JPH11347940A - 研磨スラリー再生装置及びこれを用いた研磨システム - Google Patents
研磨スラリー再生装置及びこれを用いた研磨システムInfo
- Publication number
- JPH11347940A JPH11347940A JP15700498A JP15700498A JPH11347940A JP H11347940 A JPH11347940 A JP H11347940A JP 15700498 A JP15700498 A JP 15700498A JP 15700498 A JP15700498 A JP 15700498A JP H11347940 A JPH11347940 A JP H11347940A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- slurry
- filter
- polishing slurry
- filters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15700498A JPH11347940A (ja) | 1998-06-05 | 1998-06-05 | 研磨スラリー再生装置及びこれを用いた研磨システム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15700498A JPH11347940A (ja) | 1998-06-05 | 1998-06-05 | 研磨スラリー再生装置及びこれを用いた研磨システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11347940A true JPH11347940A (ja) | 1999-12-21 |
| JPH11347940A5 JPH11347940A5 (https=) | 2005-09-15 |
Family
ID=15640083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15700498A Pending JPH11347940A (ja) | 1998-06-05 | 1998-06-05 | 研磨スラリー再生装置及びこれを用いた研磨システム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11347940A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020003939A (ko) * | 2000-06-27 | 2002-01-16 | 장정훈 | 씨엠피 장치의 슬러리 재생 시스템 |
| EP1273391A1 (en) * | 2001-07-03 | 2003-01-08 | Nidek Co., Ltd. | Eyeglass lens processing apparatus |
| US11141832B2 (en) | 2016-02-10 | 2021-10-12 | Ebara Corporation | Water discharge system, water discharge method, water discharge control apparatus, water discharge control method, substrate processing apparatus and non-transitory computer readable medium recording water discharge control |
-
1998
- 1998-06-05 JP JP15700498A patent/JPH11347940A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20020003939A (ko) * | 2000-06-27 | 2002-01-16 | 장정훈 | 씨엠피 장치의 슬러리 재생 시스템 |
| EP1273391A1 (en) * | 2001-07-03 | 2003-01-08 | Nidek Co., Ltd. | Eyeglass lens processing apparatus |
| US6881132B2 (en) | 2001-07-03 | 2005-04-19 | Nidek Co., Ltd. | Grinding water tank unit for use in processing eyeglass lens, device for separating processing debris, and eyeglass lens processing apparatus having the tank unit or device |
| US11141832B2 (en) | 2016-02-10 | 2021-10-12 | Ebara Corporation | Water discharge system, water discharge method, water discharge control apparatus, water discharge control method, substrate processing apparatus and non-transitory computer readable medium recording water discharge control |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20050329 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A621 | Written request for application examination |
Effective date: 20050329 Free format text: JAPANESE INTERMEDIATE CODE: A621 |
|
| A131 | Notification of reasons for refusal |
Effective date: 20080424 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080916 |