JPH11320743A5 - - Google Patents

Info

Publication number
JPH11320743A5
JPH11320743A5 JP1998128780A JP12878098A JPH11320743A5 JP H11320743 A5 JPH11320743 A5 JP H11320743A5 JP 1998128780 A JP1998128780 A JP 1998128780A JP 12878098 A JP12878098 A JP 12878098A JP H11320743 A5 JPH11320743 A5 JP H11320743A5
Authority
JP
Japan
Prior art keywords
substrate
coating
transparent member
increase
contact angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998128780A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11320743A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10128780A priority Critical patent/JPH11320743A/ja
Priority claimed from JP10128780A external-priority patent/JPH11320743A/ja
Publication of JPH11320743A publication Critical patent/JPH11320743A/ja
Publication of JPH11320743A5 publication Critical patent/JPH11320743A5/ja
Pending legal-status Critical Current

Links

JP10128780A 1998-05-12 1998-05-12 透明部材 Pending JPH11320743A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10128780A JPH11320743A (ja) 1998-05-12 1998-05-12 透明部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10128780A JPH11320743A (ja) 1998-05-12 1998-05-12 透明部材

Publications (2)

Publication Number Publication Date
JPH11320743A JPH11320743A (ja) 1999-11-24
JPH11320743A5 true JPH11320743A5 (enExample) 2005-09-29

Family

ID=14993287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10128780A Pending JPH11320743A (ja) 1998-05-12 1998-05-12 透明部材

Country Status (1)

Country Link
JP (1) JPH11320743A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2421538C (en) * 2002-03-18 2007-11-20 Hoya Corporation Optical member and process for producing it and thin films
AU2005200563B2 (en) * 2002-03-18 2007-07-26 Hoya Corporation Optical member, process of producing optical member, and process of producing thin film
JP2006350208A (ja) * 2005-06-20 2006-12-28 Seiko Epson Corp 光学物品およびその製造方法
DE102008002193A1 (de) 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit
JP5267798B2 (ja) * 2009-02-17 2013-08-21 日産自動車株式会社 耐擦傷性撥水構造及び耐擦傷性撥水構造体
JP2010251745A (ja) 2009-04-10 2010-11-04 Asml Netherlands Bv 液浸リソグラフィ装置及びデバイス製造方法
JP2012185348A (ja) * 2011-03-07 2012-09-27 Seiko Epson Corp レンズ及びレンズの製造方法
JP6360660B2 (ja) * 2013-05-23 2018-07-18 日揮触媒化成株式会社 反射防止膜付基材およびその製造方法
DE102016203714A1 (de) 2016-03-08 2016-04-28 Carl Zeiss Smt Gmbh Optische Anordnung für die Lithographie, insbesondere Projektionsbelichtungsanlage
WO2022185557A1 (ja) * 2021-03-05 2022-09-09 ナルックス株式会社 ガラス基板に微細凹凸表面構造を製造する方法
TWI844959B (zh) 2022-05-13 2024-06-11 大立光電股份有限公司 成像鏡頭、相機模組及電子裝置

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