JP2003163201A5 - - Google Patents

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Publication number
JP2003163201A5
JP2003163201A5 JP2002263201A JP2002263201A JP2003163201A5 JP 2003163201 A5 JP2003163201 A5 JP 2003163201A5 JP 2002263201 A JP2002263201 A JP 2002263201A JP 2002263201 A JP2002263201 A JP 2002263201A JP 2003163201 A5 JP2003163201 A5 JP 2003163201A5
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JP
Japan
Prior art keywords
vacuum processing
processing chamber
sample
chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002263201A
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English (en)
Japanese (ja)
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JP2003163201A (ja
JP3993493B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2002263201A priority Critical patent/JP3993493B2/ja
Priority claimed from JP2002263201A external-priority patent/JP3993493B2/ja
Publication of JP2003163201A publication Critical patent/JP2003163201A/ja
Publication of JP2003163201A5 publication Critical patent/JP2003163201A5/ja
Application granted granted Critical
Publication of JP3993493B2 publication Critical patent/JP3993493B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002263201A 2002-09-09 2002-09-09 プラズマエッチング装置 Expired - Fee Related JP3993493B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002263201A JP3993493B2 (ja) 2002-09-09 2002-09-09 プラズマエッチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002263201A JP3993493B2 (ja) 2002-09-09 2002-09-09 プラズマエッチング装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP14767298A Division JP3583289B2 (ja) 1998-05-28 1998-05-28 プラズマ処理装置及びプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2003163201A JP2003163201A (ja) 2003-06-06
JP2003163201A5 true JP2003163201A5 (enExample) 2005-10-06
JP3993493B2 JP3993493B2 (ja) 2007-10-17

Family

ID=19196793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002263201A Expired - Fee Related JP3993493B2 (ja) 2002-09-09 2002-09-09 プラズマエッチング装置

Country Status (1)

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JP (1) JP3993493B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405521B2 (en) * 2003-08-22 2008-07-29 Lam Research Corporation Multiple frequency plasma processor method and apparatus
JP5324026B2 (ja) * 2006-01-18 2013-10-23 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理装置の制御方法
CN100514571C (zh) * 2006-08-02 2009-07-15 美商慧程系统科技股份有限公司 等离子体刻蚀系统
JP5317424B2 (ja) 2007-03-28 2013-10-16 東京エレクトロン株式会社 プラズマ処理装置
US7758764B2 (en) * 2007-06-28 2010-07-20 Lam Research Corporation Methods and apparatus for substrate processing
JP5601794B2 (ja) * 2009-05-29 2014-10-08 株式会社東芝 プラズマエッチング装置
JP5956933B2 (ja) * 2013-01-15 2016-07-27 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置

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