JPH11354480A5 - - Google Patents

Info

Publication number
JPH11354480A5
JPH11354480A5 JP1998163966A JP16396698A JPH11354480A5 JP H11354480 A5 JPH11354480 A5 JP H11354480A5 JP 1998163966 A JP1998163966 A JP 1998163966A JP 16396698 A JP16396698 A JP 16396698A JP H11354480 A5 JPH11354480 A5 JP H11354480A5
Authority
JP
Japan
Prior art keywords
cleaning
wafer
cleaned
cleaning means
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998163966A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11354480A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10163966A priority Critical patent/JPH11354480A/ja
Priority claimed from JP10163966A external-priority patent/JPH11354480A/ja
Publication of JPH11354480A publication Critical patent/JPH11354480A/ja
Publication of JPH11354480A5 publication Critical patent/JPH11354480A5/ja
Pending legal-status Critical Current

Links

JP10163966A 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置 Pending JPH11354480A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10163966A JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10163966A JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Publications (2)

Publication Number Publication Date
JPH11354480A JPH11354480A (ja) 1999-12-24
JPH11354480A5 true JPH11354480A5 (enExample) 2005-09-15

Family

ID=15784210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10163966A Pending JPH11354480A (ja) 1998-06-11 1998-06-11 ウエハ洗浄方法及びウエハ洗浄装置

Country Status (1)

Country Link
JP (1) JPH11354480A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100421038B1 (ko) * 2001-03-28 2004-03-03 삼성전자주식회사 표면으로부터 오염물을 제거하는 세정 장비 및 이를이용한 세정 방법
US6748961B2 (en) 2001-03-30 2004-06-15 Lam Research Corporation Angular spin, rinse, and dry module and methods for making and implementing the same
JP2002313765A (ja) * 2001-04-17 2002-10-25 Sony Corp ブラシ洗浄装置及びその制御方法
JP2006324429A (ja) * 2005-05-18 2006-11-30 Nec Electronics Corp 機械的化学的研磨後の洗浄方法
JP2009285774A (ja) 2008-05-29 2009-12-10 Showa Denko Kk 表面加工方法及び装置
US10224232B2 (en) 2013-01-18 2019-03-05 Persimmon Technologies Corporation Robot having two arms with unequal link lengths
KR20250059539A (ko) * 2015-02-06 2025-05-02 퍼시몬 테크놀로지스 코포레이션 동등하지 않은 링크 길이를 가진 아암을 구비한 로봇
US11948811B2 (en) 2019-12-26 2024-04-02 Ebara Corporation Cleaning apparatus and polishing apparatus
CN112117204B (zh) * 2020-09-10 2022-10-14 安徽龙芯微科技有限公司 一种封装结构的制作方法
CN115424957B (zh) * 2022-09-08 2023-05-09 上海申和投资有限公司 一种晶圆加工用兆声清洗机
CN115501351B (zh) * 2022-09-26 2024-01-12 江西九华药业有限公司 一种制栓药剂生产用表面防污消毒装置
CN115816218B (zh) * 2022-12-14 2024-09-13 西安奕斯伟材料科技股份有限公司 用于硅片边缘抛光的设备及方法
CN119059196B (zh) * 2024-11-04 2025-02-11 华天科技(宝鸡)有限公司 应用于Plasma清洗设备的交互式三段制无极变轨系统

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