JPH11320743A - 透明部材 - Google Patents
透明部材Info
- Publication number
- JPH11320743A JPH11320743A JP10128780A JP12878098A JPH11320743A JP H11320743 A JPH11320743 A JP H11320743A JP 10128780 A JP10128780 A JP 10128780A JP 12878098 A JP12878098 A JP 12878098A JP H11320743 A JPH11320743 A JP H11320743A
- Authority
- JP
- Japan
- Prior art keywords
- water
- lens
- contact angle
- base
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Laminated Bodies (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Lens Barrels (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10128780A JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10128780A JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11320743A true JPH11320743A (ja) | 1999-11-24 |
| JPH11320743A5 JPH11320743A5 (enExample) | 2005-09-29 |
Family
ID=14993287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10128780A Pending JPH11320743A (ja) | 1998-05-12 | 1998-05-12 | 透明部材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11320743A (enExample) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003200951B2 (en) * | 2002-03-18 | 2005-04-07 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| JP2006350208A (ja) * | 2005-06-20 | 2006-12-28 | Seiko Epson Corp | 光学物品およびその製造方法 |
| AU2005200563B2 (en) * | 2002-03-18 | 2007-07-26 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| DE102008002193A1 (de) | 2007-08-29 | 2009-03-05 | Carl Zeiss Smt Ag | Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit |
| JP2010188584A (ja) * | 2009-02-17 | 2010-09-02 | Nissan Motor Co Ltd | 耐擦傷性撥水構造及び耐擦傷性撥水構造体 |
| JP2010251745A (ja) * | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
| JP2012185348A (ja) * | 2011-03-07 | 2012-09-27 | Seiko Epson Corp | レンズ及びレンズの製造方法 |
| JP2014228728A (ja) * | 2013-05-23 | 2014-12-08 | 日揮触媒化成株式会社 | 反射防止膜付基材およびその製造方法 |
| DE102016203714A1 (de) | 2016-03-08 | 2016-04-28 | Carl Zeiss Smt Gmbh | Optische Anordnung für die Lithographie, insbesondere Projektionsbelichtungsanlage |
| WO2022185557A1 (ja) * | 2021-03-05 | 2022-09-09 | ナルックス株式会社 | ガラス基板に微細凹凸表面構造を製造する方法 |
| US12238398B2 (en) | 2022-05-13 | 2025-02-25 | Largan Precision Co., Ltd. | Imaging lens assembly, camera module and electronic device |
-
1998
- 1998-05-12 JP JP10128780A patent/JPH11320743A/ja active Pending
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003200951B2 (en) * | 2002-03-18 | 2005-04-07 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| US6939613B2 (en) | 2002-03-18 | 2005-09-06 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| AU2005200563B2 (en) * | 2002-03-18 | 2007-07-26 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| JP2006350208A (ja) * | 2005-06-20 | 2006-12-28 | Seiko Epson Corp | 光学物品およびその製造方法 |
| DE102008002193A1 (de) | 2007-08-29 | 2009-03-05 | Carl Zeiss Smt Ag | Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit |
| JP2010188584A (ja) * | 2009-02-17 | 2010-09-02 | Nissan Motor Co Ltd | 耐擦傷性撥水構造及び耐擦傷性撥水構造体 |
| JP2010251745A (ja) * | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
| US8993220B2 (en) | 2009-04-10 | 2015-03-31 | Asml Netherlands B.V. | Immersion lithographic apparatus and a device manufacturing method |
| JP2012185348A (ja) * | 2011-03-07 | 2012-09-27 | Seiko Epson Corp | レンズ及びレンズの製造方法 |
| JP2014228728A (ja) * | 2013-05-23 | 2014-12-08 | 日揮触媒化成株式会社 | 反射防止膜付基材およびその製造方法 |
| DE102016203714A1 (de) | 2016-03-08 | 2016-04-28 | Carl Zeiss Smt Gmbh | Optische Anordnung für die Lithographie, insbesondere Projektionsbelichtungsanlage |
| WO2022185557A1 (ja) * | 2021-03-05 | 2022-09-09 | ナルックス株式会社 | ガラス基板に微細凹凸表面構造を製造する方法 |
| US12238398B2 (en) | 2022-05-13 | 2025-02-25 | Largan Precision Co., Ltd. | Imaging lens assembly, camera module and electronic device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050422 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050428 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070719 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070807 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20071211 |