JP2001279446A5 - - Google Patents

Download PDF

Info

Publication number
JP2001279446A5
JP2001279446A5 JP2000092547A JP2000092547A JP2001279446A5 JP 2001279446 A5 JP2001279446 A5 JP 2001279446A5 JP 2000092547 A JP2000092547 A JP 2000092547A JP 2000092547 A JP2000092547 A JP 2000092547A JP 2001279446 A5 JP2001279446 A5 JP 2001279446A5
Authority
JP
Japan
Prior art keywords
electrode
vacuum chamber
gas
openings
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000092547A
Other languages
English (en)
Japanese (ja)
Other versions
JP4439665B2 (ja
JP2001279446A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000092547A priority Critical patent/JP4439665B2/ja
Priority claimed from JP2000092547A external-priority patent/JP4439665B2/ja
Priority to US09/820,520 priority patent/US7594479B2/en
Publication of JP2001279446A publication Critical patent/JP2001279446A/ja
Publication of JP2001279446A5 publication Critical patent/JP2001279446A5/ja
Application granted granted Critical
Publication of JP4439665B2 publication Critical patent/JP4439665B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000092547A 2000-03-29 2000-03-29 プラズマｃｖｄ装置 Expired - Fee Related JP4439665B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000092547A JP4439665B2 (ja) 2000-03-29 2000-03-29 プラズマｃｖｄ装置
US09/820,520 US7594479B2 (en) 2000-03-29 2001-03-28 Plasma CVD device and discharge electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000092547A JP4439665B2 (ja) 2000-03-29 2000-03-29 プラズマｃｖｄ装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009252626A Division JP2010031381A (ja) 2009-11-04 2009-11-04 プラズマｃｖｄ装置

Publications (3)

Publication Number Publication Date
JP2001279446A JP2001279446A (ja) 2001-10-10
JP2001279446A5 true JP2001279446A5 (enExample) 2007-04-12
JP4439665B2 JP4439665B2 (ja) 2010-03-24

Family

ID=18607864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000092547A Expired - Fee Related JP4439665B2 (ja) 2000-03-29 2000-03-29 プラズマｃｖｄ装置

Country Status (2)

Country Link
US (1) US7594479B2 (enExample)
JP (1) JP4439665B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI328050B (en) * 2005-05-10 2010-08-01 Ulvac Inc Reeling type plasma cvd device
SG2012059440A (en) * 2007-08-10 2014-03-28 Quantum Global Tech Llc Methods and apparatus for ex situ seasoning of electronic device manufacturing process components
US8192806B1 (en) * 2008-02-19 2012-06-05 Novellus Systems, Inc. Plasma particle extraction process for PECVD
JP5698950B2 (ja) * 2009-10-23 2015-04-08 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2010031381A (ja) * 2009-11-04 2010-02-12 Semiconductor Energy Lab Co Ltd プラズマｃｖｄ装置
US8865259B2 (en) * 2010-04-26 2014-10-21 Singulus Mocvd Gmbh I.Gr. Method and system for inline chemical vapor deposition
JP5793170B2 (ja) * 2013-09-30 2015-10-14 株式会社日立国際電気 半導体装置の製造方法、基板処理装置およびプログラム
JP6209064B2 (ja) * 2013-11-13 2017-10-04 東レエンジニアリング株式会社 薄膜形成装置
DE102017108290B4 (de) * 2016-04-25 2021-05-06 Toyota Jidosha Kabushiki Kaisha Plasmavorrichtung
US11251019B2 (en) 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
JP6863199B2 (ja) 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
CN111575672B (zh) * 2020-06-05 2022-09-23 浙江晶驰光电科技有限公司 一种真空溅射镀膜机及其吸灰方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52122581A (en) 1976-04-07 1977-10-14 Koatsu Gas Kogyo Method of promotion of swine health
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4410558A (en) 1980-05-19 1983-10-18 Energy Conversion Devices, Inc. Continuous amorphous solar cell production system
US4519339A (en) 1981-03-16 1985-05-28 Sovonics Solar Systems Continuous amorphous solar cell production system
JPS58216475A (ja) 1982-06-09 1983-12-16 Agency Of Ind Science & Technol シリコン太陽電池の製造方法
JPS5934668A (ja) 1982-08-21 1984-02-25 Agency Of Ind Science & Technol 薄膜太陽電池の製造方法
US4520757A (en) 1982-10-27 1985-06-04 Energy Conversion Devices, Inc. Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
US4479455A (en) 1983-03-14 1984-10-30 Energy Conversion Devices, Inc. Process gas introduction and channeling system to produce a profiled semiconductor layer
US4545236A (en) 1984-06-15 1985-10-08 The United States Of America As Represented By The Secretary Of Agriculture Device for simulating stress on packages during coupling of railcars
JPS6243554A (ja) 1985-08-20 1987-02-25 Yashima Denki Kk 湿度調整装置
KR910003169B1 (ko) * 1985-11-12 1991-05-20 가부시끼가이샤 한도다이 에네르기 겐뀨소 반도체 장치 제조 방법 및 장치
JP2523070B2 (ja) 1991-11-22 1996-08-07 株式会社半導体エネルギー研究所 プラズマ処理装置
US5900103A (en) * 1994-04-20 1999-05-04 Tokyo Electron Limited Plasma treatment method and apparatus
JP3249356B2 (ja) 1995-10-26 2002-01-21 三菱重工業株式会社 プラズマ化学蒸着装置
US5614026A (en) * 1996-03-29 1997-03-25 Lam Research Corporation Showerhead for uniform distribution of process gas
EP0821395A3 (en) * 1996-07-19 1998-03-25 Tokyo Electron Limited Plasma processing apparatus

Similar Documents

Publication Publication Date Title
JP2001279446A5 (enExample)
EP0658918A3 (en) Plasma processing apparatus
KR970072182A (ko) 플라즈마 처리방법 및 그 장치
TW469534B (en) Plasma processing method and apparatus
CA2405743A1 (en) Twin plasma torch apparatus
TW365018B (en) Tandem process chamber
JP2002280378A5 (enExample)
AU2001293260A1 (en) Electrode for glow-discharge atmospheric plasma treatment
MX2009012750A (es) Instalacion de tratamiento al vacio y metodo de tratamiento al vacio.
WO2004051702A3 (en) Apparatus for treating surfaces of a substrate with atmospheric pressure plasma
WO2002012587A3 (en) Processing apparatus and cleaning method
TW353192B (en) Plasma processing apparatus avoiding discharges in association with secondary potentials
MY120869A (en) Plasma treatment apparatus and method
JP2005005701A5 (enExample)
EP0364215A3 (en) Plasma etching apparatus
MY142898A (en) Electrode member used in a plasma treating apparatus
WO2006118161A1 (ja) 基板処理装置および電極部材
JP2002246381A5 (enExample)
JP4730572B2 (ja) プラズマ成膜装置及びそのクリーニング方法
JP2002356778A5 (enExample)
JPH0831421B2 (ja) プラズマ電極装置
AU2003303653A1 (en) Catalytic gas treatment device which is intended, in particular, for a filter hood for cooking fumes
JP2003077904A5 (enExample)
JP2002319577A5 (ja) プラズマ処理装置用のプレート
JPH05283343A (ja) プラズマｃｖｄ装置