JPS5329080A - Electron beam exposure system - Google Patents
Electron beam exposure systemInfo
- Publication number
- JPS5329080A JPS5329080A JP10388776A JP10388776A JPS5329080A JP S5329080 A JPS5329080 A JP S5329080A JP 10388776 A JP10388776 A JP 10388776A JP 10388776 A JP10388776 A JP 10388776A JP S5329080 A JPS5329080 A JP S5329080A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam exposure
- exposure system
- flat plate
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To perform the exposure of fine patterns by imaging the reflected electron beams from a flat plate of patterns of a material of a different reflection coefficient to the same size or similarity on a second flat plate via lenses.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10388776A JPS5329080A (en) | 1976-08-30 | 1976-08-30 | Electron beam exposure system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10388776A JPS5329080A (en) | 1976-08-30 | 1976-08-30 | Electron beam exposure system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5329080A true JPS5329080A (en) | 1978-03-17 |
Family
ID=14365931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10388776A Pending JPS5329080A (en) | 1976-08-30 | 1976-08-30 | Electron beam exposure system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5329080A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4418283A (en) * | 1978-07-24 | 1983-11-29 | Thomson-Csf | Microlithographic system using a charged particle beam |
WO2001031403A1 (en) * | 1999-10-27 | 2001-05-03 | X-Ion | Ionic lithography method, implementing equipment and reticle for such equipment |
-
1976
- 1976-08-30 JP JP10388776A patent/JPS5329080A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4418283A (en) * | 1978-07-24 | 1983-11-29 | Thomson-Csf | Microlithographic system using a charged particle beam |
WO2001031403A1 (en) * | 1999-10-27 | 2001-05-03 | X-Ion | Ionic lithography method, implementing equipment and reticle for such equipment |
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