JPH11140629A - カソードアーク気相堆積装置 - Google Patents

カソードアーク気相堆積装置

Info

Publication number
JPH11140629A
JPH11140629A JP10245458A JP24545898A JPH11140629A JP H11140629 A JPH11140629 A JP H11140629A JP 10245458 A JP10245458 A JP 10245458A JP 24545898 A JP24545898 A JP 24545898A JP H11140629 A JPH11140629 A JP H11140629A
Authority
JP
Japan
Prior art keywords
cathode
contactor
container
platter
arc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10245458A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11140629A5 (enExample
Inventor
Russell A Beers
エイ．ビアーズ ラッセル
Robert E Hendricks
イー．ヘンドリックス ロバート
Dean N Marszal
エヌ．マーザル ディーン
Allan A Noetzel
エイ．ノエゼル アラン
Robert J Wright
ジェイ．ライト ロバート
Tyrus E Royal
イー．ロイヤル ティルス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RTX Corp
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Publication of JPH11140629A publication Critical patent/JPH11140629A/ja
Publication of JPH11140629A5 publication Critical patent/JPH11140629A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP10245458A 1997-08-30 1998-08-31 カソードアーク気相堆積装置 Pending JPH11140629A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/919129 1997-08-30
US08/919,129 US5932078A (en) 1997-08-30 1997-08-30 Cathodic arc vapor deposition apparatus

Publications (2)

Publication Number Publication Date
JPH11140629A true JPH11140629A (ja) 1999-05-25
JPH11140629A5 JPH11140629A5 (enExample) 2005-11-04

Family

ID=25441551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10245458A Pending JPH11140629A (ja) 1997-08-30 1998-08-31 カソードアーク気相堆積装置

Country Status (6)

Country Link
US (1) US5932078A (enExample)
EP (1) EP0899772B1 (enExample)
JP (1) JPH11140629A (enExample)
KR (1) KR100569043B1 (enExample)
DE (1) DE69840142D1 (enExample)
SG (1) SG67546A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102443766A (zh) * 2010-10-15 2012-05-09 鸿富锦精密工业（深圳）有限公司 镀膜料架及具有该镀膜料架的镀膜设备

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DE60041951D1 (de) * 1999-12-20 2009-05-20 United Technologies Corp Verwendung einer Kathode zur Vakuumbogenverdampfung
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
DE10209423A1 (de) * 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
US6770178B2 (en) * 2002-08-09 2004-08-03 United Technologies Corporation Cathodic arc disposable sting shielding
US20050233551A1 (en) * 2004-04-15 2005-10-20 Board Of Control Of Michigan Technological University Method for depositing silicon by pulsed cathodic vacuum arc
US8241468B2 (en) * 2004-12-13 2012-08-14 United Technologies Corporation Method and apparatus for cathodic arc deposition of materials on a substrate
US20070138019A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation Platinum modified NiCoCrAlY bondcoat for thermal barrier coating
US7214409B1 (en) 2005-12-21 2007-05-08 United Technologies Corporation High strength Ni-Pt-Al-Hf bondcoat
US20100131023A1 (en) * 2006-06-21 2010-05-27 Benedict James Costello Implantable medical devices comprising cathodic arc produced structures
US7879203B2 (en) * 2006-12-11 2011-02-01 General Electric Company Method and apparatus for cathodic arc ion plasma deposition
CN103066226B (zh) 2007-02-14 2016-09-14 普罗透斯数字保健公司 具有高表面积电极的体内电源
US8088260B2 (en) * 2007-08-14 2012-01-03 United Technologies Corporation Puck for cathodic arc coating with continuous groove to control arc
US8968528B2 (en) * 2008-04-14 2015-03-03 United Technologies Corporation Platinum-modified cathodic arc coating
US8641963B2 (en) 2008-07-08 2014-02-04 United Technologies Corporation Economic oxidation and fatigue resistant metallic coating
US8419857B2 (en) * 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating
TW201226607A (en) * 2010-12-21 2012-07-01 Hon Hai Prec Ind Co Ltd Sputtering device
US9359669B2 (en) 2011-12-09 2016-06-07 United Technologies Corporation Method for improved cathodic arc coating process
US10704136B2 (en) * 2013-03-05 2020-07-07 Raytheon Technologies Corporation Cathodic arc deposition stinger
JP5941016B2 (ja) * 2013-05-27 2016-06-29 株式会社神戸製鋼所 成膜装置およびそれを用いた成膜方法
US9786474B2 (en) 2013-10-08 2017-10-10 United Technologies Corporation Cathodic arc deposition apparatus and method
US11261742B2 (en) 2013-11-19 2022-03-01 Raytheon Technologies Corporation Article having variable composition coating
EP3080329B1 (en) 2013-12-10 2023-04-05 Raytheon Technologies Corporation Chromizing over cathodic arc coating
US20170198601A1 (en) 2016-01-12 2017-07-13 United Technologies Corporation Internally cooled ni-base superalloy component with spallation-resistant tbc system

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US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
AT376460B (de) * 1982-09-17 1984-11-26 Kljuchko Gennady V Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen
US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
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EP0334204B1 (de) * 1988-03-23 1995-04-19 Balzers Aktiengesellschaft Verfahren und Anlage zur Beschichtung von Werkstücken
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FR2670218B1 (fr) * 1990-12-06 1993-02-05 Innovatique Sa Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.
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JP2758999B2 (ja) * 1991-04-10 1998-05-28 株式会社神戸製鋼所 真空アーク蒸着装置
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE69226725T2 (de) * 1991-05-29 1999-02-18 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.), Kobe Beschichtungsanlage mittels Kathodenzerstäubung und Methode zur Steuerung derselben
JPH0673538A (ja) * 1992-05-26 1994-03-15 Kobe Steel Ltd アークイオンプレーティング装置
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5282944A (en) * 1992-07-30 1994-02-01 The United States Of America As Represented By The United States Department Of Energy Ion source based on the cathodic arc
US5279723A (en) * 1992-07-30 1994-01-18 As Represented By The United States Department Of Energy Filtered cathodic arc source
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
JPH06240444A (ja) * 1993-02-15 1994-08-30 Kobe Steel Ltd バレル式アークイオンプレーティング装置
DE69432165T2 (de) * 1993-03-15 2003-12-11 Kabushiki Kaisha Kobeseikosho, Kobe Vorrichtung und system zum lichtbogenionenplattieren
US5317235A (en) * 1993-03-22 1994-05-31 Ism Technolog Magnetically-filtered cathodic arc plasma apparatus
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US5468363A (en) * 1994-04-25 1995-11-21 Regents Of The University Of California Magnetic-cusp, cathodic-arc source
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US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
US5588975A (en) * 1995-05-25 1996-12-31 Si Diamond Technology, Inc. Coated grinding tool

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102443766A (zh) * 2010-10-15 2012-05-09 鸿富锦精密工业（深圳）有限公司 镀膜料架及具有该镀膜料架的镀膜设备

Also Published As

Publication number Publication date
SG67546A1 (en) 1999-09-21
KR19990024029A (ko) 1999-03-25
EP0899772B1 (en) 2008-10-22
DE69840142D1 (de) 2008-12-04
KR100569043B1 (ko) 2006-06-21
EP0899772A3 (en) 2000-11-08
EP0899772A2 (en) 1999-03-03
US5932078A (en) 1999-08-03

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