JPH11121366A - 投影露光方法および装置 - Google Patents

投影露光方法および装置

Info

Publication number
JPH11121366A
JPH11121366A JP9303437A JP30343797A JPH11121366A JP H11121366 A JPH11121366 A JP H11121366A JP 9303437 A JP9303437 A JP 9303437A JP 30343797 A JP30343797 A JP 30343797A JP H11121366 A JPH11121366 A JP H11121366A
Authority
JP
Japan
Prior art keywords
light
light receiving
shot area
wafer
shot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP9303437A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11121366A5 (enExample
Inventor
Tsuneo Miyai
恒夫 宮井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9303437A priority Critical patent/JPH11121366A/ja
Publication of JPH11121366A publication Critical patent/JPH11121366A/ja
Publication of JPH11121366A5 publication Critical patent/JPH11121366A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9303437A 1997-10-18 1997-10-18 投影露光方法および装置 Withdrawn JPH11121366A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9303437A JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9303437A JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Publications (2)

Publication Number Publication Date
JPH11121366A true JPH11121366A (ja) 1999-04-30
JPH11121366A5 JPH11121366A5 (enExample) 2005-06-30

Family

ID=17921001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9303437A Withdrawn JPH11121366A (ja) 1997-10-18 1997-10-18 投影露光方法および装置

Country Status (1)

Country Link
JP (1) JPH11121366A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015420A (ja) * 1999-06-30 2001-01-19 Toshiba Corp 半導体ウエハのパターン露光方法およびパターン露光装置
JP2007221091A (ja) * 2006-02-13 2007-08-30 Samsung Electronics Co Ltd 半導体製造装置用レべリングアルゴリズム及びその関連装置
CN115921232A (zh) * 2022-12-29 2023-04-07 上海集成电路研发中心有限公司 胶液旋涂装置、控制方法和系统

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001015420A (ja) * 1999-06-30 2001-01-19 Toshiba Corp 半導体ウエハのパターン露光方法およびパターン露光装置
JP2007221091A (ja) * 2006-02-13 2007-08-30 Samsung Electronics Co Ltd 半導体製造装置用レべリングアルゴリズム及びその関連装置
CN115921232A (zh) * 2022-12-29 2023-04-07 上海集成电路研发中心有限公司 胶液旋涂装置、控制方法和系统

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