JPS51147262A - Electronic beam exposure method - Google Patents
Electronic beam exposure methodInfo
- Publication number
- JPS51147262A JPS51147262A JP7159375A JP7159375A JPS51147262A JP S51147262 A JPS51147262 A JP S51147262A JP 7159375 A JP7159375 A JP 7159375A JP 7159375 A JP7159375 A JP 7159375A JP S51147262 A JPS51147262 A JP S51147262A
- Authority
- JP
- Japan
- Prior art keywords
- electronic beam
- beam exposure
- exposure method
- patterns
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7159375A JPS51147262A (en) | 1975-06-13 | 1975-06-13 | Electronic beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7159375A JPS51147262A (en) | 1975-06-13 | 1975-06-13 | Electronic beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51147262A true JPS51147262A (en) | 1976-12-17 |
Family
ID=13465113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7159375A Pending JPS51147262A (en) | 1975-06-13 | 1975-06-13 | Electronic beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51147262A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5358770A (en) * | 1976-11-08 | 1978-05-26 | Jeol Ltd | Electron beam exposure apparatus |
JPS5362477A (en) * | 1976-11-17 | 1978-06-03 | Hitachi Ltd | Electron beam drawing device |
JPS54143071A (en) * | 1978-04-28 | 1979-11-07 | Fujitsu Ltd | Electron-beam exposure system |
JPS5834918A (ja) * | 1981-08-26 | 1983-03-01 | Fujitsu Ltd | 電子ビ−ム露光方法 |
JPS594017A (ja) * | 1982-06-30 | 1984-01-10 | Toshiba Corp | 電子ビ−ム露光方法 |
KR20000047560A (ko) * | 1998-10-27 | 2000-07-25 | 미다라이 후지오 | 노광방법 |
-
1975
- 1975-06-13 JP JP7159375A patent/JPS51147262A/ja active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5358770A (en) * | 1976-11-08 | 1978-05-26 | Jeol Ltd | Electron beam exposure apparatus |
JPS6038020B2 (ja) * | 1976-11-08 | 1985-08-29 | 日本電子株式会社 | 電子線露光装置 |
JPS5362477A (en) * | 1976-11-17 | 1978-06-03 | Hitachi Ltd | Electron beam drawing device |
JPS54143071A (en) * | 1978-04-28 | 1979-11-07 | Fujitsu Ltd | Electron-beam exposure system |
JPS5828730B2 (ja) * | 1978-04-28 | 1983-06-17 | 富士通株式会社 | 電子ビ−ム露光装置 |
JPS5834918A (ja) * | 1981-08-26 | 1983-03-01 | Fujitsu Ltd | 電子ビ−ム露光方法 |
JPH0262941B2 (ja) * | 1981-08-26 | 1990-12-27 | Fujitsu Ltd | |
JPS594017A (ja) * | 1982-06-30 | 1984-01-10 | Toshiba Corp | 電子ビ−ム露光方法 |
KR20000047560A (ko) * | 1998-10-27 | 2000-07-25 | 미다라이 후지오 | 노광방법 |
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