JPS566531B2 - - Google Patents

Info

Publication number
JPS566531B2
JPS566531B2 JP162476A JP162476A JPS566531B2 JP S566531 B2 JPS566531 B2 JP S566531B2 JP 162476 A JP162476 A JP 162476A JP 162476 A JP162476 A JP 162476A JP S566531 B2 JPS566531 B2 JP S566531B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP162476A
Other languages
Japanese (ja)
Other versions
JPS5285475A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP162476A priority Critical patent/JPS5285475A/ja
Publication of JPS5285475A publication Critical patent/JPS5285475A/ja
Publication of JPS566531B2 publication Critical patent/JPS566531B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
JP162476A 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams Granted JPS5285475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP162476A JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP162476A JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Publications (2)

Publication Number Publication Date
JPS5285475A JPS5285475A (en) 1977-07-15
JPS566531B2 true JPS566531B2 (OSRAM) 1981-02-12

Family

ID=11506675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP162476A Granted JPS5285475A (en) 1976-01-09 1976-01-09 Formation method of high molecular film patterns by high energy beams

Country Status (1)

Country Link
JP (1) JPS5285475A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102238A (ja) * 1983-11-08 1985-06-06 Aida Eng Ltd フロ−タベ−スの走行装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL42266A0 (en) * 1972-10-16 1973-07-30 American Can Co Copolymer of glycidyl methacrylate and allyl glycidyl ether
FR2234986A1 (en) * 1973-06-27 1975-01-24 Ibm Negative resist materials from oxygen-contg. vinyl polymers - for making printed circuit masks with high definition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60102238A (ja) * 1983-11-08 1985-06-06 Aida Eng Ltd フロ−タベ−スの走行装置

Also Published As

Publication number Publication date
JPS5285475A (en) 1977-07-15

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