JPS52109875A - Position matching system for mask and wafer and its unit - Google Patents
Position matching system for mask and wafer and its unitInfo
- Publication number
- JPS52109875A JPS52109875A JP1900476A JP1900476A JPS52109875A JP S52109875 A JPS52109875 A JP S52109875A JP 1900476 A JP1900476 A JP 1900476A JP 1900476 A JP1900476 A JP 1900476A JP S52109875 A JPS52109875 A JP S52109875A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- mask
- position matching
- unit
- matching system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1900476A JPS52109875A (en) | 1976-02-25 | 1976-02-25 | Position matching system for mask and wafer and its unit |
DE19772707477 DE2707477A1 (de) | 1976-02-25 | 1977-02-21 | Verfahren und vorrichtung zur masken-ausrichtung bei verkleinerungsprojektion |
US05/771,201 US4153371A (en) | 1976-02-25 | 1977-02-23 | Method and apparatus for reduction-projection type mask alignment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1900476A JPS52109875A (en) | 1976-02-25 | 1976-02-25 | Position matching system for mask and wafer and its unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52109875A true JPS52109875A (en) | 1977-09-14 |
JPS541553B2 JPS541553B2 (ja) | 1979-01-25 |
Family
ID=11987366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1900476A Granted JPS52109875A (en) | 1976-02-25 | 1976-02-25 | Position matching system for mask and wafer and its unit |
Country Status (3)
Country | Link |
---|---|
US (1) | US4153371A (ja) |
JP (1) | JPS52109875A (ja) |
DE (1) | DE2707477A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5493974A (en) * | 1978-01-06 | 1979-07-25 | Hitachi Ltd | Projection-system mask alignment unit |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
JPS5950518A (ja) * | 1982-09-01 | 1984-03-23 | パ−キン−エルマ−・ツエンゾ−ル・アンシュタルト | 投影プリント方法 |
JPS60196944A (ja) * | 1984-07-30 | 1985-10-05 | Hitachi Ltd | アライメント方法 |
JPS62122129A (ja) * | 1986-05-09 | 1987-06-03 | Hitachi Ltd | ウエハ上パタ−ン位置検出装置 |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53121471A (en) * | 1977-03-31 | 1978-10-23 | Nippon Chemical Ind | Automatic position matching device |
US4977361A (en) * | 1978-06-26 | 1990-12-11 | Eaton Corporation | X-Y addressable workpiece positioner and mask aligner using same |
US4687980A (en) * | 1980-10-20 | 1987-08-18 | Eaton Corporation | X-Y addressable workpiece positioner and mask aligner using same |
US4422763A (en) * | 1978-12-08 | 1983-12-27 | Rca Corporation | Automatic photomask alignment system for projection printing |
DE2900921C2 (de) * | 1979-01-11 | 1981-06-04 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Verfahren zum Projektionskopieren von Masken auf ein Werkstück |
DE2905636C2 (de) * | 1979-02-14 | 1985-06-20 | Censor Patent- Und Versuchs-Anstalt, Vaduz | Verfahren zum Kopieren von Masken auf ein Werkstück |
DE2905635A1 (de) * | 1979-02-14 | 1980-08-21 | Censor Patent Versuch | Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen |
US4299440A (en) * | 1979-02-22 | 1981-11-10 | Hodgson R W | Microscope stand for microscope optics and a mutually perpendicularly adjustable work stage in an intermediate focusing plane |
FR2450468A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme |
US4307961A (en) * | 1979-04-02 | 1981-12-29 | Western Electric Company, Inc. | Apparatus for precisely aligning a pair of elements |
US4521114A (en) * | 1979-05-11 | 1985-06-04 | Tre Semiconductor Equipment Corporation | Single lens repeater |
US4232969A (en) * | 1979-05-30 | 1980-11-11 | International Business Machines Corporation | Projection optical system for aligning an image on a surface |
JPS55162756A (en) * | 1979-06-04 | 1980-12-18 | Mitsubishi Chem Ind Ltd | Preparation of cyclohexenedicarboxylic acid diamide |
DE2930979A1 (de) * | 1979-07-31 | 1981-02-26 | Optimetrix Corp | Verfahren und vorrichtung zur zweidimensionalen positionierung eines werkstueckes |
JPS5624504A (en) * | 1979-08-06 | 1981-03-09 | Canon Inc | Photoelectric detector |
JPS5658235A (en) * | 1979-10-17 | 1981-05-21 | Canon Inc | Alignment device |
FR2472208A1 (fr) * | 1979-12-18 | 1981-06-26 | Thomson Csf | Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme |
FR2472209A1 (fr) * | 1979-12-18 | 1981-06-26 | Thomson Csf | Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium |
US4309813A (en) * | 1979-12-26 | 1982-01-12 | Harris Corporation | Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits |
JPS56101119A (en) * | 1980-01-17 | 1981-08-13 | Canon Inc | Observing device |
DE3007306A1 (de) * | 1980-02-01 | 1981-08-06 | BBC AG Brown, Boveri & Cie., Baden, Aargau | Luftgekuehlter stromrichter |
US4362389A (en) * | 1980-02-19 | 1982-12-07 | Hitachi, Ltd. | Method and apparatus for projection type mask alignment |
FR2477298B1 (fr) * | 1980-02-28 | 1987-05-29 | Optimetrix Corp | Positionneur de piece d'ouvrage adressable x-y possedant un detecteur de reperes d'adresse x-y perfectionne |
EP0036026B1 (de) * | 1980-03-10 | 1986-11-12 | Eaton-Optimetrix Inc. | Adressierbare Positioniervorrichtung |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
US4533251A (en) * | 1980-06-09 | 1985-08-06 | Gte Products Corporation | Apparatus and process for automatically measuring aperture size of apertured material |
US4385839A (en) * | 1980-07-31 | 1983-05-31 | Baird Corporation | Automatic alignment system |
US4333044A (en) * | 1980-08-29 | 1982-06-01 | Western Electric Co., Inc. | Methods of and system for aligning a device with a reference target |
JPS57138134A (en) * | 1981-02-20 | 1982-08-26 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
US4419013A (en) * | 1981-03-30 | 1983-12-06 | Tre Semiconductor Equipment Corporation | Phase contrast alignment system for a semiconductor manufacturing apparatus |
JPS5825638A (ja) * | 1981-08-08 | 1983-02-15 | Canon Inc | 露光装置 |
US4475122A (en) * | 1981-11-09 | 1984-10-02 | Tre Semiconductor Equipment Corporation | Automatic wafer alignment technique |
US4615621A (en) * | 1982-04-02 | 1986-10-07 | Eaton Corporation | Auto-focus alignment and measurement system and method |
US4580900A (en) * | 1982-04-02 | 1986-04-08 | Eaton Corporation | Auto focus alignment and measurement system and method |
JPS58193547A (ja) * | 1982-05-07 | 1983-11-11 | Hitachi Ltd | 縮小投影露光装置 |
WO1984001024A1 (en) * | 1982-09-07 | 1984-03-15 | Tre Semiconductor Equipment Co | Phase contrast alignment system for a semiconductor manufacturing apparatus |
US4655599A (en) * | 1982-11-15 | 1987-04-07 | Canon Kabushiki Kaisha | Mask aligner having a photo-mask setting device |
JPS5990929A (ja) * | 1982-11-17 | 1984-05-25 | Canon Inc | 投影露光装置のピント合わせ方法 |
US4566796A (en) * | 1983-08-24 | 1986-01-28 | Harris Corporation | Method of determining position on a wafer |
DE3485022D1 (de) * | 1983-12-26 | 1991-10-10 | Hitachi Ltd | Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck. |
US4669867A (en) * | 1984-02-20 | 1987-06-02 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
FR2566217B1 (fr) * | 1984-05-28 | 1988-05-27 | Micro Controle | Procede et dispositif pour la reconnaissance d'un motif particulier d'une image |
JPS6134941A (ja) * | 1984-07-26 | 1986-02-19 | Canon Inc | 合焦検知装置 |
US5365342A (en) * | 1984-10-18 | 1994-11-15 | Canon Kabushiki Kaisha | Alignment and exposure apparatus and method for manufacture of integrated circuits |
JPS61100932A (ja) * | 1984-10-24 | 1986-05-19 | Hitachi Ltd | 露光装置 |
US4725737A (en) * | 1984-11-13 | 1988-02-16 | Hitachi, Ltd. | Alignment method and apparatus for reduction projection type aligner |
US5114223A (en) * | 1985-07-15 | 1992-05-19 | Canon Kabushiki Kaisha | Exposure method and apparatus |
JPH01503100A (ja) * | 1986-06-24 | 1989-10-19 | ロージアン マイクロファブリケイション リミティド | 写真印刷における符合方法及びその方法を実施するための装置 |
US4760429A (en) * | 1986-11-05 | 1988-07-26 | The Perkin-Elmer Corporation | High speed reticle change system |
JP2550974B2 (ja) * | 1987-03-13 | 1996-11-06 | 株式会社ニコン | 露光装置 |
JPH0766192B2 (ja) * | 1988-05-30 | 1995-07-19 | 株式会社オーク製作所 | 自動露光装置におけるワーク位置決め方法 |
EP1309893B1 (en) * | 2000-08-08 | 2006-10-25 | Koninklijke Philips Electronics N.V. | Display device |
US7262398B2 (en) * | 2001-09-20 | 2007-08-28 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
US11748871B2 (en) * | 2020-09-28 | 2023-09-05 | KLA Corp. | Alignment of a specimen for inspection and other processes |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5234907A (en) * | 1975-09-11 | 1977-03-17 | Dantani Plywood Co | Method of producing decorated boards with gloss change |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2343586A (en) * | 1941-12-16 | 1944-03-07 | Ludwig L Lawrence | Process and apparatus for eliminating graining in photography |
US3573456A (en) * | 1967-07-26 | 1971-04-06 | Opto Mechanisms Inc | High resolution projection means for printing micro circuits on photoresist material |
US3955072A (en) * | 1971-03-22 | 1976-05-04 | Kasper Instruments, Inc. | Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask |
US3796497A (en) * | 1971-12-01 | 1974-03-12 | Ibm | Optical alignment method and apparatus |
US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
-
1976
- 1976-02-25 JP JP1900476A patent/JPS52109875A/ja active Granted
-
1977
- 1977-02-21 DE DE19772707477 patent/DE2707477A1/de not_active Withdrawn
- 1977-02-23 US US05/771,201 patent/US4153371A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5234907A (en) * | 1975-09-11 | 1977-03-17 | Dantani Plywood Co | Method of producing decorated boards with gloss change |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5493974A (en) * | 1978-01-06 | 1979-07-25 | Hitachi Ltd | Projection-system mask alignment unit |
JPS6315739B2 (ja) * | 1978-01-06 | 1988-04-06 | Hitachi Ltd | |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
JPS6227536B2 (ja) * | 1978-09-20 | 1987-06-15 | Hitachi Ltd | |
JPS5950518A (ja) * | 1982-09-01 | 1984-03-23 | パ−キン−エルマ−・ツエンゾ−ル・アンシュタルト | 投影プリント方法 |
JPS60196944A (ja) * | 1984-07-30 | 1985-10-05 | Hitachi Ltd | アライメント方法 |
JPS6151415B2 (ja) * | 1984-07-30 | 1986-11-08 | Hitachi Ltd | |
JPS62122129A (ja) * | 1986-05-09 | 1987-06-03 | Hitachi Ltd | ウエハ上パタ−ン位置検出装置 |
JPH0152893B2 (ja) * | 1986-05-09 | 1989-11-10 | Hitachi Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS541553B2 (ja) | 1979-01-25 |
US4153371A (en) | 1979-05-08 |
DE2707477A1 (de) | 1977-09-15 |
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