JPH11307523A5 - - Google Patents

Info

Publication number
JPH11307523A5
JPH11307523A5 JP1998113292A JP11329298A JPH11307523A5 JP H11307523 A5 JPH11307523 A5 JP H11307523A5 JP 1998113292 A JP1998113292 A JP 1998113292A JP 11329298 A JP11329298 A JP 11329298A JP H11307523 A5 JPH11307523 A5 JP H11307523A5
Authority
JP
Japan
Prior art keywords
gas
line
processing
exhaust
processing space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998113292A
Other languages
English (en)
Japanese (ja)
Other versions
JP4304354B2 (ja
JPH11307523A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11329298A priority Critical patent/JP4304354B2/ja
Priority claimed from JP11329298A external-priority patent/JP4304354B2/ja
Publication of JPH11307523A publication Critical patent/JPH11307523A/ja
Publication of JPH11307523A5 publication Critical patent/JPH11307523A5/ja
Application granted granted Critical
Publication of JP4304354B2 publication Critical patent/JP4304354B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP11329298A 1998-04-23 1998-04-23 半導体装置の処理方法 Expired - Lifetime JP4304354B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11329298A JP4304354B2 (ja) 1998-04-23 1998-04-23 半導体装置の処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11329298A JP4304354B2 (ja) 1998-04-23 1998-04-23 半導体装置の処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007010597A Division JP4342559B2 (ja) 2007-01-19 2007-01-19 基板処理装置及び半導体装置の形成方法

Publications (3)

Publication Number Publication Date
JPH11307523A JPH11307523A (ja) 1999-11-05
JPH11307523A5 true JPH11307523A5 (enExample) 2005-10-13
JP4304354B2 JP4304354B2 (ja) 2009-07-29

Family

ID=14608501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11329298A Expired - Lifetime JP4304354B2 (ja) 1998-04-23 1998-04-23 半導体装置の処理方法

Country Status (1)

Country Link
JP (1) JP4304354B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1013667C2 (nl) * 1999-11-25 2000-12-15 Asm Int Werkwijze en inrichting voor het vormen van een oxidelaag op wafers vervaardigd uit halfgeleidermateriaal.
JP4876322B2 (ja) * 2001-03-30 2012-02-15 東京エレクトロン株式会社 ロードロック室、その排気方法及び熱処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2670515B2 (ja) * 1988-08-26 1997-10-29 東京エレクトロン株式会社 縦型熱処理装置
JP2849255B2 (ja) * 1991-11-29 1999-01-20 東洋エンジニアリング株式会社 高性能半導体製造用の排気システムおよびその制御方法

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