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真空反応室内を排気する排気系と、真空反応室内にガスラインを介してガスを導入するガス供給系と、真空反応室内で基板を配設する電極と、電極に高周波電力を供給する高周波電源とを備えたプラズマ処理装置において、ガスラインにガス供給系とは別に加圧ガスを供給する加圧ガス源を接続したことを特徴とするプラズマ処理装置。An exhaust system for exhausting the vacuum reaction chamber, a gas supply system for introducing a gas into the chamber vacuum reaction via a gas line,an electrode for arranging the substrate in a vacuum reaction chamber, a high frequency power supply for supplying high frequency power to the electrode A plasma processing apparatus comprising: a gas line connected with a pressurized gas source for supplying a pressurized gas separately from the gas supply system .真空反応室内を大気開放するとともに、真空反応室内にガスを導入するガスラインを通して加圧ガスを真空反応室内に噴出させ、真空反応室内の異物を除去することを特徴とするプラズマ処理装置のメンテナンス方法。A maintenance method for a plasma processing apparatus, wherein the vacuum reaction chamber is opened to the atmosphere and pressurized gas is ejected into the vacuum reaction chamber through a gas line that introduces gas into the vacuum reaction chamber to remove foreign matters in the vacuum reaction chamber. .
JP2001043686A2001-02-202001-02-20Plasma processor and maintenance method thereof
PendingJP2002246374A
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