KR100569043B1 - 캐소우드아크증착장치 - Google Patents

캐소우드아크증착장치 Download PDF

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Publication number
KR100569043B1
KR100569043B1 KR1019980035351A KR19980035351A KR100569043B1 KR 100569043 B1 KR100569043 B1 KR 100569043B1 KR 1019980035351 A KR1019980035351 A KR 1019980035351A KR 19980035351 A KR19980035351 A KR 19980035351A KR 100569043 B1 KR100569043 B1 KR 100569043B1
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KR
South Korea
Prior art keywords
cathode
contactor
vessel
arc
platter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019980035351A
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English (en)
Korean (ko)
Other versions
KR19990024029A (ko
Inventor
러셀 에이 비어스
로버트 이 핸드릭스
딘 엔 마잘
알랜 에이 노우트젤
로버트 제이 라이트
티러스 이 로얄
Original Assignee
유나이티드 테크놀로지스 코포레이션
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Publication of KR19990024029A publication Critical patent/KR19990024029A/ko
Application granted granted Critical
Publication of KR100569043B1 publication Critical patent/KR100569043B1/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1019980035351A 1997-08-30 1998-08-29 캐소우드아크증착장치 Expired - Fee Related KR100569043B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/919,129 1997-08-30
US08/919,129 US5932078A (en) 1997-08-30 1997-08-30 Cathodic arc vapor deposition apparatus
US8/919,129 1997-08-30

Publications (2)

Publication Number Publication Date
KR19990024029A KR19990024029A (ko) 1999-03-25
KR100569043B1 true KR100569043B1 (ko) 2006-06-21

Family

ID=25441551

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980035351A Expired - Fee Related KR100569043B1 (ko) 1997-08-30 1998-08-29 캐소우드아크증착장치

Country Status (6)

Country Link
US (1) US5932078A (enExample)
EP (1) EP0899772B1 (enExample)
JP (1) JPH11140629A (enExample)
KR (1) KR100569043B1 (enExample)
DE (1) DE69840142D1 (enExample)
SG (1) SG67546A1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60041951D1 (de) * 1999-12-20 2009-05-20 United Technologies Corp Verwendung einer Kathode zur Vakuumbogenverdampfung
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
DE10209423A1 (de) * 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
US6770178B2 (en) * 2002-08-09 2004-08-03 United Technologies Corporation Cathodic arc disposable sting shielding
US20050233551A1 (en) * 2004-04-15 2005-10-20 Board Of Control Of Michigan Technological University Method for depositing silicon by pulsed cathodic vacuum arc
US8241468B2 (en) * 2004-12-13 2012-08-14 United Technologies Corporation Method and apparatus for cathodic arc deposition of materials on a substrate
US20070138019A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation Platinum modified NiCoCrAlY bondcoat for thermal barrier coating
US7214409B1 (en) 2005-12-21 2007-05-08 United Technologies Corporation High strength Ni-Pt-Al-Hf bondcoat
US20100131023A1 (en) * 2006-06-21 2010-05-27 Benedict James Costello Implantable medical devices comprising cathodic arc produced structures
US7879203B2 (en) * 2006-12-11 2011-02-01 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
CN103066226B (zh) 2007-02-14 2016-09-14 普罗透斯数字保健公司 具有高表面积电极的体内电源
US8088260B2 (en) * 2007-08-14 2012-01-03 United Technologies Corporation Puck for cathodic arc coating with continuous groove to control arc
US8968528B2 (en) * 2008-04-14 2015-03-03 United Technologies Corporation Platinum-modified cathodic arc coating
US8641963B2 (en) 2008-07-08 2014-02-04 United Technologies Corporation Economic oxidation and fatigue resistant metallic coating
US8419857B2 (en) * 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating
CN102443766A (zh) * 2010-10-15 2012-05-09 鸿富锦精密工业（深圳）有限公司 镀膜料架及具有该镀膜料架的镀膜设备
TW201226607A (en) * 2010-12-21 2012-07-01 Hon Hai Prec Ind Co Ltd Sputtering device
US9359669B2 (en) 2011-12-09 2016-06-07 United Technologies Corporation Method for improved cathodic arc coating process
US10704136B2 (en) * 2013-03-05 2020-07-07 Raytheon Technologies Corporation Cathodic arc deposition stinger
JP5941016B2 (ja) * 2013-05-27 2016-06-29 株式会社神戸製鋼所 成膜装置およびそれを用いた成膜方法
US9786474B2 (en) 2013-10-08 2017-10-10 United Technologies Corporation Cathodic arc deposition apparatus and method
US11261742B2 (en) 2013-11-19 2022-03-01 Raytheon Technologies Corporation Article having variable composition coating
EP3080329B1 (en) 2013-12-10 2023-04-05 Raytheon Technologies Corporation Chromizing over cathodic arc coating
US20170198601A1 (en) 2016-01-12 2017-07-13 United Technologies Corporation Internally cooled ni-base superalloy component with spallation-resistant tbc system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0508612A2 (en) * 1991-03-20 1992-10-14 Vapor Technologies Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
EP0643151A1 (en) * 1993-03-15 1995-03-15 Kabushiki Kaisha Kobeseikosho Apparatus and system for arc ion plating

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
NL8700620A (nl) * 1987-03-16 1988-10-17 Hauzer Holding Kathode boogverdampingsinrichting alsmede werkwijze voor het bedrijven daarvan.
EP0334204B1 (de) * 1988-03-23 1995-04-19 Balzers Aktiengesellschaft Verfahren und Anlage zur Beschichtung von Werkstücken
US5011638A (en) * 1988-06-17 1991-04-30 Vapor Technologies, Inc. Method of making open-pore structures
US4978556A (en) * 1988-07-18 1990-12-18 Vapor Technologies Inc. Electrode for vapor deposition and vapor-deposition method using same
US4869203A (en) * 1988-07-18 1989-09-26 Vapor Technologies Inc. Apparatus for coating a metal gas-pressure bottle or tank
US4859489A (en) * 1988-07-18 1989-08-22 Vapor Technologies Inc. Method of coating a metal gas-pressure bottle or tank
US4924135A (en) * 1988-07-18 1990-05-08 Vapor Technologies Inc. Electrode for vapor deposition and vapor-deposition method using same
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
US4942844A (en) * 1988-11-25 1990-07-24 Vapor Technologies Inc. High penetration deposition process and apparatus
US5045344A (en) * 1989-11-16 1991-09-03 Vapor Technologies, Inc. Method of making reflective articles
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
FR2670218B1 (fr) * 1990-12-06 1993-02-05 Innovatique Sa Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
JP2758999B2 (ja) * 1991-04-10 1998-05-28 株式会社神戸製鋼所 真空アーク蒸着装置
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE69226725T2 (de) * 1991-05-29 1999-02-18 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe Beschichtungsanlage mittels Kathodenzerstäubung und Methode zur Steuerung derselben
JPH0673538A (ja) * 1992-05-26 1994-03-15 Kobe Steel Ltd アークイオンプレーティング装置
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
JPH06240444A (ja) * 1993-02-15 1994-08-30 Kobe Steel Ltd バレル式アークイオンプレーティング装置
US5317235A (en) * 1993-03-22 1994-05-31 Ism Technolog Magnetically-filtered cathodic arc plasma apparatus
WO1995022636A1 (en) * 1994-02-17 1995-08-24 United Technologies Corporation Oxidation resistant coating for titanium alloys
US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
US5480527A (en) * 1994-04-25 1996-01-02 Vapor Technologies, Inc. Rectangular vacuum-arc plasma source
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
US5588975A (en) * 1995-05-25 1996-12-31 Si Diamond Technology, Inc. Coated grinding tool

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0508612A2 (en) * 1991-03-20 1992-10-14 Vapor Technologies Inc. Apparatus and method for coating a substrate using vacuum arc evaporation
EP0643151A1 (en) * 1993-03-15 1995-03-15 Kabushiki Kaisha Kobeseikosho Apparatus and system for arc ion plating

Also Published As

Publication number Publication date
SG67546A1 (en) 1999-09-21
KR19990024029A (ko) 1999-03-25
EP0899772B1 (en) 2008-10-22
DE69840142D1 (de) 2008-12-04
EP0899772A3 (en) 2000-11-08
JPH11140629A (ja) 1999-05-25
EP0899772A2 (en) 1999-03-03
US5932078A (en) 1999-08-03

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