DE69427501T2 - Halbleiteranordnung mit Dünnfilm-Widerstand - Google Patents

Halbleiteranordnung mit Dünnfilm-Widerstand

Info

Publication number
DE69427501T2
DE69427501T2 DE69427501T DE69427501T DE69427501T2 DE 69427501 T2 DE69427501 T2 DE 69427501T2 DE 69427501 T DE69427501 T DE 69427501T DE 69427501 T DE69427501 T DE 69427501T DE 69427501 T2 DE69427501 T2 DE 69427501T2
Authority
DE
Germany
Prior art keywords
thin film
semiconductor device
film resistor
resistor
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69427501T
Other languages
English (en)
Other versions
DE69427501D1 (de
Inventor
Makoto Ohkawa
Makio Iida
Shoji Miura
Osamu Ishihara
Tetsuaki Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP07800993A external-priority patent/JP3158769B2/ja
Priority claimed from JP5151871A external-priority patent/JP2762895B2/ja
Application filed by Denso Corp filed Critical Denso Corp
Application granted granted Critical
Publication of DE69427501D1 publication Critical patent/DE69427501D1/de
Publication of DE69427501T2 publication Critical patent/DE69427501T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/20—Resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
DE69427501T 1993-04-05 1994-04-05 Halbleiteranordnung mit Dünnfilm-Widerstand Expired - Lifetime DE69427501T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP07800993A JP3158769B2 (ja) 1993-04-05 1993-04-05 半導体装置
JP5151871A JP2762895B2 (ja) 1993-06-23 1993-06-23 半導体装置

Publications (2)

Publication Number Publication Date
DE69427501D1 DE69427501D1 (de) 2001-07-26
DE69427501T2 true DE69427501T2 (de) 2002-05-23

Family

ID=26419088

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69427501T Expired - Lifetime DE69427501T2 (de) 1993-04-05 1994-04-05 Halbleiteranordnung mit Dünnfilm-Widerstand

Country Status (3)

Country Link
US (1) US5525831A (de)
EP (1) EP0620586B1 (de)
DE (1) DE69427501T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2932940B2 (ja) * 1994-06-08 1999-08-09 株式会社デンソー 薄膜抵抗体を有する半導体装置の製造方法
US5605859A (en) * 1995-07-05 1997-02-25 Taiwan Semiconductor Manufacturing Company, Ltd. Method of making insulator structure for polysilicon resistors
US6242792B1 (en) 1996-07-02 2001-06-05 Denso Corporation Semiconductor device having oblique portion as reflection
JP3374680B2 (ja) * 1996-11-06 2003-02-10 株式会社デンソー 半導体装置の製造方法
US5998759A (en) * 1996-12-24 1999-12-07 General Scanning, Inc. Laser processing
JPH10242394A (ja) * 1997-02-27 1998-09-11 Matsushita Electron Corp 半導体装置の製造方法
US6770564B1 (en) * 1998-07-29 2004-08-03 Denso Corporation Method of etching metallic thin film on thin film resistor
JP4075228B2 (ja) 1998-09-09 2008-04-16 株式会社デンソー 半導体装置の製造方法
US5977610A (en) * 1998-10-21 1999-11-02 National Semniconductor Corporation Integrated circuit having resistor formed over multiple tubs of semiconductor material
US6081014A (en) * 1998-11-06 2000-06-27 National Semiconductor Corporation Silicon carbide chrome thin-film resistor
US6300590B1 (en) * 1998-12-16 2001-10-09 General Scanning, Inc. Laser processing
TW468271B (en) * 1999-03-26 2001-12-11 United Microelectronics Corp Thin film resistor used in a semiconductor chip and its manufacturing method
US6225183B1 (en) * 1999-06-11 2001-05-01 United Microelectronics Corp. Method of fabricating a thin-film resistor having stable resistance
US6329272B1 (en) 1999-06-14 2001-12-11 Technologies Ltrim Inc. Method and apparatus for iteratively, selectively tuning the impedance of integrated semiconductor devices using a focussed heating source
EP1100120B1 (de) 1999-11-10 2009-01-07 The Boeing Company Herstellungsverfahren für Dünnschichtbauelemente
US6475873B1 (en) * 2000-08-04 2002-11-05 Maxim Integrated Products, Inc. Method of forming laser trimmable thin-film resistors in a fully planarized integrated circuit technology
TW471163B (en) * 2000-08-17 2002-01-01 United Microelectronics Corp Manufacturing method and structure of thin film resistor having a high resistance value
US6475400B2 (en) 2001-02-26 2002-11-05 Trw Inc. Method for controlling the sheet resistance of thin film resistors
US6943414B2 (en) * 2001-03-15 2005-09-13 Newport Fab, Llc Method for fabricating a metal resistor in an IC chip and related structure
US6483168B1 (en) 2001-09-13 2002-11-19 National Semiconductor Corporation Integrated circuit having resistor formed over emitter of vertical bipolar transistor
CA2533225C (en) * 2006-01-19 2016-03-22 Technologies Ltrim Inc. A tunable semiconductor component provided with a current barrier
US8426745B2 (en) * 2009-11-30 2013-04-23 Intersil Americas Inc. Thin film resistor

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3717514A (en) * 1970-10-06 1973-02-20 Motorola Inc Single crystal silicon contact for integrated circuits and method for making same
JPS6022497B2 (ja) * 1974-10-26 1985-06-03 ソニー株式会社 半導体装置
US4069487A (en) * 1974-12-26 1978-01-17 Canon Kabushiki Kaisha Recording member and process for recording
US4217570A (en) * 1978-05-30 1980-08-12 Tektronix, Inc. Thin-film microcircuits adapted for laser trimming
JPH0611035B2 (ja) * 1983-04-15 1994-02-09 ソニー株式会社 薄膜の加熱方法
US4594265A (en) * 1984-05-15 1986-06-10 Harris Corporation Laser trimming of resistors over dielectrically isolated islands
US4665295A (en) * 1984-08-02 1987-05-12 Texas Instruments Incorporated Laser make-link programming of semiconductor devices
US4665426A (en) * 1985-02-01 1987-05-12 Advanced Micro Devices, Inc. EPROM with ultraviolet radiation transparent silicon nitride passivation layer
NL8500931A (nl) * 1985-03-29 1986-10-16 Philips Nv Werkwijze voor het omzetten van polykristallijn halfgeleidermateriaal in monokristallijn halfgeleidermateriaal.
US4823181A (en) * 1986-05-09 1989-04-18 Actel Corporation Programmable low impedance anti-fuse element
US4708747A (en) * 1986-10-16 1987-11-24 Harris Corporation Dielectric for laser trimming
KR900005038B1 (ko) * 1987-07-31 1990-07-18 삼성전자 주식회사 고저항 다결정 실리콘의 제조방법
DE68929216T2 (de) * 1988-07-15 2001-02-08 Denso Corp Verfahren zur Herstellung einer Halbleiteranordnung mit Dünnfilm-Widerstand
US5284794A (en) * 1990-02-21 1994-02-08 Nippondenso Co., Ltd. Method of making semiconductor device using a trimmable thin-film resistor
JP2870933B2 (ja) * 1990-02-21 1999-03-17 株式会社デンソー 半導体装置の製造方法
US5382916A (en) * 1991-10-30 1995-01-17 Harris Corporation Differential voltage follower
JPH09384A (ja) * 1995-06-20 1997-01-07 Konishi Chikako 背もたれ

Also Published As

Publication number Publication date
EP0620586B1 (de) 2001-06-20
DE69427501D1 (de) 2001-07-26
EP0620586A1 (de) 1994-10-19
US5525831A (en) 1996-06-11

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Legal Events

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8364 No opposition during term of opposition