JPH11320743A - Transparent member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve water repellency by a method in which the optical characteristics of a transparent member are kept, and the contact angle between the surface and a water droplet adherent to the surface is made greater than that between a conventional even surface and a water droplet. SOLUTION: Unevenness 13 is formed on the surface of a substrate 11 by etching. Since a water repellent monomolecular membrane 15 is formed on the unevenness 13, the surface of the membrane 15 is made uneven. When a water droplet 17 is put on the surface 15a of the membrane 15, the contact area between the surface 15a and the droplet 17 is decreased to increase the contact area between the droplet 17 and the air. Therefore, the droplet 17 becomes spherical due to surface tension to increase the contact angle θ. In a comparative example, since the surface 100 of a lens is not etched, the contact area between the surface 100 and the droplet 17 is much greater than that of an example so that the contact angle θx is smaller than the contact angle θof the example.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent member, particularly a transparent member and an optical member having excellent water repellency.

[0002]

2. Description of the Related Art Conventionally, in order to impart water repellency to a transparent member, especially an optical member such as an eyeglass lens, a film using a hydrophobic substance (also referred to as a water repellent film) is formed on the surface of the transparent member. Had formed. As the hydrophobic substance, for example, fluorosilane is well known.

[0003] The water repellency is a property that a surface of a substance which comes into contact with water repels water, and is evaluated, for example, by a contact angle between a water droplet and a surface of a substance to which the water droplet adheres. The larger the contact angle, the better the water repellency. Generally, if the contact angle with respect to a water droplet is 90 ° or more, it is possible to prevent the surface of a substance to which the water droplet adheres from being drained. For this reason, such a water-repellent material is used as a water-repellent film of an optical member, such as an eyeglass lens, which dislikes moisture. In a lens such as a spectacle lens, when water droplets due to rain or the like adhere to the lens surface, if the water droplet does not have water repellency, the lens surface will be drained. As a result, in the case of a spectacle lens, the field of view deteriorates or the transparency is lost.

The water repellent film has a contact angle of 110 to 115.
°, such as KP801M (trade name, manufactured by Shin-Etsu Chemical Co., Ltd.).

[0005] In addition, it has been reported in the literature (T. IE) that a surface of a solid having water repellency can be made super-water repellent by making the surface a fractal surface.
E Japan, Vol. 116-A, No. 12, 1996, super-water-repellent / super-hydrophilic phenomenon on the fractal surface).

[0006]

However, it has never been considered to use a fractal surface for the surface of an optical member, such as an eyeglass lens, where importance is placed on transparency.

If the water-repellent film used for the optical member can obtain a water-repellency of 115 ° or more, for example, in the case of a spectacle lens, a water drop adhering to the lens falls by its own weight and shakes. The effect of easily removing water droplets can be expected.

However, with the recent development of a water-repellent film material (hydrophobic substance), it has become difficult to obtain a contact angle larger than before. For this reason, among the conventionally known water repellent films, a film having a contact angle larger than 115 ° has not been obtained.

For this reason, there has been a demand for the appearance of a transparent member capable of further improving water repellency by using a conventionally used water repellent film.

[0010]

For this reason, the inventors of the present invention have intensively studied by paying attention to the physical state of the surface of a substance to which water droplets adhere. As a result, they have found that, if fine irregularities are formed on the surface of the transparent member, the contact angle can be increased without losing the transparency of the transparent member, and the present invention has been accomplished.

Therefore, in the present invention, the unevenness formed on the surface of the transparent member does not lose the optical characteristics of the transparent member, and the contact angle between the surface and the water droplet adhering to this surface is reduced by the conventional unevenness. This is to make the contact angle larger than the contact angle with the water droplet adhering to the surface where the surface is not formed.

According to the present invention, the static contact angle between the surface of the transparent member and the water droplet adhering to the surface can be made 125 ° or more.

[0013] By forming fine irregularities on the surface of the transparent member that comes into contact with water, the contact area between the surface and water droplets adhering to the surface can be reduced. For this reason, the water repellency of this transparent member can be improved.
Therefore, even if water droplets and dirt adhere to the transparent member, they can be easily removed in a short time.

The transparent member has the same optical characteristics as a conventional transparent member having no irregularities on the outermost layer of the transparent member. Here, the optical characteristics refer to reflectance characteristics, transmittance characteristics, and the like. In general, these characteristics cause problems such as scattering when the surface has a certain amount of unevenness.
However, since the surface of the transparent member of the present invention has very fine irregularities, when measuring the contact angle between the surface of the optical member and the water droplet adhering thereto, this surface is measured as a normal flat surface.

The transparent member of the present invention includes a transparent base (also referred to as a substrate) and a water-repellent film (also referred to as a film) formed on the surface of the base. Is preferably formed on the surface. However, the base may be flat, and the water-repellent film formed on the base may have irregularities.

When the water-repellent film is formed on the base on which the irregularities are formed, the surface of the water-repellent film has an irregular shape reflecting the state of the surface of the base. The irregularities formed on the surface of this water-repellent film,
Even if the size and shape are not the same as the irregularities provided on the base, the optical characteristics of the transparent member will not be lost, and the contact angle with the water droplet will be reduced to the contact with the water droplet adhering to the surface of the conventional transparent member. If it can be made larger than the corner, it can be used. Since the surface has fine irregularities, the contact angle between the water droplet adhering to the surface of the water-repellent film and the surface of the water-repellent film can be further increased. For this reason, it is possible to further improve the water repellency as compared with the case where the water repellency is provided only with the water repellent material as in the related art.

Preferably, the transparent member is an optical member.

Further, the transparent member according to the present invention not only increases the contact angle with water, but also shortens the time for eliminating cloudiness due to water droplets adhering to the surface.

Therefore, the transparent member according to the present invention has both high water repellency and anti-fogging property. In particular, the static contact angle with water of the present invention was about 115 ° or more, and the fogging elimination time was about 15 seconds or less.

The shape and size of the unevenness are set so that the optical characteristics of the optical member are not impaired by the unevenness on the outermost surface.

The height of the unevenness from the bottom to the top is 1
The height is preferably in the range of 0 nm or more and 60 nm or less.

If the height from the bottom to the top of the unevenness is within this range, the contact angle with water droplets can be increased. Also, there is no danger that water droplets adhering to the surface will enter the bottom of the unevenness and reduce the contact angle,
It does not adversely affect other characteristics of the transparent member.

Preferably, the number of concave and convex concave portions is 100 to 150 per unit area 1 μm ^{2 on} the surface of the base.
It is good to be formed individually.

Thus, the area in contact with water droplets adhering to the surface can be further reduced. Therefore, the water droplet has a large area in contact with the atmosphere, and thus easily becomes spherical due to surface tension. As a result, attached water droplets can be easily removed from the surface in a short time. Further, if the density of the concave portions on the surface of the transparent member is within the above range, there is no possibility that water droplets adhering between the convex portions will enter and reduce the contact angle.

In this specification, the term “underlayer” means the surface of a substrate, or the surface of an antireflection film, a hard coat layer or a primer layer formed on the substrate.

If irregularities are formed on the surface of the antireflection film, and a water-repellent film having a uniform thickness is provided thereon, the antireflection characteristics can be maintained and the water repellency can be improved more than conventional eyeglass lenses. Can be.

Preferably, the water-repellent film is a monomolecular film. Thus, for example, in the case of a water-repellent film provided on a base having an antireflection film, since the film is a thin film of a monomolecular film, the reflection characteristics of the transparent member are changed by the water-repellent film, thereby impairing the antireflection effect. There is no such fear. Further, a film is formed along the irregularities provided on the base. For this reason, the size and shape of the unevenness set so that the attached water droplet is preferably removed can be directly reflected on the water-repellent film.

The transparent member to which the present invention can be applied is not limited to a plastic lens for spectacles as long as it is a transparent member requiring water repellency. It can be expected to be applied to various optical lenses used for optical members such as exposure apparatuses, glass products such as window glasses, car windshields, and goggles used for skiing and swimming.

As the step of forming the unevenness, for example, it is preferable to perform wet etching on the surface of the transparent member. Hydrofluoric acid (HF) on the surface of the transparent member or the surface of the base
When exposed to an etching solution such as, the exposed area is eroded to form fine irregularities. Note that the size of the unevenness can be controlled by the etching time.

Further, chemicals used in the wet _{etching, HF-HNO 3 -CH 3 COOH} , HF-HNO
_{3, HF-CH 3 COOH,} KOH, KOH-K 3 [F
_{e (CN 6)], HCl} , HNO 3 -HCl, H 3 PO
_{4, H 3 PO 4 -HNO 3} , H 3 PO 4 -HNO 3 -C
_{HCOOH, H 2 SO 4, FeCl} 3, N 3 H 4 -CH
₃ CHOHCH ₃ or the like may be used. Particularly preferably,
It is preferable to use HF or a mixture of HF and NH ₄ F.

The etching ability of these solutions can be controlled by using dilution, heating, ultrasonic waves or the like.

When a water droplet adheres to the surface having irregularities, the area of contact between the solid surface and the water droplet becomes smaller as compared with the case where the water droplet adheres to a flat surface. For this reason, the area of the water droplet in contact with the atmosphere increases, and the water droplet approaches a more spherical shape due to surface tension. Therefore, the contact angle between the water droplet and the surface to which the water droplet adheres becomes larger. This means an improvement in water repellency.

As a step of forming the irregularities, dry etching may be performed on the surface of the transparent member or the surface of the base. Also in this case, the size of the unevenness formed can be controlled by the etching time.

In the case of dry etching, for example, when a transparent member composed of a base and a water-repellent film is formed, the same apparatus as used for etching the base is used. Can be performed. Therefore, the manufacturing time can be reduced, and the manufacturing cost can be kept low.

In the dry etching, the degree of vacuum in the apparatus for performing the dry etching is 10 Pa or more and 1
It is preferable to carry out under the condition that the pressure is within the range of 00 Pa or less. Thereby, a preferable etching treatment can be performed on the surface of the transparent member or the surface of the base.

The dry etching is preferably performed by setting the temperature in the apparatus for performing the dry etching to 70 ° C. or less.

For example, when the transparent member is an optical member such as an eyeglass lens, a synthetic resin is often used as a base. Therefore, at a relatively low temperature of 70 ° C. or less, deformation and deterioration of the transparent member due to heat can be prevented.

The dry etching is preferably plasma etching using high-frequency discharge. Thus, the etching process can be performed at a low temperature.

When plasma etching using high-frequency discharge is performed, the etching time is preferably in the range of 1 second to 10 seconds.

If the etching process is performed for a time within the above range, excessive cutting of the surface to be etched can be prevented. For example, in an optical member, the possibility that the optical characteristics change due to excessive cutting of the base can be avoided. Also,
There is no need to worry about insufficient cutting.

Preferably, dry etching is ion beam etching. If ion beam etching is used, low-temperature etching can be performed. Further, a preferable uneven shape is obtained.

The production of a transparent member having irregularities formed on the outermost surface may include the step of forming irregularities directly on the outermost surface of the transparent member material which is the outermost surface of the transparent member. The formation of the unevenness can be performed by wet etching or dry etching.

[0043]

Embodiments of the present invention will be described below.

In the case where the transparent member is a plastic lens for spectacles, its base is formed on a lens in which a hard coat layer is formed on a lens substrate and an antireflection film is formed on the hard coat layer, or on a lens substrate. Any of lenses having a primer layer formed thereon and a hard coat layer and an antireflection film formed thereon may be used.

In particular, when a water-repellent layer is provided on the antireflection film, the water-repellent layer is preferably as thin as a monomolecular film so as not to adversely affect the antireflection effect. Alternatively, the refractive index and the film thickness of the water-repellent layer may be measured or specified, and the multilayer antireflection film may be designed and manufactured in advance so that the reflectance decreases when the water-repellent layer is provided.

Examples of the polymer compound used as the material of the plastic lens substrate include, for example, a copolymer of an epoxy resin, an acrylic ester and / or a methacrylic ester (including copolymers with other vinyl monomers. ), Polyamide, polyester (including so-called alkyd resin and unsaturated polyester resin), various amino resins (including urea resin), urethane resin, polyvinyl acetate, polyvinyl alcohol, transparent vinyl chloride resin, cellulose resin and Ethylene glycol bisallyl carbonate polymer (CR39) can be used.

The hard coat layer is a film for protecting the plastic substrate from scratches and the like, and a thermosetting resin such as a melamine resin or an acrylic resin or a photocurable resin such as a urethane resin is used as a constituent material. . Since a material having a high surface hardness is preferable, the hard coat layer is preferably made of a cured product of an organic silane compound represented by the following general formula (1) and / or a partially hydrolyzed product thereof in the case of a thermosetting resin.

R ¹ _a Si (OR ² ) _4-a (1) Further, in order to improve the impact resistance of the lens, a shock absorbing layer called a “primer layer” is provided on the lens substrate and the hard coat. In some cases, a film is formed between the layers. As the primer layer, a layer mainly containing a urethane resin is preferable. Further, those containing a polyvinyl butyral-based resin as a main component can also be used. Oxide fine particles can be added to the hard coat layer or the primer layer for the main purpose of controlling the refractive index.

The anti-reflection film is provided to reduce the surface reflection of the lens.
A substance having a refractive index lower than that of the
From a single thin film provided with a one-half thin film to a multilayer having a low refractive index and a high refractive index, alternate layers can be used.

In the case of a single layer, it is possible to eliminate reflected light for one wavelength of light when a thin film to be formed has a refractive index of the square root of the refractive index of the substrate. On the other hand, in the case of multilayer,
By design, it is possible to have multiple wavelengths without reflected light,
And it is possible to have low reflection performance over a wide band.

As the material used for these optical thin films, in the case of a low refractive index, silicon monoxide, silicon dioxide, magnesium fluoride and the like are mentioned. On the other hand, in the case of a high refractive index, aluminum oxide, zirconium oxide, titanium oxide, tantalum oxide, hafnium oxide, neodymium fluoride and the like can be mentioned. Further, in addition to the antireflection film function, a colored film such as chromium oxide, or an absorption film using copper, titanium, nickel, iron, gold, silver, or an oxide thereof depending on the case may be used.

The antireflection film effective in the present invention is a film using a silicon oxide-based inorganic material layer as the uppermost layer in order to form fine irregularities by etching the surface.

As the water repellent constituting the water repellent film, it is preferable to use the following or a water repellent.

About: The water repellent has the general formula (2)
Or a partially hydrolyzed product thereof.

[0055]

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In the formula, R is a substituted or unsubstituted monovalent hydrocarbon group, preferably a substituted or unsubstituted alkyl group, alkenyl group or aryl group having 1 to 20 carbon atoms. In addition,
Examples of the substituted monovalent hydrocarbon group include those in which part or all of an unsubstituted monovalent hydrocarbon group is substituted with a halogen atom, for example, a fluorine atom, and may be Rf.
X is a hydrolyzable group (preferably a halogen atom, an alkoxy group having 1 to 10 carbon atoms or an acyloxy group) directly bonded to a silicon atom or a hydroxyl group. Rf is a fluorinated monovalent organic group (a monovalent hydrocarbon group such as an alkyl group), and preferably has 3 to 30 carbon atoms. In this fluorination, all hydrogen atoms in the organic group may be substituted or partially substituted.

[0057] Particularly preferred for Rf is represented by the general formula _{(3): C p F 2p} + 1 C m H 2m - (p is 1 to 20, m is 2 or 3) represented by (3) .

As specific silane compounds, for example, the following compounds can be used.

CF ₃ C ₂ H ₄ (CH ₃ ) SiCl ₂ C ₄ F ₉ C ₂ H ₄ (CH ₃ ) SiCl ₂ C ₈ F ₁₇ C ₂ H ₄ (CH ₃ ) SiCl ₂ C ₈ F ₁₇ C ₃ H ₆ (CH ₃ ) SiCl ₂ CF ₃ C ₂ H ₄ (C ₂ H ₅ ) SiCl ₂ C ₄ F ₉ C ₂ H ₄ (C ₂ H ₅ ) SiCl ₂ C ₈ F ₁₇ C ₂ H ₄ (C ₂ H _{5 ) SiCl 2 C 8 F 17 C} 3 H 6 (C 2 H 5) SiCl 2 CF 3 C 2 H 4 (CH 3) Si (OCH 3) 2 C 4 F 9 C 2 H 4 (CH 3) Si (OCH _{3) 2 C 8 F 17 C} 2 H 4 (CH 3) Si (OCH 3) 2 C 8 F 17 C 3 H 6 (CH 3) Si (OCH 3) 2 CF 3 C 2 H 4 (CH 3) Si (OC (CH ₃ ) = CH
_{2) 2 C 4 F 9 C} 2 H 4 (CH 3) Si (OC (CH 3) = C
H ₂ ) ₂ C ₈ F ₁₇ C ₂ H ₄ (CH ₃ ) Si (OC (CH ₃ ) = C
_{H 2) 2 C 8 F 17} C 3 H 6 (CH 3) Si (OC (CH 3) = C
_{H 2) 2 CF 3 C 2} H 4 (CH 3) Si (OCOCH 3) 2 C 4 F 9 C 2 H 4 (CH 3) Si (OCOCH 3) 2 C 8 F 17 C 2 H 4 (CH 3) _{Si (OCOCH 3) 2 C 8} F 17 C 3 H 6 (CH 3) Si (OCOCH 3) 2 for: water-repellent agent is an organic silicon compound represented by the general formula (4).

[0060]

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When this organosilicon compound is a silazane compound in which n is 2 or more, an average composition formula (5): RfRSi (NH) _2/2 ... (5) In both ends-
It is an NH2 group.

In particular, an organic silicon compound in which the organic group Rf is represented by the general formula (6): C _p F _{2p + 1} C _m H _2m- (6), particularly a silazane compound in which n is 2 or more is preferable. .

Examples of preferred organosilicon compounds are as follows.

CF ₃ C ₂ H ₄ (CH ₃ ) Si (NH) _2/2 C ₄ F ₉ C ₂ H ₄ (CH ₃ ) Si (NH) _2/2 C ₄ F ₉ C ₃ H ₆ (CH _{3 ) Si (NH) 2/2 C 8} F 17 C 2 H 4 (CH 3) Si (NH) 2/2 C 8 F 17 C 3 H 6 (CH 3) Si (NH) 2/2 C 10 F 21 C ₃ H ₆ (CH ₃ ) Si (NH) _{2/2 In} these formulas, “CF ₃ C ₂ H ₄ (CH ₃ ) Si (N
H) _2/2 ”can also be expressed by the following equation (7). Other compounds can be similarly expressed. Here, n is a positive integer, preferably 1 to 20, particularly preferably 3 or 4.

[0065]

Embedded image

These compounds are used alone or as a mixture. Further, a mixture with a water repellent may be used. Monofunctional “organic silane compound having a fluorinated organic group” or monofunctional “silazane compound having a fluorinated organic group” may be used in combination, or may be treated with a bifunctional water repellent before May be treated with a monofunctional (hexamethylene disilazane) water repellent. Alternatively, the reverse is also possible.

Further, it is first treated with a bifunctional water repellent, and later treated with a fluorinated silicone oil (non-reactive) or a fluorinated oil (for example, trade name "Demnum" (manufactured by Daikin Industries, Ltd.), Post-treatment may be performed under the name “Fomblin Oil” (manufactured by Montezison).

A method for manufacturing a spectacle lens according to the present invention will be schematically described.

First, a hard coat layer is formed on the plastic lens substrate described above. The method of applying the hard coat layer on the lens substrate is brush coating, dipping, roll coating,
Conventional coating methods such as spray coating and flow coating can be used. Thereafter, the hard coat layer is cured by heat treatment to form a hard coat layer. An antireflection film is provided on the hard coat layer. Note that a primer layer may be interposed between the hard coat layer and the antireflection film. This antireflection film is formed by a vacuum deposition method, an ion plating method, a sputtering method, or the like. Next, the surface of the antireflection film is subjected to, for example, wet etching or dry etching to form irregularities characteristic of the present invention.

The chemical used in the wet etching is H
_{F-HNO 3 -CH 3 COOH,} HF-HNO 3, HF
-CH ₃ COOH, KOH, KOH-K ₃ [Fe (CN
_{6)], HCl, HNO 3} -HCl, H 3 PO 4, H 3
PO ₄ —HNO ₃ , H ₃ PO ₄ —HNO ₃ —CHCOO
_{H, H 2 SO 4, FeCl} 3, N 3 H 4 -CH 3 CHO
HCH ₃ or the like may be used. Particularly preferably, HF,
It is preferable to use a mixture of HF and NH ₄ F.

The etching ability of these solutions can be controlled by using dilution, heating, ultrasonic waves or the like.

The dry etching is mainly performed in a vacuum. In this case, processing can be performed more precisely than in the case of wet etching, and submicron control can be performed. Examples of the method include a gas phase reaction process using plasma using an etching gas and an ion beam obtained by ionizing an inert gas or the like. Among them, a gas phase reaction using plasma using an etching gas is effective.

To generate plasma, heat, high frequency,
Although a microwave or the like is used, it is desirable to use a high frequency here. There is no special designation for the device,
For example, a parallel plate type (capacitive coupling type), an induction electromotive type, and the like can be mentioned. At this time, the electrode position may be inside or outside the device. In addition, a magnetic field may be used to increase the plasma density.

Here, when CF ₄ is used as an etching gas, for example, the CF bond is broken by electrons in the plasma, and fluorine radicals and the like are generated, and these are extremely chemically active. A reaction occurs with the placed Si compound, for example, Si, SiO ₂ , Si ₃ N ₄ or the like, and etching becomes possible. It goes without saying that the same reaction takes place whether the Si compound mentioned here is solid or thin film.

The etching gas used here is:
CF ₄ , CHF ₃ , C ₂ F ₈ , C ₄ F ₁₀ Cl ₂ , CCl ₄
, CCl ₂ F ₂ , CCl ₃ F, C ₂ Cl ₂ F ₄ , C ₃
Cl ₃ F ₃ , BCl ₃ SiCl ₃ , CBrF ₃ , SF
It is desirable to use a single or mixed gas of ₆ , NF ₃ , Ar, and O ₂ , and N ₂ , CO ₂ , He, and air may be mixed with the single or mixed gas.

On the other hand, details concerning the ion beam are omitted here, but the gas to be used includes O ₂ , N ₂ , Ar and the like, and as the ion source, a thermionic emission type using a filament or the like, a high frequency plasma or the like is used. No.

Then, a water-repellent layer is formed on the anti-reflection film having the irregularities by using a water-repellent agent.

A lens substrate made of a water repellent or a mixture thereof (an impact absorbing layer, a hard coat layer,
When an anti-reflection film is formed, the water repellent treatment of the substrate having the anti-reflection film can be roughly divided into a coating method, a vacuum deposition method, a CVD method and other vacuum thin film forming techniques. In the case where the irregularities are formed on the surface of the antireflection film by dry etching in a vacuum apparatus, the latter method using a vacuum thin film forming technique is preferable.

[0079]

Next, an embodiment of the present invention will be described.

Example 1 Here, a description will be given of an example of an eyeglass lens in which a water-repellent layer is formed on a base material provided with a hard coat layer and an antireflection film on a substrate in this order. Fine irregularities are formed on the base surface of the lens in contact with the water-repellent layer, that is, on the surface of the antireflection film. Such a lens is manufactured, for example, as follows.

First, in this example, CR39 (trade name, manufactured by PPG) having a refractive index of 1.50 was used as a plastic substrate.
A commercially available concave lens having a diameter of 80 mm and containing the above polymer as a main component is used. This is referred to as a substrate Sl.

The coating liquid used for forming the hard coat layer is adjusted in advance.

First, the preliminary composition A is prepared. Add 248 parts by weight of γ-glycidoxypropylmethyldiethoxysilane to the reaction vessel, and add 36 parts by weight of a 0.05 N hydrochloric acid aqueous solution into the reaction vessel at a time while stirring with a magnetic stirrer. I do. After stirring for about 1 hour, a liquid hydrolyzate is obtained.

To the hydrolyzate, 56.6 parts by weight of ethanol and 53.4 parts by weight of ethylene glycol were added, and then aluminum acetyl acetate was added.
A premix A was prepared by adding 7 parts by weight, mixing and melting sufficiently.

Next, the preliminary composition B is prepared. 2 gamma-glycidoxypropyltrimethoxysilane is placed in the reaction vessel.
Add 12.2 parts by weight, and stir using a magnetic stirrer while maintaining the temperature in the container at 10 ° C. While stirring, a 0.01 N aqueous hydrochloric acid solution is placed in the container.
6 parts by weight are gradually added dropwise. Immediately after the completion of the dropping of the hydrochloric acid, the cooling is stopped. Thereby, a liquid hydrolyzate is obtained.

After adding 77.1 parts by weight of ethanol and 37.7 parts by weight of ethylene glycol to this hydrolyzate, 7.65 parts by weight of aluminum acetyl acetate was added, and the mixture was sufficiently mixed. I do.

Next, a coating liquid for forming a hard coat layer is prepared using the prepared preliminary composition A and preliminary composition B.

First, in a glass container, 20 parts by weight of the preliminary composition A, 80 parts by weight of the preliminary composition B, 200 parts by weight of the SiO ₂ sol (solid content: 30% by weight, average particle size: 13 nm), and silicone-based surfactant Add 0.45 parts by weight of the agent and stir and mix well. The solution thus obtained is referred to as a coating solution Hl.

First, the base material Sl, which is the above-mentioned plastic base material, is immersed in a 10 wt% NaOH aqueous solution at 60 ° C. for 3 minutes, and then the base material Sl is washed with water and dried.

Next, the dried base material Sl is immersed in the coating liquid Hl and pulled up at a pulling rate of 90 mm / min. Thereafter, a heat treatment is performed on the substrate Sl at 100 ° C. for 4 hours to cure the coating liquid applied to the surface of the substrate Sl. Thereby, a hard coat layer having a thickness of 2.2 μm is formed on the surface of the base material Sl. The refractive index of this hard coat layer is 1.50.

Next, a multilayer antireflection film is formed on the hard coat layer by using a vacuum deposition method.

[0092] in order from the hard coat layer side and a SiO _2, the first layer thickness is 0.02 [mu] m, consists of ZrO _2, the second layer thickness is 0.03 .mu.m, made of SiO _2, a layer A third layer having a thickness of 0.02 μm, a fourth layer having a thickness of 0.06 μm comprising ZrO ₂ , and SiO ₂
And a fifth layer having a layer thickness of 0.085 μm is laminated. The antireflection film having the five-layer structure is referred to as an antireflection film Al.

Thus, a base having a hard coat layer and an antireflection film in this order on a base material can be formed.

After that, the underlayer is subjected to an etching treatment to form irregularities on the surface of the antireflection film, and then a water-repellent layer is provided.

In this example, irregularities are formed by wet etching. As an etching solution, hydrofluoric acid (HF) having a concentration of 10% by weight was maintained at a temperature of 30 ° C., and the base was immersed in this solution for 1 second. Thereby, fine irregularities are formed on the surface of the antireflection film.

Thereafter, a water-repellent layer is formed on the antireflection film.

In this example, C ₈ F ₁₇ C ₂ H ₄ (CH ₃ ) Si (NH) is used as the water repellent used to form the water repellent layer.
_2/2 is dissolved in meta-xylene hexafluoride and diluted to 5% by weight.

In this example, the water-repellent layer is formed by using a vacuum evaporation method. First, as an evaporation source, a steel container having an outer diameter of 18 mm, a height of 7 mm, and a thickness of 0.2 mm is filled with steel wool (# 0000) to a height of 5 mm. A water repellent diluted with a pipette was placed in this container in an amount of 1.2.
Inject ml. Next, after placing the container on a hot plate heated to 80 ° C., a heating process is performed for about 20 minutes while ventilating to evaporate the solvent (meta-xylene hexafluoride). The substance remaining in the container is used as an evaporation source for forming a water-repellent layer, and is set on a hearth liner of an electron gun in a chamber of a vacuum evaporation apparatus.

Further, the formed base is set on a substrate holder in a chamber of a vacuum evaporation apparatus.

The atmospheric pressure in the above chamber was set to 1 × 10 ⁻⁵ P
After evacuation until a, the condition of the electron gun is changed to AMPLITUDE =
The evaporation source is heated for 3 minutes with 10.0 and EMISSION current value = 5 mA. Thus, a water-repellent layer is formed, and the lens of Example 1 is obtained.

Next, the water repellency of the obtained lens is examined.

The water repellency is obtained by making a water droplet adhere to the surface of the water repellent layer and making a contact angle (static contact angle) between the water droplet and the surface of the water repellent layer.
Is a contact angle meter CZ-X150 manufactured by Kyowa Interface Science Co., Ltd.
It was determined by measuring using

Further, the fogging time of the sample was measured. The measuring method will be described below.

Using a spectroscope whose wavelength is set to 500 nm, the wavelength of the transmittance of the lens is measured (measured value α).
And ). Thereafter, the lens was left in a storage at −20 ° C. for 10 minutes and then taken out.
It is moved to a high-temperature, high-humidity chamber with a humidity of 50% and left for 2 seconds. This causes condensation on the surface of the lens. Thereafter, the measurement of the transmittance of the lens is started, and the time until the measured value becomes a value within ± 5% of the transmittance value (measured value α) measured before the occurrence of dew condensation is defined as the cloudy erasing time.

As a result, the contact angle of the lens of Example 1 was 1
At 33 °, the fogging time was 10 seconds.

(Embodiment 2) As Embodiment 2, points different from Embodiment 1 will be described, and detailed description of the same points will be omitted.

In Example 2, after the base was formed in exactly the same manner as in Example 1, when the base was subjected to wet etching, the base was immersed for 5 seconds using the same etching solution as in Example 1. Then, irregularities are formed on the surface of the antireflection film. Thereafter, a lens obtained by providing the same water-repellent layer as in Example 1 was used as the lens of Example 2.

For the lens of Example 2, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 130 ° and the fogging elimination time was 11 seconds.

(Embodiment 3) As Embodiment 3, after forming the same base as in Embodiment 1, wet etching is performed on this base. At this time, using the same etching solution as in Example 1, the base was immersed in this solution for 10 seconds. Then, a lens obtained by providing the same water-repellent layer as in Example 1 was used.
The lens of Example 3 was used.

For the lens of Example 3, the contact angle and the fogging elimination time were measured in the same manner as in Example 1, and as a result, the contact angle was 129 ° and the fogging elimination time was 11 seconds.

(Embodiment 4) As Embodiment 4, after forming the same base as in Embodiment 1, dry etching is performed on this base.

In this example, plasma etching by high frequency is used. The vacuum system uses an induction-type external electrode, and the exhaust system for evacuating the chamber is:
A rotary pump and a turbo molecular pump were arranged in series. Also, using CF ₄ as an etching gas,
RF frequency is 13.56 MHz and RF output is 100
0 W. Also, the atmospheric pressure in the chamber is 1 × ^10-5
After evacuating to Pa, etching gas (CF ₃ )
Is introduced at 100 SCCM, and the etching process is performed while maintaining the degree of vacuum at 1 × 10 ⁻² Pa.

In this example, the etching time was 1 second. Thereby, irregularities are formed on the surface of the antireflection film. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 4.

For the lens of Example 4, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 129 ° and the fogging elimination time was 11 seconds.

Example 5 As Example 5, after forming the same underlayer as in Example 1, dry etching is performed on this underlayer. At this time, the etching is performed under the same conditions as in the fourth embodiment except for the etching time. In Example 5, the etching time was 5 seconds. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 5.

For the lens of Example 5, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 132 ° and the fogging elimination time was 10 seconds.

(Embodiment 6) As Embodiment 6, the same base as in Embodiment 1 is formed, and the same dry etching as in Embodiment 4 is performed on this base. At this time, in this example, the etching time was set to 10 seconds. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 6.

For this lens, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 135 ° and the fogging elimination time was 9 seconds.

(Embodiment 7) As Embodiment 7, the same base as that of Embodiment 1 is formed, and the base is subjected to the same wet etching as that of Embodiment 1. At this time, the time for immersion in the etching solution is also set to one second as in the first embodiment. Then, in this example, as a water repellent, which is a material of the water repellent layer,
The _{C 8 F 17 C 3 H 6} (CH 3) Si (NH) 2/2, used after diluted to 5 wt% was dissolved in metaxylene hexafluoride. Then, using a vacuum deposition method,
A water-repellent layer is formed on a base under the same conditions as in the first embodiment. The lens obtained in this way is referred to as a lens of Example 7.

For the lens of Example 7, the contact angle and the fogging elimination time are measured in the same manner as in Example 1. As a result, the contact angle was 130 °, and the fogging time was 10 seconds.

Example 8 As Example 8, after forming a base in the same manner as in Example 1, the base was immersed in this solution for 5 seconds using the same etching solution as in Example 1. . Thereafter, the same water-repellent layer as in Example 7 was provided,
The obtained lens is referred to as a lens of Example 8.

As a result of measuring the contact angle and the fogging elimination time for this lens in the same manner as in Example 1, the contact angle was 12
At 8 °, the fogging time was 11 seconds.

Example 9 As Example 9, after forming a base in the same manner as in Example 1, the base was applied to this solution for 10 seconds using the same etching solution as in Example 1. Dipped. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 9.

As a result of measuring the contact angle and the fogging elimination time of this lens in the same manner as in Example 1, the contact angle was 12
At 8 °, the fogging time was 11 seconds.

(Embodiment 10) As Embodiment 10, a base is formed in the same manner as in Embodiment 1, and
The same dry etching as in the fourth embodiment is performed. The etching time is 1 second. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 10.

As a result of measuring the contact angle and the fogging elimination time for this lens in the same manner as in Example 1, the contact angle was 13
At 0 °, the fogging time was 10 seconds.

(Embodiment 11) As Embodiment 11, after forming a base in the same manner as in Embodiment 1, dry etching similar to that in Embodiment 4 is performed on this base. At this time, the etching time is 5 seconds. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 11.

The contact angle and the fogging elimination time of this lens were measured in the same manner as in Example 1. As a result, the contact angle was 1
At 33 °, the fogging time was 9 seconds.

(Example 12) As Example 12, after forming an underlayer in the same manner as in Example 1, dry etching similar to that in Example 4 is performed on this underlayer. At this time, the etching time is 10 seconds. Then, Example 7
The lens obtained in Example 12 was provided with the same water-repellent layer as in Example 1.

For this lens, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 1
At 33 °, the fogging time was 10 seconds.

Comparative Example 1 As a comparative example, a lens is formed by directly providing a water-repellent layer on a base without performing an etching process.

In Comparative Example 1, after forming an underlayer in the same manner as in Example 1, a water-repellent layer containing the water-repellent used in Example 1 was formed on the underlayer by the vacuum evaporation method as in Example 1. It is formed using.

The contact angle and the fogging elimination time of the obtained lens were measured in the same manner as in Example 1. As a result, the contact angle was 109 ° and the fogging elimination time was 20 °.
Seconds.

(Comparative Example 2) In Comparative Example 2, after forming a base in the same manner as in Example 1, a water-repellent layer containing the water-repellent used in Example 7 was formed on the base. Similarly, it is formed using a vacuum evaporation method.

The contact angle and the fogging elimination time of the obtained lens were measured in the same manner as in Example 1. As a result, the contact angle was 108 ° and the fogging elimination time was 19 °.
Seconds.

(Thirteenth Embodiment) In the thirteenth embodiment, a base different from the base used in the first to twelfth embodiments is prepared. In the above-described embodiment, a plastic base material having a refractive index of 1.50 was used. In this case, however, the diameter of the main component is a urethane-modified dimethacrylate copolymer of brominated bisphenol A having a refractive index of 1.67. An 80 mm commercially available concave lens is used. This is referred to as a base material Sh.

Next, a coating solution used for forming a hard coat layer is prepared.

In a glass container, 100 parts of the above preliminary composition B was added.
Parts by weight, 220 parts by weight of a TiO ₂ sol (solid content: 30% by weight, average particle size: 30 nm) and 0.55 parts by weight of a silicone surfactant are added, and sufficiently stirred and mixed.
Thereby, the coating liquid Hh is adjusted.

The underlayer is formed by the same operation as the underlayer used in the above embodiment (embodiments 1 to 12). Substrate S
h at 60 ° C. in a 10% by weight aqueous solution of NaOH.
After soaking for a minute, wash with water and dry.

Next, after immersing the substrate Sh in the coating liquid Hh, it is pulled up at a pulling rate of 90 mm / min. Thereafter, a heat treatment is performed at 100 ° C. for 4 hours to cure the coating liquid Hh applied to the surface of the base material Sh. Thus, a hard coat layer having a thickness of about 2.2 μm is formed on the surface of the base material Sl. The refractive index of this hard coat layer is 1.6.
7

Next, a multilayer antireflection film is formed on the hard coat layer by using a vacuum evaporation method.

In order from the hard coat layer side, a first layer made of SiO _{2 having} a layer thickness of 0.025 μm, a second layer made of TiO _{2 having} a layer thickness of 0.15 μm, a second layer made of SiO ₂ , A third layer having a thickness of 0.35 μm, a fourth layer comprising TiO ₂ and a layer thickness of 0.11 μm;
₂ and a fifth layer having a layer thickness of 0.085 μm is laminated. The antireflection film having the five-layer structure is referred to as an antireflection film Ah.

Thus, a base different from the base used in the above-described embodiment can be formed. This foundation,
A hard coat layer and an antireflection film are provided on a substrate in this order.

Thereafter, the base is subjected to an etching process to form irregularities on the surface of the antireflection film. Here, the same wet etching as in the first embodiment is performed. The same etching solution as in Example 1 was used, and the underlayer was immersed in this solution for 1 second. Thereby, fine irregularities are formed on the surface of the antireflection film.

Thereafter, the same water-repellent layer as in Example 1 is formed on the antireflection film, and the lens of Example 13 is obtained.

The contact angle and the fogging time of this lens were measured in the same manner as in Example 1. As a result, the contact angle was 134 ° and the fogging time was 11 seconds.

(Embodiment 14) As Embodiment 14, after forming the same base as in Embodiment 13, wet etching is performed on this base. At this time, using the same etching solution as in Example 1, the base was immersed in this solution for 5 seconds.
Thereafter, a lens obtained by providing the same water-repellent layer as in Example 1 was used as the lens of Example 14.

The contact angle and the fogging elimination time of the lens of Example 14 were measured in the same manner as in Example 1. As a result, the contact angle was 132 ° and the fogging elimination time was 11 °.
Seconds.

(Embodiment 15) As Embodiment 15, after forming the same base as in Embodiment 13, wet etching is performed on this base. At this time, using the same etching solution as in Example 1, the base was immersed in this solution for 10 seconds. Thereafter, a lens obtained by providing the same water-repellent layer as in Example 1 was used as the lens of Example 15.

For the lens of Example 15, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 133 ° and the fogging elimination time was 11 °.
Seconds.

(Embodiment 16) As Embodiment 16, after forming the same base as in Embodiment 13, dry etching is performed on this base. At this time, etching is performed in the same manner as in the fourth embodiment. In Example 16, the etching time was 1 second. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 16.

For the lens of Example 16, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 130 ° and the fogging elimination time was 10 seconds.

(Embodiment 17) As Embodiment 17, after forming the same base as in Embodiment 13, dry etching is performed on this base. At this time, etching is performed in the same manner as in the fourth embodiment. In Example 17, the etching time was 5 seconds. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 17.

For the lens of Example 17, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 133 ° and the fogging elimination time was 10 seconds.

(Embodiment 18) As Embodiment 18, after the same base as that of Embodiment 13 is formed, dry etching is performed on this base. At this time, etching is performed in the same manner as in the fourth embodiment. In Example 18, the etching time was 10 seconds. Thereafter, the same water-repellent layer as in Example 1 was provided, and the obtained lens was used as the lens of Example 18.

For the lens of Example 18, the contact angle and the fogging elimination time were measured in the same manner as in Example 1. As a result, the contact angle was 134 ° and the fogging elimination time was 10 seconds.

(Example 19) As Example 19, after forming a base in the same manner as in Example 13, the base was immersed in this solution for 1 second using the same etching solution as in Example 1. . Thereafter, the same water-repellent layer as in Example 7 was provided, and the resulting lens was used as the lens of Example 19.

As a result of measuring the contact angle and the fogging elimination time of this lens in the same manner as in Example 1, the contact angle was 13
At 0 °, the fogging time was 10 seconds.

(Example 20) As Example 20, after forming a base in the same manner as in Example 13, the base was immersed in this solution for 5 seconds using the same etching solution as in Example 1. . Thereafter, the same water-repellent layer as in Example 7 was provided, and the resulting lens was used as the lens of Example 20.

As a result of measuring the contact angle and the fogging elimination time for this lens in the same manner as in Example 1, the contact angle was 12
At 9 °, the fogging time was 11 seconds.

(Example 21) As Example 21, after forming a base in the same manner as in Example 13, the base was immersed in this solution for 10 seconds using the same etching solution as in Example 1. . Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 21.

As a result of measuring the contact angle and the fogging elimination time of this lens in the same manner as in Example 1, the contact angle was 12
At 9 °, the fogging time was 11 seconds.

(Example 22) As Example 22, after forming an underlayer in the same manner as in Example 13, dry etching similar to that in Example 4 is performed on this underlayer. The etching time is 1 second. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 22.

As a result of measuring the contact angle and the fogging elimination time of this lens in the same manner as in Example 1, the contact angle was 13
At 1 °, the fogging time was 10 seconds.

Embodiment 23 As Embodiment 23, after forming a base in the same manner as in Embodiment 13, the base is subjected to the same dry etching as in Embodiment 4. The etching time is 5 seconds. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 23.

As a result of measuring the contact angle and the fogging elimination time for this lens in the same manner as in Example 1, the contact angle was 13
At 3 °, the fogging time was 9 seconds.

Embodiment 24 As Embodiment 24, after forming a base in the same manner as in Embodiment 13, the base is subjected to the same dry etching as in Embodiment 4. The etching time is 10 seconds. Thereafter, the same water-repellent layer as in Example 7 was provided, and the obtained lens was used as the lens of Example 24.

As a result of measuring the contact angle and the fogging elimination time for this lens in the same manner as in Example 1, the contact angle was 13
At 3 °, the fogging time was 11 seconds.

Comparative Example 3 As a comparative example, a lens is formed by directly providing a water-repellent layer on the underlayer used in Examples 13 to 24 without performing an etching process.

In Comparative Example 1, after forming a base in the same manner as in Example 13, a water-repellent layer containing the water-repellent used in Example 1 was formed on the base by the vacuum evaporation method as in Example 1. It is formed using.

The contact angle and the fogging elimination time of the obtained lens were measured in the same manner as in Example 1. As a result, the contact angle was 110 ° and the fogging elimination time was 18 °.
Seconds.

Comparative Example 4 In Comparative Example 4, after forming an underlayer in the same manner as in Example 13, a water-repellent layer containing the water-repellent used in Example 7 was formed on the underlayer. Similarly, it is formed using a vacuum evaporation method.

The contact angle and the fogging elimination time of the obtained lens were measured in the same manner as in Example 1. As a result, the contact angle was 108 ° and the fogging elimination time was 21 °.
Seconds.

Table 1 shows the measurement results of the water repellency and the fogging elimination time of the above-described Examples (1 to 12) and Comparative Examples (X1, X2).

Table 2 shows the measurement results of the water repellency and the fogging elimination time of Examples (13 to 24) and Comparative Examples (X3, X4).

In each table, the transparent member obtained in Example 1 (plastic lens for spectacles as an optical member) is shown as Sample No. 1, and the transparent member obtained in Example 2 is shown in Sample No. 2 in order. The numbers are the same as in the example. Further, Comparative Examples 1 to 4 correspond to sample numbers X1 to X4, respectively.
Indicated by.

The base material, the hard coat layer, and the antireflection film that constitute the base are indicated by the numbers or letters given in the above description. _{Also, C 8 F 17 C 2 H} 4 (CH 3) water-repellent layer as a water repellent Si (NH) _2/2
Are contained in a water-repellent layer (I), and I is indicated in the table. Further, C ₈ F ₁₇ C ₃ H ₆ (CH ₃ ) S is used as a water repellent.
The layer containing i (NH) _2/2 is referred to as a water-repellent layer (II), and is shown in the table as II. In addition, the etching process is indicated by W when it is processed by wet etching, and by D when it is processed by dry etching.

[0178]

[Table 1]

[0179]

[Table 2]

As a result, when comparing the lens of the comparative example manufactured without performing the etching treatment with the lens of the examples 1 to 24 subjected to the etching processing, the contact angle obtained by the lens of the example is different from that of the comparative example. It can be about 20 ° larger than the contact angle obtained with a lens. In addition, the water-repellent film provided on the conventional lens was not obtained.
A contact angle of 0 ° or more is obtained. Thereby, the water repellency of the lens can be further improved. Here, reference is made to FIG. FIG. 1A is an image diagram showing a contact angle between a surface of a lens obtained in a comparative example and a water droplet adhering to this surface. FIG. 1B is an image diagram showing a contact angle between a surface of the lens obtained in the embodiment of the present invention and a water droplet adhering to the surface. Further, FIG.
It is a schematic fragmentary enlarged view of (B). As shown in FIG. 1 (C), the unevenness 13 is formed on the surface of the base 11 by the etching process, and the monomolecular water-repellent film 15 is formed on the unevenness 13. Are also formed on the surface. Therefore, when the water droplet 17 adheres to the surface 15a of the water repellent film, the surface 15a of the water repellent film and the water droplet 17
The contact area between the water droplet 17 and the atmosphere is increased. Therefore, the water droplet 17 becomes more spherical due to the surface tension. Therefore, the contact angle θ increases as shown in FIG. In the comparative example, since the etching process was not performed, the surface 1
Area 00 and the water droplets 17 are in contact, because much greater than in Examples, the contact angle theta _x is smaller than the contact angle theta obtained in Example As shown in FIG. 1 (A).

As for the fogging elimination time, the fogging elimination time of the lens of the example can be reduced to about half of the time of the lens of the comparative example.

Further, as shown in FIG. 2A, an SiO ₂ film is formed on a soda lime glass by vacuum evaporation and etched (for about 1 second).
FIG. 2B shows a UHR-SEM image of the surface of the transparent member according to the present invention in which irregularities are formed on the surface of the SiO ₂ film,
4 shows a UHR-SEM image of a surface of a lens having an SiO ₂ film surface that has not been subjected to an etching process. Here, since SiO ₂ is a commonly used material as the uppermost layer of the anti-reflection film formed on the transparent member, SiO ₂ was selected as a target for forming unevenness. FIG.
(A) and (B) are SEMs magnified 50,000 times.
It is a photograph. As is clear from comparison between FIGS. 2A and 2B, etching (wet etching in this case)
For 1 second, it is possible to form fine irregularities on the surface of the film provided on the substrate.

[0183]

As is apparent from the above description, the transparent member according to the present invention is a transparent member having a surface having irregularities, and the irregularities do not lose the optical characteristics of the transparent member. In addition, the static contact angle between the surface and the water droplet adhering to the surface is larger than the contact angle between the surface having no irregularities and the water droplet adhering to the surface (the surface having no irregularities).

Since the irregularities are fine enough to have no influence on the measurement of the contact angle, the surface is measured as a normal flat surface when measuring the contact angle.
Therefore, the water repellency is improved without deteriorating the optical characteristics of the transparent member. Further, the transparent member of the present invention is:
The cloudy erasing time is shorter than that of a conventional transparent member with a water-repellent film. Therefore, the transparent member of the present invention is a member having characteristics such as having both water repellency and anti-fogging property, and thus is a transparent member suitable for use in a humid environment. In particular, if the transparent member of the present invention is an eyeglass lens, a lens that can withstand use in various environments can be manufactured.

[Brief description of the drawings]

FIG. 1A is an image diagram showing a contact angle between a surface of a lens of a comparative example and a water droplet adhering to the surface;
(B) is an image diagram showing a contact angle between the surface of the lens of the example and a water droplet adhering to the surface, and (C) is a partially enlarged view of FIG. 1 (B).

FIG. 2 (A) shows the surface of a lens according to the present invention in SE.
It is the drawing represented by M photograph, (B) is the drawing which represented the surface of the conventional lens by SEM photograph.

[Explanation of symbols]

 11: base 13: unevenness 15: water-repellent film 15a: surface 17: water droplet 100: surface of lens

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁶ Identification code FI G02B 1/04 G02B 1/04 1/10 1/12 1/11 7/02 1/12 1/10 Z 7/02 A

Claims (4)

[Claims] 1. A transparent member comprising a substrate or a substrate provided with a film on the substrate, wherein the surface of the substrate or the film has an increased static contact angle with water, and the optical characteristics of the member Characterized by having fine irregularities that do not substantially change the 2. The transparent member according to claim 1, wherein a dimension from a bottom to a top of the unevenness is 10 nm or more and 60 nm or more.
A transparent member having a range of not more than nm. 3. The transparent member according to claim 1, wherein, among the concaves and convexes, the concaves are about 1 μm ² per unit area.
A transparent member comprising from about 00 to about 150 pieces. 4. A transparent member having a surface having a static contact angle with water of at least 115 ° and a fogging elimination time of 15 seconds or less.