JPS5329080A - Electron beam exposure system - Google Patents

Electron beam exposure system

Info

Publication number
JPS5329080A
JPS5329080A JP10388776A JP10388776A JPS5329080A JP S5329080 A JPS5329080 A JP S5329080A JP 10388776 A JP10388776 A JP 10388776A JP 10388776 A JP10388776 A JP 10388776A JP S5329080 A JPS5329080 A JP S5329080A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure system
flat plate
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10388776A
Other languages
Japanese (ja)
Inventor
Hiroshi Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10388776A priority Critical patent/JPS5329080A/en
Publication of JPS5329080A publication Critical patent/JPS5329080A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To perform the exposure of fine patterns by imaging the reflected electron beams from a flat plate of patterns of a material of a different reflection coefficient to the same size or similarity on a second flat plate via lenses.
COPYRIGHT: (C)1978,JPO&Japio
JP10388776A 1976-08-30 1976-08-30 Electron beam exposure system Pending JPS5329080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10388776A JPS5329080A (en) 1976-08-30 1976-08-30 Electron beam exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10388776A JPS5329080A (en) 1976-08-30 1976-08-30 Electron beam exposure system

Publications (1)

Publication Number Publication Date
JPS5329080A true JPS5329080A (en) 1978-03-17

Family

ID=14365931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10388776A Pending JPS5329080A (en) 1976-08-30 1976-08-30 Electron beam exposure system

Country Status (1)

Country Link
JP (1) JPS5329080A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418283A (en) * 1978-07-24 1983-11-29 Thomson-Csf Microlithographic system using a charged particle beam
WO2001031403A1 (en) * 1999-10-27 2001-05-03 X-Ion Ionic lithography method, implementing equipment and reticle for such equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4418283A (en) * 1978-07-24 1983-11-29 Thomson-Csf Microlithographic system using a charged particle beam
WO2001031403A1 (en) * 1999-10-27 2001-05-03 X-Ion Ionic lithography method, implementing equipment and reticle for such equipment

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