JP2002356778A5 - - Google Patents

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Publication number
JP2002356778A5
JP2002356778A5 JP2001164786A JP2001164786A JP2002356778A5 JP 2002356778 A5 JP2002356778 A5 JP 2002356778A5 JP 2001164786 A JP2001164786 A JP 2001164786A JP 2001164786 A JP2001164786 A JP 2001164786A JP 2002356778 A5 JP2002356778 A5 JP 2002356778A5
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JP
Japan
Prior art keywords
film forming
deposited film
forming
shaped member
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001164786A
Other languages
English (en)
Japanese (ja)
Other versions
JP4651072B2 (ja
JP2002356778A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001164786A priority Critical patent/JP4651072B2/ja
Priority claimed from JP2001164786A external-priority patent/JP4651072B2/ja
Priority to US10/153,721 priority patent/US6727456B2/en
Publication of JP2002356778A publication Critical patent/JP2002356778A/ja
Publication of JP2002356778A5 publication Critical patent/JP2002356778A5/ja
Application granted granted Critical
Publication of JP4651072B2 publication Critical patent/JP4651072B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001164786A 2001-05-31 2001-05-31 堆積膜形成方法、および堆積膜形成装置 Expired - Fee Related JP4651072B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001164786A JP4651072B2 (ja) 2001-05-31 2001-05-31 堆積膜形成方法、および堆積膜形成装置
US10/153,721 US6727456B2 (en) 2001-05-31 2002-05-24 Deposited film forming method and deposited film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001164786A JP4651072B2 (ja) 2001-05-31 2001-05-31 堆積膜形成方法、および堆積膜形成装置

Publications (3)

Publication Number Publication Date
JP2002356778A JP2002356778A (ja) 2002-12-13
JP2002356778A5 true JP2002356778A5 (enExample) 2008-07-17
JP4651072B2 JP4651072B2 (ja) 2011-03-16

Family

ID=19007557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001164786A Expired - Fee Related JP4651072B2 (ja) 2001-05-31 2001-05-31 堆積膜形成方法、および堆積膜形成装置

Country Status (2)

Country Link
US (1) US6727456B2 (enExample)
JP (1) JP4651072B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4560245B2 (ja) * 2001-06-29 2010-10-13 キヤノン株式会社 光起電力素子
US7105460B2 (en) * 2002-07-11 2006-09-12 Applied Materials Nitrogen-free dielectric anti-reflective coating and hardmask
US9252318B2 (en) * 2008-03-05 2016-02-02 Hanergy Hi-Tech Power (Hk) Limited Solution containment during buffer layer deposition
WO2010065955A1 (en) * 2008-12-05 2010-06-10 Solopower, Inc. Method and apparatus for forming contact layers for continuous workpieces
JP5440936B2 (ja) * 2010-01-21 2014-03-12 富士電機株式会社 薄膜製造装置
US9818906B2 (en) 2013-12-20 2017-11-14 NuvoSun, Inc. Web based chemical bath deposition apparatus
TW201534755A (zh) * 2013-12-20 2015-09-16 Nuvosun Inc 基於薄板的化學浴沉積設備
CN112134529A (zh) * 2020-09-25 2020-12-25 广州美旭信息科技有限公司 一种太阳能移动充电设备
CN112636685B (zh) * 2020-12-03 2022-03-01 常州工程职业技术学院 一种光伏组件自清洁系统
CN112247327B (zh) * 2020-12-21 2021-05-14 衡阳市新德力交通材料有限公司 一种等离子切割机

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400409A (en) 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4462333A (en) 1982-10-27 1984-07-31 Energy Conversion Devices, Inc. Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
US4759993A (en) * 1985-04-25 1988-07-26 Ovonic Synthetic Materials Co., Inc. Plasma chemical vapor deposition SiO2-x coated articles and plasma assisted chemical vapor deposition method of applying the coating
EP0609104B1 (en) * 1993-01-29 1998-05-20 Canon Kabushiki Kaisha Process for the formation of functional deposited films
US6273955B1 (en) 1995-08-28 2001-08-14 Canon Kabushiki Kaisha Film forming apparatus
JP3578293B2 (ja) * 1995-12-11 2004-10-20 キヤノン株式会社 機能性堆積膜の連続的形成方法およびその装置
JP3332700B2 (ja) 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JP3902878B2 (ja) * 1998-11-30 2007-04-11 キヤノン株式会社 機能性堆積膜の形成装置

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