JP2002246374A5 - - Google Patents

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Publication number
JP2002246374A5
JP2002246374A5 JP2001043686A JP2001043686A JP2002246374A5 JP 2002246374 A5 JP2002246374 A5 JP 2002246374A5 JP 2001043686 A JP2001043686 A JP 2001043686A JP 2001043686 A JP2001043686 A JP 2001043686A JP 2002246374 A5 JP2002246374 A5 JP 2002246374A5
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JP
Japan
Prior art keywords
gas
vacuum reaction
reaction chamber
electrode
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001043686A
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English (en)
Japanese (ja)
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JP2002246374A (ja
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Publication date
Application filed filed Critical
Priority to JP2001043686A priority Critical patent/JP2002246374A/ja
Priority claimed from JP2001043686A external-priority patent/JP2002246374A/ja
Publication of JP2002246374A publication Critical patent/JP2002246374A/ja
Publication of JP2002246374A5 publication Critical patent/JP2002246374A5/ja
Pending legal-status Critical Current

Links

JP2001043686A 2001-02-20 2001-02-20 プラズマ処理装置とそのメンテナンス方法 Pending JP2002246374A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001043686A JP2002246374A (ja) 2001-02-20 2001-02-20 プラズマ処理装置とそのメンテナンス方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001043686A JP2002246374A (ja) 2001-02-20 2001-02-20 プラズマ処理装置とそのメンテナンス方法

Publications (2)

Publication Number Publication Date
JP2002246374A JP2002246374A (ja) 2002-08-30
JP2002246374A5 true JP2002246374A5 (enExample) 2005-09-08

Family

ID=18905809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001043686A Pending JP2002246374A (ja) 2001-02-20 2001-02-20 プラズマ処理装置とそのメンテナンス方法

Country Status (1)

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JP (1) JP2002246374A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040035661A (ko) * 2004-04-08 2004-04-29 이대준 패널 제진장치의 양방향전환밸브장치
JP5329099B2 (ja) 2008-01-22 2013-10-30 株式会社日立ハイテクノロジーズ プラズマ処理装置及びその運転方法
CN106381479A (zh) * 2016-10-10 2017-02-08 无锡宏纳科技有限公司 晶圆化学气相淀积反应装置
CN106399974A (zh) * 2016-10-10 2017-02-15 无锡宏纳科技有限公司 常压化学气相淀积反应腔
CN106319482A (zh) * 2016-10-10 2017-01-11 无锡宏纳科技有限公司 增压式化学气相淀积反应腔

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