JPS5149686A - - Google Patents

Info

Publication number
JPS5149686A
JPS5149686A JP49123765A JP12376574A JPS5149686A JP S5149686 A JPS5149686 A JP S5149686A JP 49123765 A JP49123765 A JP 49123765A JP 12376574 A JP12376574 A JP 12376574A JP S5149686 A JPS5149686 A JP S5149686A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49123765A
Other languages
Japanese (ja)
Other versions
JPS6022497B2 (ja
Inventor
Takeshi Matsushita
Hisao Hayashi
Teruaki Aoki
Hidenobu Mochizuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP49123765A priority Critical patent/JPS6022497B2/ja
Priority to US05/624,889 priority patent/US4063275A/en
Priority to DE19752547304 priority patent/DE2547304A1/de
Priority to GB43656/75A priority patent/GB1515179A/en
Priority to CH1371375A priority patent/CH608653A5/xx
Priority to CA238,212A priority patent/CA1046650A/en
Priority to BR7506996*A priority patent/BR7506996A/pt
Priority to SE7511927A priority patent/SE411606B/xx
Priority to DK480275AA priority patent/DK142758B/da
Priority to AU85991/75A priority patent/AU504667B2/en
Priority to IT28663/75A priority patent/IT1044592B/it
Priority to ES442102A priority patent/ES442102A1/es
Priority to AT0818475A priority patent/AT370561B/de
Priority to NLAANVRAGE7512559,A priority patent/NL183260C/xx
Priority to FR7532826A priority patent/FR2290040A1/fr
Publication of JPS5149686A publication Critical patent/JPS5149686A/ja
Publication of JPS6022497B2 publication Critical patent/JPS6022497B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H10W74/147—
    • H10P14/662—
    • H10P14/683—
    • H10P14/6903—
    • H10W74/131—
    • H10W74/137—
    • H10P14/6306—
    • H10P14/6309—
    • H10P14/6322—
    • H10P14/6334—
    • H10P14/6342—
    • H10P14/6682—
    • H10P14/69215—
    • H10P14/6922—
    • H10P14/6929—
    • H10P14/69391—
    • H10P14/69433—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/905—Plural dram cells share common contact or common trench

Landscapes

  • Bipolar Transistors (AREA)
  • Formation Of Insulating Films (AREA)
  • Non-Volatile Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Photovoltaic Devices (AREA)
JP49123765A 1974-10-26 1974-10-26 半導体装置 Expired JPS6022497B2 (ja)

Priority Applications (15)

Application Number Priority Date Filing Date Title
JP49123765A JPS6022497B2 (ja) 1974-10-26 1974-10-26 半導体装置
US05/624,889 US4063275A (en) 1974-10-26 1975-10-22 Semiconductor device with two passivating layers
DE19752547304 DE2547304A1 (de) 1974-10-26 1975-10-22 Halbleiterbauelement und verfahren zu seiner herstellung
GB43656/75A GB1515179A (en) 1974-10-26 1975-10-23 Semiconductor devices
CH1371375A CH608653A5 (cg-RX-API-DMAC10.html) 1974-10-26 1975-10-23
CA238,212A CA1046650A (en) 1974-10-26 1975-10-23 Polycrystalline silicon based surface passivation films
BR7506996*A BR7506996A (pt) 1974-10-26 1975-10-24 Aperfeicoamento em dispositivo semicondutor e em processo para fabrica-lo
SE7511927A SE411606B (sv) 1974-10-26 1975-10-24 Halvledardon innefattande bl a ett passiviseringsskikt av polykristallint kisel som innehaller syre
DK480275AA DK142758B (da) 1974-10-26 1975-10-24 Halvlederelement med passiviseringslag.
AU85991/75A AU504667B2 (en) 1974-10-26 1975-10-24 Semiconductor device with passivating layer
IT28663/75A IT1044592B (it) 1974-10-26 1975-10-24 Dispositivo semiconduttor
ES442102A ES442102A1 (es) 1974-10-26 1975-10-25 Un dispositivo semiconductor.
AT0818475A AT370561B (de) 1974-10-26 1975-10-27 Oberflaechenpassivierter halbleiterbauteil
NLAANVRAGE7512559,A NL183260C (nl) 1974-10-26 1975-10-27 Halfgeleiderinrichting, omvattende een halfgeleiderlichaam met een op een oppervlak van het halfgeleiderlichaam aangebrachte passiveringslaag van polykristallijn silicium met 2-45 atoom% zuurstof.
FR7532826A FR2290040A1 (fr) 1974-10-26 1975-10-27 Composant semi-conducteur, circuit integre comprenant de tels composants et procede de fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49123765A JPS6022497B2 (ja) 1974-10-26 1974-10-26 半導体装置

Publications (2)

Publication Number Publication Date
JPS5149686A true JPS5149686A (cg-RX-API-DMAC10.html) 1976-04-30
JPS6022497B2 JPS6022497B2 (ja) 1985-06-03

Family

ID=14868714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49123765A Expired JPS6022497B2 (ja) 1974-10-26 1974-10-26 半導体装置

Country Status (15)

Country Link
US (1) US4063275A (cg-RX-API-DMAC10.html)
JP (1) JPS6022497B2 (cg-RX-API-DMAC10.html)
AT (1) AT370561B (cg-RX-API-DMAC10.html)
AU (1) AU504667B2 (cg-RX-API-DMAC10.html)
BR (1) BR7506996A (cg-RX-API-DMAC10.html)
CA (1) CA1046650A (cg-RX-API-DMAC10.html)
CH (1) CH608653A5 (cg-RX-API-DMAC10.html)
DE (1) DE2547304A1 (cg-RX-API-DMAC10.html)
DK (1) DK142758B (cg-RX-API-DMAC10.html)
ES (1) ES442102A1 (cg-RX-API-DMAC10.html)
FR (1) FR2290040A1 (cg-RX-API-DMAC10.html)
GB (1) GB1515179A (cg-RX-API-DMAC10.html)
IT (1) IT1044592B (cg-RX-API-DMAC10.html)
NL (1) NL183260C (cg-RX-API-DMAC10.html)
SE (1) SE411606B (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042859A (ja) * 1983-08-19 1985-03-07 Toshiba Corp 高耐圧半導体装置の製造方法
JPH04343479A (ja) * 1991-05-21 1992-11-30 Nec Yamagata Ltd 可変容量ダイオード

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2632647A1 (de) * 1976-07-20 1978-01-26 Siemens Ag Halbleiterbauelement mit passivierender schutzschicht
IN147578B (cg-RX-API-DMAC10.html) * 1977-02-24 1980-04-19 Rca Corp
DE2730367A1 (de) * 1977-07-05 1979-01-18 Siemens Ag Verfahren zum passivieren von halbleiterelementen
US4174252A (en) * 1978-07-26 1979-11-13 Rca Corporation Method of defining contact openings in insulating layers on semiconductor devices without the formation of undesirable pinholes
CA1136773A (en) * 1978-08-14 1982-11-30 Norikazu Ohuchi Semiconductor device
FR2459551A1 (fr) * 1979-06-19 1981-01-09 Thomson Csf Procede et structure de passivation a autoalignement sur l'emplacement d'un masque
GB2071411B (en) * 1980-03-07 1983-12-21 Philips Electronic Associated Passivating p-n junction devices
US4344985A (en) * 1981-03-27 1982-08-17 Rca Corporation Method of passivating a semiconductor device with a multi-layer passivant system by thermally growing a layer of oxide on an oxygen doped polycrystalline silicon layer
US4420765A (en) * 1981-05-29 1983-12-13 Rca Corporation Multi-layer passivant system
AT384121B (de) * 1983-03-28 1987-10-12 Shell Austria Verfahren zum gettern von halbleiterbauelementen
JPS61222172A (ja) * 1985-03-15 1986-10-02 Sharp Corp Ｍｏｓｆｅｔのゲ−ト絶縁膜形成方法
JPS6276673A (ja) * 1985-09-30 1987-04-08 Toshiba Corp 高耐圧半導体装置
DE3542166A1 (de) * 1985-11-29 1987-06-04 Telefunken Electronic Gmbh Halbleiterbauelement
EP0388612B1 (en) * 1989-03-24 1994-11-30 International Business Machines Corporation Semiconductor device with self-aligned contact to buried subcollector
DE69427501T2 (de) * 1993-04-05 2002-05-23 Denso Corp., Kariya Halbleiteranordnung mit Dünnfilm-Widerstand
US6242792B1 (en) 1996-07-02 2001-06-05 Denso Corporation Semiconductor device having oblique portion as reflection
CN1293374C (zh) * 2002-04-17 2007-01-03 北京师范大学 能直接测量波长的新结构光电探测器及其探测方法
CN111816574B (zh) * 2020-05-29 2022-03-04 济宁东方芯电子科技有限公司 一种uv膜模板及利用uv膜模板实现洁净玻璃钝化的方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2789258A (en) * 1955-06-29 1957-04-16 Raytheon Mfg Co Intrinsic coatings for semiconductor junctions
DE1184178B (de) * 1960-02-20 1964-12-23 Standard Elektrik Lorenz Ag Verfahren zum Stabilisieren der Oberflaeche von Halbleiterkoerpern mit pn-UEbergaengen durch Vakuumbedampfen
CH428947A (fr) * 1966-01-31 1967-01-31 Centre Electron Horloger Procédé de fabrication d'un circuit intégré
GB1211354A (en) * 1966-12-01 1970-11-04 Gen Electric Improvements relating to passivated semiconductor devices
DE1614455C3 (de) * 1967-03-16 1979-07-19 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen einer teils aus Siliciumoxid, teils aus Siliciumnitrid bestehenden Schutzschicht an der Oberfläche eines Halbleiterkörpers
US3419746A (en) * 1967-05-25 1968-12-31 Bell Telephone Labor Inc Light sensitive storage device including diode array
US3440477A (en) * 1967-10-18 1969-04-22 Bell Telephone Labor Inc Multiple readout electron beam device
NL162250C (nl) * 1967-11-21 1980-04-15 Philips Nv Halfgeleiderinrichting met een halfgeleiderlichaam, waarvan aan een hoofdoppervlak het halfgeleideroppervlak plaatselijk met een oxydelaag is bedekt, en werkwijze voor het vervaardigen van planaire halfgeleider- inrichtingen.
US3558348A (en) * 1968-04-18 1971-01-26 Bell Telephone Labor Inc Dielectric films for semiconductor devices
US3615913A (en) * 1968-11-08 1971-10-26 Westinghouse Electric Corp Polyimide and polyamide-polyimide as a semiconductor surface passivator and protectant coating
JPS497870B1 (cg-RX-API-DMAC10.html) * 1969-06-06 1974-02-22
US3878549A (en) * 1970-10-27 1975-04-15 Shumpei Yamazaki Semiconductor memories
DE2220807A1 (de) * 1971-04-30 1972-11-16 Texas Instruments Inc Verfahren und Vorrichtung zum Abscheiden von polykristallinen Duennfilmen aus Silicium und Siliciumdioxid auf Halbleitersubstraten
NL7204741A (cg-RX-API-DMAC10.html) * 1972-04-08 1973-10-10
JPS532552B2 (cg-RX-API-DMAC10.html) * 1974-03-30 1978-01-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6042859A (ja) * 1983-08-19 1985-03-07 Toshiba Corp 高耐圧半導体装置の製造方法
JPH04343479A (ja) * 1991-05-21 1992-11-30 Nec Yamagata Ltd 可変容量ダイオード

Also Published As

Publication number Publication date
NL7512559A (nl) 1976-04-28
AU504667B2 (en) 1979-10-25
US4063275A (en) 1977-12-13
GB1515179A (en) 1978-06-21
FR2290040B1 (cg-RX-API-DMAC10.html) 1979-08-17
SE411606B (sv) 1980-01-14
DE2547304C2 (cg-RX-API-DMAC10.html) 1988-08-11
CA1046650A (en) 1979-01-16
AU8599175A (en) 1977-04-28
JPS6022497B2 (ja) 1985-06-03
DE2547304A1 (de) 1976-04-29
DK480275A (cg-RX-API-DMAC10.html) 1976-04-27
ATA818475A (de) 1982-08-15
DK142758B (da) 1981-01-12
NL183260B (nl) 1988-04-05
SE7511927L (sv) 1976-04-27
FR2290040A1 (fr) 1976-05-28
DK142758C (cg-RX-API-DMAC10.html) 1981-08-10
BR7506996A (pt) 1976-08-17
CH608653A5 (cg-RX-API-DMAC10.html) 1979-01-15
AT370561B (de) 1983-04-11
IT1044592B (it) 1980-03-31
NL183260C (nl) 1988-09-01
ES442102A1 (es) 1977-03-16

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