JPS5285475A - Formation method of high molecular film patterns by high energy beams - Google Patents

Formation method of high molecular film patterns by high energy beams

Info

Publication number
JPS5285475A
JPS5285475A JP162476A JP162476A JPS5285475A JP S5285475 A JPS5285475 A JP S5285475A JP 162476 A JP162476 A JP 162476A JP 162476 A JP162476 A JP 162476A JP S5285475 A JPS5285475 A JP S5285475A
Authority
JP
Japan
Prior art keywords
film patterns
molecular film
energy beams
formation method
high energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP162476A
Other languages
English (en)
Japanese (ja)
Other versions
JPS566531B2 (OSRAM
Inventor
Saburo Imamura
Shungo Sugawara
Hiroshi Murase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP162476A priority Critical patent/JPS5285475A/ja
Publication of JPS5285475A publication Critical patent/JPS5285475A/ja
Publication of JPS566531B2 publication Critical patent/JPS566531B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
JP162476A 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams Granted JPS5285475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP162476A JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP162476A JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Publications (2)

Publication Number Publication Date
JPS5285475A true JPS5285475A (en) 1977-07-15
JPS566531B2 JPS566531B2 (OSRAM) 1981-02-12

Family

ID=11506675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP162476A Granted JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Country Status (1)

Country Link
JP (1) JPS5285475A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102238A (ja) * 1983-11-08 1985-06-06 Aida Eng Ltd フロ−タベ−スの走行装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974236A (OSRAM) * 1972-10-16 1974-07-17
JPS5023825A (OSRAM) * 1973-06-27 1975-03-14

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4974236A (OSRAM) * 1972-10-16 1974-07-17
JPS5023825A (OSRAM) * 1973-06-27 1975-03-14

Also Published As

Publication number Publication date
JPS566531B2 (OSRAM) 1981-02-12

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