JPH11140629A5 - - Google Patents

Info

Publication number
JPH11140629A5
JPH11140629A5 JP1998245458A JP24545898A JPH11140629A5 JP H11140629 A5 JPH11140629 A5 JP H11140629A5 JP 1998245458 A JP1998245458 A JP 1998245458A JP 24545898 A JP24545898 A JP 24545898A JP H11140629 A5 JPH11140629 A5 JP H11140629A5
Authority
JP
Japan
Prior art keywords
cathode
vessel
contactor
substrate
electrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998245458A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11140629A (ja
Filing date
Publication date
Priority claimed from US08/919,129 external-priority patent/US5932078A/en
Application filed filed Critical
Publication of JPH11140629A publication Critical patent/JPH11140629A/ja
Publication of JPH11140629A5 publication Critical patent/JPH11140629A5/ja
Pending legal-status Critical Current

Links

JP10245458A 1997-08-30 1998-08-31 カソードアーク気相堆積装置 Pending JPH11140629A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/919129 1997-08-30
US08/919,129 US5932078A (en) 1997-08-30 1997-08-30 Cathodic arc vapor deposition apparatus

Publications (2)

Publication Number Publication Date
JPH11140629A JPH11140629A (ja) 1999-05-25
JPH11140629A5 true JPH11140629A5 (enExample) 2005-11-04

Family

ID=25441551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10245458A Pending JPH11140629A (ja) 1997-08-30 1998-08-31 カソードアーク気相堆積装置

Country Status (6)

Country Link
US (1) US5932078A (enExample)
EP (1) EP0899772B1 (enExample)
JP (1) JPH11140629A (enExample)
KR (1) KR100569043B1 (enExample)
DE (1) DE69840142D1 (enExample)
SG (1) SG67546A1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1111086B1 (en) * 1999-12-20 2009-04-08 United Technologies Corporation Use of a cathode for cathodic arc deposition
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
DE10209423A1 (de) * 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
US6770178B2 (en) * 2002-08-09 2004-08-03 United Technologies Corporation Cathodic arc disposable sting shielding
US20050233551A1 (en) * 2004-04-15 2005-10-20 Board Of Control Of Michigan Technological University Method for depositing silicon by pulsed cathodic vacuum arc
US8241468B2 (en) * 2004-12-13 2012-08-14 United Technologies Corporation Method and apparatus for cathodic arc deposition of materials on a substrate
US20070138019A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation Platinum modified NiCoCrAlY bondcoat for thermal barrier coating
US7214409B1 (en) 2005-12-21 2007-05-08 United Technologies Corporation High strength Ni-Pt-Al-Hf bondcoat
US20100143232A1 (en) * 2006-06-21 2010-06-10 Benedict James Costello Metal binary and ternary compounds produced by cathodic arc deposition
US7879203B2 (en) * 2006-12-11 2011-02-01 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
AU2008216170B2 (en) 2007-02-14 2012-07-26 Otsuka Pharmaceutical Co., Ltd. In-body power source having high surface area electrode
US8088260B2 (en) * 2007-08-14 2012-01-03 United Technologies Corporation Puck for cathodic arc coating with continuous groove to control arc
US8968528B2 (en) * 2008-04-14 2015-03-03 United Technologies Corporation Platinum-modified cathodic arc coating
US8641963B2 (en) 2008-07-08 2014-02-04 United Technologies Corporation Economic oxidation and fatigue resistant metallic coating
US8419857B2 (en) * 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating
CN102443766A (zh) * 2010-10-15 2012-05-09 鸿富锦精密工业（深圳）有限公司 镀膜料架及具有该镀膜料架的镀膜设备
TW201226607A (en) * 2010-12-21 2012-07-01 Hon Hai Prec Ind Co Ltd Sputtering device
US9359669B2 (en) 2011-12-09 2016-06-07 United Technologies Corporation Method for improved cathodic arc coating process
US10704136B2 (en) * 2013-03-05 2020-07-07 Raytheon Technologies Corporation Cathodic arc deposition stinger
JP5941016B2 (ja) * 2013-05-27 2016-06-29 株式会社神戸製鋼所 成膜装置およびそれを用いた成膜方法
EP3055441B1 (en) * 2013-10-08 2022-01-12 Raytheon Technologies Corporation Cathodic arc deposition apparatus and method for coating a workpiece
WO2015077163A1 (en) 2013-11-19 2015-05-28 United Technologies Corporation Article having variable composition coating
US10364490B2 (en) * 2013-12-10 2019-07-30 United Technologies Corporation Chromizing over cathodic arc coating
US20170198601A1 (en) 2016-01-12 2017-07-13 United Technologies Corporation Internally cooled ni-base superalloy component with spallation-resistant tbc system

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
NL8700620A (nl) * 1987-03-16 1988-10-17 Hauzer Holding Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan.
DE58909180D1 (de) * 1988-03-23 1995-05-24 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung von Werkstücken.
US5011638A (en) * 1988-06-17 1991-04-30 Vapor Technologies, Inc. Method of making open-pore structures
US4869203A (en) * 1988-07-18 1989-09-26 Vapor Technologies Inc. Apparatus for coating a metal gas-pressure bottle or tank
US4978556A (en) * 1988-07-18 1990-12-18 Vapor Technologies Inc. Electrode for vapor deposition and vapor-deposition method using same
US4859489A (en) * 1988-07-18 1989-08-22 Vapor Technologies Inc. Method of coating a metal gas-pressure bottle or tank
US4924135A (en) * 1988-07-18 1990-05-08 Vapor Technologies Inc. Electrode for vapor deposition and vapor-deposition method using same
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
US4942844A (en) * 1988-11-25 1990-07-24 Vapor Technologies Inc. High penetration deposition process and apparatus
US5045344A (en) * 1989-11-16 1991-09-03 Vapor Technologies, Inc. Method of making reflective articles
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
FR2670218B1 (fr) * 1990-12-06 1993-02-05 Innovatique Sa Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
US5269898A (en) * 1991-03-20 1993-12-14 Vapor Technologies, Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
JP2758999B2 (ja) * 1991-04-10 1998-05-28 株式会社神戸製鋼所 真空アーク蒸着装置
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE69226725T2 (de) * 1991-05-29 1999-02-18 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe Beschichtungsanlage mittels Kathodenzerstäubung und Methode zur Steuerung derselben
JPH0673538A (ja) * 1992-05-26 1994-03-15 Kobe Steel Ltd アークイオンプレーティング装置
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
JPH06240444A (ja) * 1993-02-15 1994-08-30 Kobe Steel Ltd バレル式アークイオンプレーティング装置
US5730847A (en) * 1993-03-15 1998-03-24 Kabushiki Kaisha Kobeseikosho Arc ion plating device and arc ion plating system
US5317235A (en) * 1993-03-22 1994-05-31 Ism Technolog Magnetically-filtered cathodic arc plasma apparatus
KR100365807B1 (ko) * 1994-02-17 2003-05-12 유나이티드 테크놀로지스 코포레이션 티타늄합금의산화방지를위한코팅방법및내산화성구조체
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
US5588975A (en) * 1995-05-25 1996-12-31 Si Diamond Technology, Inc. Coated grinding tool

Similar Documents

Publication Publication Date Title
JPH11140629A5 (enExample)
US4987006A (en) Laser transfer deposition
TW507496B (en) Flexible circuits with static discharge protection and process for manufacture
JP2859632B2 (ja) 成膜装置及び成膜方法
US4411733A (en) SPER Device for material working
CN107267916A (zh) 一种在硬质合金表面通过直流磁控溅射沉积w‑n硬质膜的方法
US5284539A (en) Method of making segmented pyrolytic graphite sputtering targets
JP2001500569A (ja) ガス流スパッタリングにより基板を被覆する方法及び装置
JPH05504793A (ja) 混合金属酸化物の薄膜を生成する装置
JPH07335732A (ja) 静電チャック、これを用いたプラズマ処理装置及びこの製造方法
JP4019457B2 (ja) アーク式蒸発源
JPS5590377A (en) Liquid jet recording head
JP2570560Y2 (ja) 電子ビーム蒸発源
CN223074240U (zh) 一种真空镀膜用侧引弧机构
JP3647653B2 (ja) クラスタ生成装置
JP2005320599A (ja) カソード取付構造体、カソード取付構造体を用いた薄膜形成装置および薄膜形成方法
JP4015879B2 (ja) スパッタリング方法とその装置
JPH09142820A (ja) 異方性黒鉛薄膜基板、並びにそれを用いた応用装置及び応用素子
JP2913813B2 (ja) 成膜方法および成膜装置
JP3048555B2 (ja) 薄膜の製造方法とその装置
JP3844630B2 (ja) ターゲットホルダー
US3881038A (en) Low temperature metallization of ferrite
JP3452458B2 (ja) 薄膜形成装置
WO2024087065A1 (zh) 电镀系统及电镀生产线
JP2005054210A (ja) 薄膜の製造装置