JPH11152592A - 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料 - Google Patents

高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料

Info

Publication number
JPH11152592A
JPH11152592A JP9332285A JP33228597A JPH11152592A JP H11152592 A JPH11152592 A JP H11152592A JP 9332285 A JP9332285 A JP 9332285A JP 33228597 A JP33228597 A JP 33228597A JP H11152592 A JPH11152592 A JP H11152592A
Authority
JP
Japan
Prior art keywords
nickel
less
ppm
purity nickel
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9332285A
Other languages
English (en)
Japanese (ja)
Inventor
Yuichiro Shindo
裕一朗 新藤
Tsuneo Suzuki
恒男 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Japan Energy Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Energy Corp filed Critical Japan Energy Corp
Priority to JP9332285A priority Critical patent/JPH11152592A/ja
Priority to KR1019980049364A priority patent/KR19990045359A/ko
Publication of JPH11152592A publication Critical patent/JPH11152592A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B23/00—Obtaining nickel or cobalt
    • C22B23/06—Refining
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B23/00—Obtaining nickel or cobalt
    • C22B23/04—Obtaining nickel or cobalt by wet processes
    • C22B23/0407—Leaching processes
    • C22B23/0415—Leaching processes with acids or salt solutions except ammonium salts solutions
    • C22B23/0423—Halogenated acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
    • C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
JP9332285A 1997-11-18 1997-11-18 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料 Withdrawn JPH11152592A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9332285A JPH11152592A (ja) 1997-11-18 1997-11-18 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料
KR1019980049364A KR19990045359A (ko) 1997-11-18 1998-11-18 고순도니켈의 제조방법 및 박막형성용 고순도니켈재료

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9332285A JPH11152592A (ja) 1997-11-18 1997-11-18 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料

Publications (1)

Publication Number Publication Date
JPH11152592A true JPH11152592A (ja) 1999-06-08

Family

ID=18253252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9332285A Withdrawn JPH11152592A (ja) 1997-11-18 1997-11-18 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料

Country Status (2)

Country Link
JP (1) JPH11152592A (ko)
KR (1) KR19990045359A (ko)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003014421A1 (en) * 2001-08-01 2003-02-20 Nikko Materials Company, Limited Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target
JP2003089835A (ja) * 2001-09-17 2003-03-28 Hitachi Metals Ltd ニッケル材料
WO2003062488A1 (fr) * 2002-01-24 2003-07-31 Nikko Materials Company, Limited Cible de pulverisation en alliage de nickel ou en nickel de haute purete et son procede de fabrication
WO2006010305A1 (fr) * 2004-07-28 2006-02-02 Jinchuan Group Ltd. Procede d'obtention d'un nickel de grande purete
JP2009215623A (ja) * 2008-03-12 2009-09-24 Dowa Metals & Mining Co Ltd インジウムの回収方法
JP2010047843A (ja) * 2004-03-01 2010-03-04 Nippon Mining & Metals Co Ltd Ｎｉ−Ｐｔ合金の製造方法及び同合金ターゲットの製造方法
WO2011132740A1 (ja) * 2010-04-21 2011-10-27 Uehara Haruo レアメタル回収方法及びその装置
JP2012041265A (ja) * 2011-08-23 2012-03-01 Tanaka Chemical Corp ニッケル酸化物の製造方法
JP2013189670A (ja) * 2012-03-13 2013-09-26 Sumitomo Metal Mining Co Ltd 湿式製錬方法
JP2020169365A (ja) * 2019-04-04 2020-10-15 Ｊｘ金属株式会社 活性炭の前処理方法および、金属回収方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100686985B1 (ko) * 2004-05-10 2007-02-27 박재호 니켈폐액 및 수산니켈슬러지에서 니켈 회수방법
KR101397743B1 (ko) * 2010-09-24 2014-05-20 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 고순도 니켈의 제조 방법
KR101144946B1 (ko) * 2010-09-29 2012-05-11 한국전력공사 초내열 합금 및 내열강의 전해추출방법

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2450474A1 (en) * 2001-08-01 2012-05-09 JX Nippon Mining & Metals Corporation High purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said sputtering target
WO2003014421A1 (en) * 2001-08-01 2003-02-20 Nikko Materials Company, Limited Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target
US7435325B2 (en) * 2001-08-01 2008-10-14 Nippon Mining & Metals Co., Ltd Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target
JP2003089835A (ja) * 2001-09-17 2003-03-28 Hitachi Metals Ltd ニッケル材料
WO2003062488A1 (fr) * 2002-01-24 2003-07-31 Nikko Materials Company, Limited Cible de pulverisation en alliage de nickel ou en nickel de haute purete et son procede de fabrication
JP2010047843A (ja) * 2004-03-01 2010-03-04 Nippon Mining & Metals Co Ltd Ｎｉ−Ｐｔ合金の製造方法及び同合金ターゲットの製造方法
JP4659829B2 (ja) * 2004-07-28 2011-03-30 金川集▲団▼有限公司 高純度ニッケルを生成する方法
JP2008507628A (ja) * 2004-07-28 2008-03-13 金川集▲団▼有限公司 高純度ニッケルを生成する方法
WO2006010305A1 (fr) * 2004-07-28 2006-02-02 Jinchuan Group Ltd. Procede d'obtention d'un nickel de grande purete
JP2009215623A (ja) * 2008-03-12 2009-09-24 Dowa Metals & Mining Co Ltd インジウムの回収方法
WO2011132740A1 (ja) * 2010-04-21 2011-10-27 Uehara Haruo レアメタル回収方法及びその装置
CN102906286A (zh) * 2010-04-21 2013-01-30 上原春男 稀有金属回收方法及其装置
JP5283783B2 (ja) * 2010-04-21 2013-09-04 春男 上原 レアメタル回収方法及びその装置
US8974572B2 (en) 2010-04-21 2015-03-10 Haruo Uehara Method and apparatus for recovering rare metal
CN102906286B (zh) * 2010-04-21 2016-03-02 上原春男 稀有金属回收方法及其装置
JP2012041265A (ja) * 2011-08-23 2012-03-01 Tanaka Chemical Corp ニッケル酸化物の製造方法
JP2013189670A (ja) * 2012-03-13 2013-09-26 Sumitomo Metal Mining Co Ltd 湿式製錬方法
JP2020169365A (ja) * 2019-04-04 2020-10-15 Ｊｘ金属株式会社 活性炭の前処理方法および、金属回収方法

Also Published As

Publication number Publication date
KR19990045359A (ko) 1999-06-25

Similar Documents

Publication Publication Date Title
US6485542B2 (en) Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering target
US5667665A (en) Process of producing high purity cobalt
JPH11152592A (ja) 高純度ニッケルの製造方法及び薄膜形成用高純度ニッケル材料
JP4840808B2 (ja) 高純度ニッケル、高純度ニッケルターゲット及び高純度ニッケル薄膜
US6818119B2 (en) Method for processing metals
US10882757B2 (en) Anhydrous nickel chloride and method for producing the same
JP3825984B2 (ja) 高純度マンガンの製造方法
JP2000219988A (ja) 高純度ニッケル材の製造法及び薄膜形成用高純度ニッケル材
JPH08253888A (ja) 高純度コバルトの製造方法
JP3065242B2 (ja) 高純度コバルトの製造方法及び高純度コバルトスパッタリングターゲット
JP2000144305A (ja) 薄膜形成用高純度鉄材料及びその製造方法
TWI252875B (en) Method and device for producing high-purity metal
JPH073486A (ja) 高純度コバルト及びその製造方法
JP3943351B2 (ja) 高純度Ｃｏ−Ｆｅ合金スパッタリングターゲット及び同スパッタリングターゲットを用いて形成した磁性薄膜並びに高純度Ｃｏ−Ｆｅ合金スパッタリングターゲットの製造方法
JPH08127890A (ja) 高純度コバルトの製造方法
JPH06192874A (ja) コバルトの精製方法
JPH06192879A (ja) コバルトの精製方法
JP3151195B2 (ja) コバルトの精製方法
JPH04265203A (ja) 無水フツ化水素の精製法
JP2001081507A (ja) 高純度コバルト粉及びその製造方法
JP3095730B2 (ja) 高純度コバルトの製造方法
JP2002146580A (ja) 金属の高純度化方法
JPH0881719A (ja) 高純度の銅の製造方法
JPH0587596B2 (ko)
KR20100117246A (ko) 황산동 용액 중 은(Ａｇ) 제거 방법

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20050201