JPH11354480A - ウエハ洗浄方法及びウエハ洗浄装置 - Google Patents

ウエハ洗浄方法及びウエハ洗浄装置

Info

Publication number
JPH11354480A
JPH11354480A JP10163966A JP16396698A JPH11354480A JP H11354480 A JPH11354480 A JP H11354480A JP 10163966 A JP10163966 A JP 10163966A JP 16396698 A JP16396698 A JP 16396698A JP H11354480 A JPH11354480 A JP H11354480A
Authority
JP
Japan
Prior art keywords
cleaning
wafer
brush
arm
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10163966A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11354480A5 (enExample
Inventor
Naoyuki Kuratomi
直行 倉富
Takashi Fujita
隆 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Metal Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Industries Ltd filed Critical Sumitomo Metal Industries Ltd
Priority to JP10163966A priority Critical patent/JPH11354480A/ja
Publication of JPH11354480A publication Critical patent/JPH11354480A/ja
Publication of JPH11354480A5 publication Critical patent/JPH11354480A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP10163966A 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置 Pending JPH11354480A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10163966A JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10163966A JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Publications (2)

Publication Number Publication Date
JPH11354480A true JPH11354480A (ja) 1999-12-24
JPH11354480A5 JPH11354480A5 (enExample) 2005-09-15

Family

ID=15784210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10163966A Pending JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Country Status (1)

Country Link
JP (1) JPH11354480A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313765A (ja) * 2001-04-17 2002-10-25 Sony Corp ブラシ洗浄装置及びその制御方法
KR100421038B1 (ko) * 2001-03-28 2004-03-03 삼성전자주식회사 표면으로부터 오염물을 제거하는 세정 장비 및 이를이용한 세정 방법
US6748961B2 (en) 2001-03-30 2004-06-15 Lam Research Corporation Angular spin, rinse, and dry module and methods for making and implementing the same
JP2006324429A (ja) * 2005-05-18 2006-11-30 Nec Electronics Corp 機械的化学的研磨後の洗浄方法
US8162724B2 (en) 2008-05-29 2012-04-24 Showa Denko K.K. Surface treating method and apparatus
JP2018505065A (ja) * 2015-02-06 2018-02-22 パーシモン テクノロジーズ コーポレイションＰｅｒｓｉｍｍｏｎ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｃｏｒｐ． 不等リンク長を有するアームを有するロボット
CN112117204A (zh) * 2020-09-10 2020-12-22 安徽龙芯微科技有限公司 一种封装结构的制作方法
US20210202273A1 (en) * 2019-12-26 2021-07-01 Ebara Corporation Cleaning apparatus and polishing apparatus
CN115424957A (zh) * 2022-09-08 2022-12-02 上海申和投资有限公司 一种晶圆加工用兆声清洗机
CN115501351A (zh) * 2022-09-26 2022-12-23 江西九华药业有限公司 一种制栓药剂生产用表面防污消毒装置
CN115816218A (zh) * 2022-12-14 2023-03-21 西安奕斯伟材料科技有限公司 用于硅片边缘抛光的设备及方法
US11640919B2 (en) 2013-01-18 2023-05-02 Persimmon Technologies Corporation Robot having arm with unequal link lengths
CN119059196A (zh) * 2024-11-04 2024-12-03 华天科技(宝鸡)有限公司 应用于Plasma清洗设备的交互式三段制无极变轨系统

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100421038B1 (ko) * 2001-03-28 2004-03-03 삼성전자주식회사 표면으로부터 오염물을 제거하는 세정 장비 및 이를이용한 세정 방법
US6748961B2 (en) 2001-03-30 2004-06-15 Lam Research Corporation Angular spin, rinse, and dry module and methods for making and implementing the same
KR100886593B1 (ko) * 2001-03-30 2009-03-05 램 리써치 코포레이션 경사진 회전과 헹굼 및 건조모듈과 이의 이용방법
JP2002313765A (ja) * 2001-04-17 2002-10-25 Sony Corp ブラシ洗浄装置及びその制御方法
JP2006324429A (ja) * 2005-05-18 2006-11-30 Nec Electronics Corp 機械的化学的研磨後の洗浄方法
US8162724B2 (en) 2008-05-29 2012-04-24 Showa Denko K.K. Surface treating method and apparatus
US11640919B2 (en) 2013-01-18 2023-05-02 Persimmon Technologies Corporation Robot having arm with unequal link lengths
US11996316B2 (en) 2013-01-18 2024-05-28 Persimmon Technologies Corporation Robot having arm with parallel paths
JP2023072085A (ja) * 2015-02-06 2023-05-23 パーシモン テクノロジーズ コーポレイション 不等リンク長を有するアームを有するロボット
JP2020192680A (ja) * 2015-02-06 2020-12-03 パーシモン テクノロジーズ コーポレイションＰｅｒｓｉｍｍｏｎ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｃｏｒｐ． 不等リンク長を有するアームを有するロボット
JP2018505065A (ja) * 2015-02-06 2018-02-22 パーシモン テクノロジーズ コーポレイションＰｅｒｓｉｍｍｏｎ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｃｏｒｐ． 不等リンク長を有するアームを有するロボット
US20210202273A1 (en) * 2019-12-26 2021-07-01 Ebara Corporation Cleaning apparatus and polishing apparatus
US11948811B2 (en) * 2019-12-26 2024-04-02 Ebara Corporation Cleaning apparatus and polishing apparatus
US12205831B2 (en) 2019-12-26 2025-01-21 Ebara Corporation Cleaning apparatus and polishing apparatus
CN112117204B (zh) * 2020-09-10 2022-10-14 安徽龙芯微科技有限公司 一种封装结构的制作方法
CN112117204A (zh) * 2020-09-10 2020-12-22 安徽龙芯微科技有限公司 一种封装结构的制作方法
CN115424957A (zh) * 2022-09-08 2022-12-02 上海申和投资有限公司 一种晶圆加工用兆声清洗机
CN115501351A (zh) * 2022-09-26 2022-12-23 江西九华药业有限公司 一种制栓药剂生产用表面防污消毒装置
CN115501351B (zh) * 2022-09-26 2024-01-12 江西九华药业有限公司 一种制栓药剂生产用表面防污消毒装置
CN115816218A (zh) * 2022-12-14 2023-03-21 西安奕斯伟材料科技有限公司 用于硅片边缘抛光的设备及方法
CN119059196A (zh) * 2024-11-04 2024-12-03 华天科技(宝鸡)有限公司 应用于Plasma清洗设备的交互式三段制无极变轨系统

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