the alignment mark a at the formation of the actual element pattern. The wafer is moved and the scribing line is scanned (broken lines) with the beam about 10μm diameter, and when the alignment mark b of the wafer is aligned C with a, the distances W1 to W5 of the mark line and the shift quantity Δx, Δy with the wafer mask have a given relation. The Δx, Δy are detected at the place apart left and right by L, the relative shift amount Δx, Δy, Δθ, are introduced from those, and the device is driven so that this value can be corrected. Further, pulses are outputted at the edge of the mark and W1 to W5 can be calculated from the time distance of the pulses
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5453967A true JPS5453967A (en) | 1979-04-27 |
JPS6124816B2 JPS6124816B2 (en) | 1986-06-12 |
Family
ID=14793682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12073577A Granted JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5453967A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5719726A (en) * | 1980-07-10 | 1982-02-02 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS5788414A (en) * | 1980-11-21 | 1982-06-02 | Seiko Epson Corp | Alignment device |
JPS62155532A (en) * | 1985-12-27 | 1987-07-10 | Nec Corp | Formation of positioning mark for semiconductor wafer |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5176979A (en) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd | |
JPS51140575A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Photomask |
-
1977
- 1977-10-07 JP JP12073577A patent/JPS5453967A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5176979A (en) * | 1974-12-27 | 1976-07-03 | Hitachi Ltd | |
JPS51140575A (en) * | 1975-05-30 | 1976-12-03 | Hitachi Ltd | Photomask |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5719726A (en) * | 1980-07-10 | 1982-02-02 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPH0419545B2 (en) * | 1980-07-10 | 1992-03-30 | Nippon Kogaku Kk | |
JPS5788414A (en) * | 1980-11-21 | 1982-06-02 | Seiko Epson Corp | Alignment device |
JPS62155532A (en) * | 1985-12-27 | 1987-07-10 | Nec Corp | Formation of positioning mark for semiconductor wafer |
Also Published As
Publication number | Publication date |
---|---|
JPS6124816B2 (en) | 1986-06-12 |
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