JPS52128065A - Pattern formation of semiconductor element - Google Patents

Pattern formation of semiconductor element

Info

Publication number
JPS52128065A
JPS52128065A JP4507376A JP4507376A JPS52128065A JP S52128065 A JPS52128065 A JP S52128065A JP 4507376 A JP4507376 A JP 4507376A JP 4507376 A JP4507376 A JP 4507376A JP S52128065 A JPS52128065 A JP S52128065A
Authority
JP
Japan
Prior art keywords
semiconductor element
pattern formation
pattern
prescribed
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4507376A
Other languages
Japanese (ja)
Inventor
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP4507376A priority Critical patent/JPS52128065A/en
Publication of JPS52128065A publication Critical patent/JPS52128065A/en
Pending legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To form the pattern as prescribed on the substrate with no use of mask nor resist by having scanning and irradiation of the electronic beam in an atmosphere of oxidizable gas.
COPYRIGHT: (C)1977,JPO&Japio
JP4507376A 1976-04-20 1976-04-20 Pattern formation of semiconductor element Pending JPS52128065A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4507376A JPS52128065A (en) 1976-04-20 1976-04-20 Pattern formation of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4507376A JPS52128065A (en) 1976-04-20 1976-04-20 Pattern formation of semiconductor element

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP9473085A Division JPS6127639A (en) 1985-05-02 1985-05-02 Formation of oxide film pattern of semiconductor element

Publications (1)

Publication Number Publication Date
JPS52128065A true JPS52128065A (en) 1977-10-27

Family

ID=12709156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4507376A Pending JPS52128065A (en) 1976-04-20 1976-04-20 Pattern formation of semiconductor element

Country Status (1)

Country Link
JP (1) JPS52128065A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5533033A (en) * 1978-08-28 1980-03-08 Nec Corp Manufacture of oxide film of semiconductor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5533033A (en) * 1978-08-28 1980-03-08 Nec Corp Manufacture of oxide film of semiconductor
JPS6145855B2 (en) * 1978-08-28 1986-10-09 Nippon Electric Co

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